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公开(公告)号:US09885110B2
公开(公告)日:2018-02-06
申请号:US14810767
申请日:2015-07-28
Applicant: United Technologies Corporation
Inventor: Dmitri Novikov , Sergei F. Burlatsky , David Ulrich Furrer , David A. Litton
CPC classification number: C23C14/54 , C23C14/228 , C23C14/243 , F01D25/005
Abstract: A method or control strategy in a coating apparatus for use in a coating process can include controlling differential gas pressures among multiple selected localized zones in a coating chamber with respect to each other. The controlled differential gas pressure of the multiple selected localized zones is used to influence how a coating deposits on at least one component. The localized zones can be selected from a first localized zone around the component, a second localized zone adjacent the source of coating material, a third localized zone that diverges from the second localized zone toward the first localized zone, and a fourth localized zone that circumscribes at least the third localized zone.
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公开(公告)号:US20180030597A1
公开(公告)日:2018-02-01
申请号:US15222607
申请日:2016-07-28
Applicant: United Technologies Corporation
Inventor: David A. Litton , Peter F. Gero , Kevin W. Schlichting
IPC: C23C16/455 , C23C16/46 , F01D5/28 , F23R3/28 , F01D11/08 , F23R3/00 , F02C7/24 , C23C4/134 , F01D9/02
CPC classification number: C23C16/45525 , C23C4/134 , C23C14/083 , C23C14/30 , C23C14/505 , C23C14/568 , C23C16/46 , F01D5/288 , F01D9/02 , F01D11/08 , F02C7/24 , F05D2220/32 , F05D2230/31 , F05D2230/90 , F05D2240/35 , F05D2300/175 , F23R3/002 , F23R3/28
Abstract: An apparatus for depositing a coating on a part comprises: a chamber; a source of the coating material, positioned to communicate the coating material to the part in the chamber; a plurality of thermal hoods; and means for moving a hood of the plurality of thermal hoods from an operative position and replacing the hood with another hood of the plurality of hoods.
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33.
公开(公告)号:US20170101709A1
公开(公告)日:2017-04-13
申请号:US14880861
申请日:2015-10-12
Applicant: United Technologies Corporation
Inventor: James W. Neal , Michael J. Maloney , Kevin W. Schlichting , Eric Jorzik , David A. Litton , Brian T. Hazel
CPC classification number: C23C14/30 , C23C14/0021 , C23C14/083 , F01D5/288 , F01D25/005 , F01D25/28 , F05D2230/31 , F05D2300/611
Abstract: A method includes forming a multi-layered ceramic barrier coating under a chamber pressure of greater than 1 Pascals. In the method, low- and high-dopant ceramic materials are evaporated using input evaporating energies that fall, respectively, above and below a threshold for depositing the materials in a columnar microstructure (low-dopant) and in a branched columnar microstructure (high-dopant).
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公开(公告)号:US11276556B2
公开(公告)日:2022-03-15
申请号:US16836337
申请日:2020-03-31
Applicant: United Technologies Corporation
Inventor: James W. Neal , Michael J. Maloney , Kevin W. Schlichting , David A. Litton
IPC: H01J37/30 , G01K1/14 , G01K7/02 , G01K13/08 , C23C14/50 , C23C14/24 , C23C14/54 , G01N25/00 , H01J37/317 , C23C14/30
Abstract: A vapor deposition system fixture comprises an arm, a rake, a crown gear bearing assembly, a workpiece holder, a thermocouple, and a contact ring assembly. The crown gear bearing assembly is attached to and rotatably engaged with the rake and includes stationary portion and rotating portions. The workpiece holder is configured to rotate with the rotating portion. The thermocouple is configured to rotate with the workpiece holder. The contact ring assembly comprises a housing, a cover, first and second rotating contact rings, and first and second stationary contact rings. The housing is attached to at least one of the arm and the rake. The first and second rotating contact rings are electrically connected to the thermocouple. The first and second stationary contact rings surround the rotating ring. The first and second stationary contact rings are configured to receive an electrical signal from the first and second rotating contact rings.
