公开(公告)号：US09908215B1

公开(公告)日：2018-03-06

申请号：US14754660

申请日：2015-06-29

Applicant: US Synthetic Corporation

Inventor： Michael A. Vail ,  Heather Marie Schaefer ,  Adam M. Ziegenfelder

IPC: E21B10/40 ,  E21B10/46 ,  E21B10/50 ,  E21B10/567 ,  B24D3/10 ,  B24D18/00 ,  B01J19/24 ,  B01J19/16

CPC classification number: B24D3/10 ,  B24D18/00

Abstract: A method of processing a polycrystalline diamond material includes exposing at least a portion of a polycrystalline diamond material to a processing agent for processing at least a portion of the polycrystalline diamond material. The method further includes applying a body force to the volume of processing agent while at least the portion of the polycrystalline diamond material is exposed to the processing agent, and heating at least one of the processing agent and at least the portion of the polycrystalline diamond material exposed to the processing agent during application of the body force to the processing agent.

公开(公告)号：US09606091B2

公开(公告)日：2017-03-28

申请号：US14011471

申请日：2013-08-27

Applicant: US SYNTHETIC CORPORATION

Inventor： Julie Ann Kidd ,  Michael A. Vail

IPC: G01N33/00 ,  B01J3/06 ,  G06F19/00

CPC classification number: G01N33/00 ,  B01J3/06 ,  B01J3/062 ,  B01J2203/062 ,  B01J2203/0655 ,  B01J2203/0685 ,  G06F19/70

Abstract: Embodiments of the invention relate to methods of modeling leaching behavior of a polycrystalline diamond (“PCD”) material used in leached polycrystalline diamond compacts (“PDCs”) and methods of monitoring leaching of a PCD material. In an embodiment, a method of modeling leaching behavior is disclosed. A PCD table is provided, which includes a plurality of bonded diamond grains defining a plurality of interstitial regions in which a metallic material is disposed. The PCD table is leached with a leaching agent to at least partially remove the metallic material from the PCD table. A leach depth of the PCD table is determined. A concentration of at least one constituent of the leaching agent is also determined. The leach depth is correlated with the concentration of the at least one metal to generate the model of leaching behavior.

公开(公告)号：US09453802B1

公开(公告)日：2016-09-27

申请号：US14095740

申请日：2013-12-03

Applicant: US Synthetic Corporation

Inventor： Michael A. Vail

IPC: C30B29/04 ,  G01N23/00 ,  C23C16/24

CPC classification number: G01N23/00 ,  C23C16/24 ,  C30B29/04 ,  G01N23/203

Abstract: Methods of evaluating a superabrasive volume or a superabrasive compact are disclosed. One method may comprise exposing a superabrasive volume to beta particles and detecting a quantity of scattered beta particles. Further, a boundary may be perceived between a first region and a second region of the superabrasive volume in response to detecting the quantity of scattered beta particles. In another embodiment, a boundary between a catalyst-containing region and a catalyst-diminished region of a polycrystalline diamond volume may be perceived. In a further embodiment, a boundary may be perceived between a catalyst-containing region and a catalyst-diminished region of a polycrystalline diamond compact. Additionally, a depth to which a catalyst-diminished region extends within a polycrystalline diamond volume of a polycrystalline diamond compact may be measured in response to detecting a quantity of scattered beta particles. A system configured to evaluate a superabrasive volume is disclosed.

公开(公告)号：US09404308B1

公开(公告)日：2016-08-02

申请号：US14196773

申请日：2014-03-04

Applicant: US SYNTHETIC CORPORATION

Inventor： Jiang Qian ,  Debkumar Mukhopadhyay ,  Jason Wiggins ,  Kenneth E. Bertagnolli ,  Shawn C. Scott ,  Kevin Duy Nguyen ,  Michael A. Vail

IPC: E21B10/56 ,  E21B10/52

CPC classification number: E21B10/56 ,  E21B10/43 ,  E21B10/52 ,  E21B10/567 ,  E21B10/633

Abstract: Some embodiments relate to cutting element assemblies including a superabrasive cutting element that may be axially compressed to enhance the damage tolerance thereof, enclosed in an enclosure that exposes the superabrasive cutting element therethrough, enclosed in an enclosure that restricts rotation of the superabrasive cutting element, or combinations of the foregoing. Additionally, some embodiments relate to cutting element assemblies in which a superabrasive cutting element is mechanically fastened to a base, such as a substrate or directly to a bit body of a rotary drill bit. Some embodiments also relate to cutting element assemblies including one or more superabrasive cutting elements that are rotatable about a longitudinal axis of the cutting element assembly, that may be axially compressed to enhance the damage tolerance thereof, that may be enclosed in an enclosure that exposes the superabrasive cutting element therethrough, or combinations thereof.

Abstract translation: 一些实施例涉及切割元件组件，其包括可以被轴向压缩以增强其破坏公差的超研磨切割元件，其包围在限制超研磨切割元件的旋转的外壳中的外罩中，其暴露超硬磨料切割元件， 上述的组合。 另外，一些实施例涉及切割元件组件，其中超研磨切割元件机械地紧固到基座，例如基底或直接连接到旋转钻头的钻头体。 一些实施例还涉及切割元件组件，其包括可围绕切割元件组件的纵向轴线旋转的一个或多个超级研磨切割元件，其可以被轴向压缩以增强其损伤容限，其可以封闭在暴露于 超研磨切割元件或其组合。

公开(公告)号：US20160207169A1

公开(公告)日：2016-07-21

申请号：US15080379

申请日：2016-03-24

Applicant: US SYNTHETIC CORPORATION

Inventor： Kenneth E. Bertagnolli ,  Jiang Qian ,  Jason K. Wiggins ,  Michael A. Vail ,  Debkumar Mukhopadhyay ,  Brandon P. Linford

IPC: B24D3/10 ,  E21B10/567 ,  F16C33/04

CPC classification number: B24D3/10 ,  B22F2005/001 ,  C22C26/00 ,  E21B10/567 ,  F16C17/02 ,  F16C17/04 ,  F16C33/043 ,  F16C33/26 ,  F16C2352/00

Abstract: Embodiments of the invention relate to polycrystalline diamond compacts (“PDC”) exhibiting enhanced diamond-to-diamond bonding. In an embodiment, a PDC includes a polycrystalline diamond (“PCD”) table bonded to a substrate. At least a portion of the PCD table includes a plurality of diamond grains defining a plurality of interstitial regions. The plurality of interstitial regions includes a metal-solvent catalyst. The plurality of diamond grains exhibit an average grain size of about 30 μm or less. The plurality of diamond grains and the metal-solvent catalyst collectively exhibit an average electrical conductivity of less than about 1200 S/m. Other embodiments are directed to PCD, employing such PCD, methods of forming PCD and PDCs, and various applications for such PCD and PDCs in rotary drill bits, bearing apparatuses, and wire-drawing dies.

Abstract translation: 本发明的实施方案涉及显示增强的金刚石到金刚石结合的多晶金刚石压块（“PDC”）。 在一个实施例中，PDC包括结合到衬底的多晶金刚石（“PCD”）表。 PCD表的至少一部分包括限定多个间隙区域的多个金刚石晶粒。 多个间隙区域包括金属 - 溶剂催化剂。 多个金刚石晶粒的平均粒径为30μm以下。 多个金刚石晶粒和金属 - 溶剂催化剂共同表现出小于约1200S / m的平均导电率。 其他实施例涉及PCD，采用这种PCD，形成PCD和PDC的方法，以及用于旋转钻头，轴承装置和拉丝模具中的这种PCD和PDC的各种应用。

公开(公告)号：US09316060B1

公开(公告)日：2016-04-19

申请号：US14102284

申请日：2013-12-10

Applicant: US Synthetic Corporation

Inventor： Kenneth E. Bertagnolli ,  Michael A. Vail

IPC: B32B9/00 ,  E21B10/567 ,  B24D3/18

CPC classification number: E21B10/567 ,  B24D3/10 ,  B32B9/00 ,  C04B35/52 ,  C04B35/6303 ,  C04B35/645 ,  C04B2235/3201 ,  C04B2235/3203 ,  C04B2235/3206 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3225 ,  C04B2235/3234 ,  C04B2235/3256 ,  C04B2235/3272 ,  C04B2235/3274 ,  C04B2235/3427 ,  C04B2235/3821 ,  C04B2235/3843 ,  C04B2235/421 ,  C04B2235/427 ,  C04B2235/44 ,  C04B2235/442 ,  C04B2235/448 ,  E21B10/55 ,  Y10T407/27