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公开(公告)号:US20200318229A1
公开(公告)日:2020-10-08
申请号:US16834244
申请日:2020-03-30
Applicant: United Technologies Corporation
Inventor: Brian T. Hazel , David A. Litton , Kaylan M. Wessels
Abstract: An electron beam vapor deposition process for depositing coatings comprises placing a source coating material in a crucible of a vapor deposition apparatus having a coating chamber; pressurizing said coating chamber from about 0.5 microbar to about 40 microbar; heating a work piece surface to a temperature of from 1800 degrees Fahrenheit to 2000 degrees Fahrenheit; energizing said source coating with an electron beam that delivers a power density to the material in the crucible forming a vapor cloud from said source coating material; and depositing said source coating material onto a surface of a work piece.
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公开(公告)号:US10648077B2
公开(公告)日:2020-05-12
申请号:US15962173
申请日:2018-04-25
Applicant: United Technologies Corporation
Inventor: David A. Litton , Peter F. Gero , Kevin W. Schlichting
IPC: C23C16/00 , C23C16/455 , C23C14/30 , C23C14/50 , C23C14/56 , C23C4/134 , C23C16/46 , F01D5/28 , F01D9/02 , F01D11/08 , F02C7/24 , F23R3/00 , F23R3/28 , C23C14/08
Abstract: An apparatus for depositing a coating on a part comprises: a chamber; a source of the coating material, positioned to communicate the coating material to the part in the chamber; a plurality of thermal hoods; and means for moving a hood of the plurality of thermal hoods from an operative position and replacing the hood with another hood of the plurality of hoods.
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公开(公告)号:US10597329B2
公开(公告)日:2020-03-24
申请号:US16298204
申请日:2019-03-11
Applicant: United Technologies Corporation
Inventor: Mario P. Bochiechio , David A. Litton , Michael J. Maloney
IPC: C04B35/488 , C23C16/44 , C23C14/22 , F01D5/28 , C23C28/04 , C23C28/00 , C04B35/50 , C04B41/87 , C04B41/89 , C04B41/00 , C04B41/50 , C04B41/52 , C23C4/134
Abstract: A thermal barrier coating for a turbine engine component contains neodymia, optionally alumina, and zirconia. The thermal barrier coating has resistance to CMAS attack and a low thermal conductivity.
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公开(公告)号:US10280517B2
公开(公告)日:2019-05-07
申请号:US15249955
申请日:2016-08-29
Applicant: United Technologies Corporation
Inventor: David A. Litton , Brian S. Tryon
IPC: C23C28/00 , C23C14/02 , C23C14/08 , C23C14/30 , F01D5/28 , C23C28/04 , C23C14/24 , C23C14/54 , F01D25/00
Abstract: The thermal barrier coating system comprises a matrix of a first chemistry with multiple embedded second phases of a second chemistry. The matrix comprises a stabilized zirconia. The second regions comprise at least 40 mole percent of oxides having the formula Ln2O3, where Ln is selected from the lanthanides La through Lu, Y, Sc, In, Ca, and Mg with the balance zirconia (ZrO2), hafnia (HfO2), titania (TiO2), or mixtures thereof. The second phases have a characteristic thickness (T6) of less than 2.0 micrometers (μm). The spacing between second phases has a characteristic thickness (T5) of less than 8.0 micrometers (μm).
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公开(公告)号:US10233533B2
公开(公告)日:2019-03-19
申请号:US15109884
申请日:2015-01-07
Applicant: United Technologies Corporation
Inventor: Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
Abstract: A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.
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40.
公开(公告)号:US10145006B2
公开(公告)日:2018-12-04
申请号:US15112213
申请日:2015-01-08
Applicant: United Technologies Corporation
Inventor: Mladen F. Trubelja , David A. Litton , Joseph A. DePalma , James W. Neal , Michael Maloney , Russell A. Beers , Brian T. Hazel , Glenn A. Cotnoir
Abstract: A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
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