Abstract: A polycrystalline diamond compact useful for wear, cutting, drilling, drawing and like applications is provided with a first diamond region remote from the working surface which has a metallic catalyzing material and a second diamond region adjacent to or including the working surface containing a non-metallic catalyst and the method of making such a compact is provided. This compact is particularly useful in high temperature operations, such as hard rock drilling because of the improved thermal stability at the working surface.

公开(公告)号：US08764864B1

公开(公告)日：2014-07-01

申请号：US13917952

申请日：2013-06-14

Applicant: US Synthetic Corporation

Inventor： David P. Miess ,  Michael A. Vail ,  Kenneth E. Bertagnolli ,  C. Eugene McMurray ,  Paul Douglas Jones

IPC: B24D3/00 ,  E21B10/00

CPC classification number: B24D18/0009 ,  B24D3/02 ,  B24D3/06 ,  B24D3/10 ,  B24D99/005 ,  E21B10/567 ,  E21B10/5676 ,  E21B2010/561

Abstract: Embodiments of the invention relate to polycrystalline diamond compacts (“PDCs”) comprising a preformed polycrystalline diamond (“PCD”) table including a thermally-stable region having a copper-containing material disposed interstitially between bonded diamond grains thereof, and methods of fabricating such PDCs. In an embodiment, a PDC includes a substrate, and a preformed PCD table having an interfacial surface bonded to the substrate and a generally opposing upper surface. The PCD table includes a plurality of diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions. The preformed PCD table further includes a first region extending inwardly from the upper surface that includes a copper-containing material disposed therein and a second region extending inwardly from the interfacial surface that includes a nickel-containing material disposed therein.

Abstract translation: 本发明的实施方案涉及包含预先形成的多晶金刚石（“PCD”）表的多晶金刚石压块（“PDC”），其包括在其结合的金刚石晶粒之间间隙地设置有含铜材料的热稳定区域，以及制造其的方法 PDCs。 在一个实施例中，PDC包括基板和预先形成的具有与基板结合的界面的大致相对的上表面的PCD表。 PCD台包括在其间显示金刚石到金刚石结合的多个金刚石晶粒并且限定多个间隙区域。 预成型的PCD台还包括从上表面向内延伸的第一区域，该第一区域包括设置在其中的含铜材料，以及从界面上向内延伸的第二区域，该第二区域包括设置在其中的含镍材料。

公开(公告)号：US08746376B2

公开(公告)日：2014-06-10

申请号：US13722250

申请日：2012-12-20

Applicant: US Synthetic Corporation

Inventor： Michael A. Vail ,  Kenneth E. Bertagnolli ,  Jason Wiggins ,  Jiang Qian ,  David P. Miess

IPC: E21B10/36 ,  B32B9/00 ,  B01J3/06

CPC classification number: E21B10/46 ,  B01J3/062 ,  B01J2203/062 ,  B01J2203/0655 ,  B01J2203/0685

Abstract: Embodiments relate to methods of fabricating PCD materials by subjecting a mixture that exhibits a broad diamond particle size distribution to an HPHT process, PCD materials so-formed, and PDCs including a polycrystalline diamond table comprising such PCD materials. In an embodiment, a PCD material includes a plurality of bonded diamond grains that exhibit a substantially unimodal diamond grain size distribution characterized, at least in part, by a parameter θ that is less than about 1.0. θ = x 6 · σ , where x is the average grain size of the substantially unimodal diamond grain size distribution, and σ is the standard deviation of the substantially unimodal diamond grain size distribution.

Abstract translation: 实施方案涉及通过使表现出宽金刚石粒度分布的混合物经受HPHT方法，所形成的PCD材料和包括包含这种PCD材料的多晶金刚石台的PDC来制造PCD材料的方法。 在一个实施方案中，PCD材料包括多个结合的金刚石晶粒，其表现出基本上单峰金刚石晶粒尺寸分布，其至少部分地由参数和特征表征; 小于约1.0。 ＆thetas; = x 6·＆sgr ，其中x是基本上单峰金刚石晶粒尺寸分布的平均晶粒尺寸， 是基本上单峰金刚石晶粒尺寸分布的标准偏差。

公开(公告)号：US08701798B1

公开(公告)日：2014-04-22

申请号：US13914413

申请日：2013-06-10

Applicant: US Synthetic Corporation

Inventor： Jiang Qian ,  Debkumar Mukhopadhyay ,  Jason Wiggins ,  Kenneth E. Bertagnolli ,  Shawn C. Scott ,  Kevin Duy Nguyen ,  Michael A. Vail

IPC: E21B10/42

CPC classification number: E21B10/56 ,  E21B10/43 ,  E21B10/52 ,  E21B10/567 ,  E21B10/633

Abstract: Some embodiments relate to cutting element assemblies including a superabrasive cutting element that may be axially compressed to enhance the damage tolerance thereof, enclosed in an enclosure that exposes the superabrasive cutting element therethrough, enclosed in an enclosure that restricts rotation of the superabrasive cutting element, or combinations of the foregoing. Additionally, some embodiments relate to cutting element assemblies in which a superabrasive cutting element is mechanically fastened to a base, such as a substrate or directly to a bit body of a rotary drill bit. Some embodiments also relate to cutting element assemblies including one or more superabrasive cutting elements that are rotatable about a longitudinal axis of the cutting element assembly, that may be axially compressed to enhance the damage tolerance thereof, that may be enclosed in an enclosure that exposes the superabrasive cutting element therethrough, or combinations thereof.

Abstract translation: 一些实施例涉及切割元件组件，其包括可以被轴向压缩以增强其破坏公差的超研磨切割元件，其包围在限制超研磨切割元件的旋转的外壳中的外罩中，该外壳将露出超硬磨料切割元件， 上述的组合。 另外，一些实施例涉及切割元件组件，其中超研磨切割元件机械地紧固到基座，例如基底或直接连接到旋转钻头的钻头体。 一些实施例还涉及切割元件组件，其包括可围绕切割元件组件的纵向轴线旋转的一个或多个超级研磨切割元件，其可以被轴向压缩以增强其损伤容限，其可以封闭在暴露于 超研磨切割元件或其组合。

公开(公告)号：US20130105232A1

公开(公告)日：2013-05-02

申请号：US13722250

申请日：2012-12-20

Applicant: US SYNTHETIC CORPORATION

Inventor： Michael A. Vail ,  Kenneth E. Bertagnolli ,  Jason Wiggins ,  Jiang Qian ,  David P. Miess

IPC: E21B10/46

CPC classification number: E21B10/46 ,  B01J3/062 ,  B01J2203/062 ,  B01J2203/0655 ,  B01J2203/0685

Abstract: Embodiments relate to methods of fabricating PCD materials by subjecting a mixture that exhibits a broad diamond particle size distribution to an HPHT process, PCD materials so-formed, and PDCs including a polycrystalline diamond table comprising such PCD materials. In an embodiment, a PCD material includes a plurality of bonded diamond grains that exhibit a substantially unimodal diamond grain size distribution characterized, at least in part, by a parameter θ that is less than about 1.0. θ = x 6 · σ , where x is the average grain size of the substantially unimodal diamond grain size distribution, and σ is the standard deviation of the substantially unimodal diamond grain size distribution.

Abstract translation: 实施方案涉及通过使表现出宽金刚石粒度分布的混合物经受HPHT方法，所形成的PCD材料和包括包含这种PCD材料的多晶金刚石台的PDC来制造PCD材料的方法。 在一个实施方案中，PCD材料包括多个结合的金刚石晶粒，其表现出基本上单峰金刚石晶粒尺寸分布，其至少部分地由小于约1.0的参数θ表征。 θ= x 6·sigma，其中x是基本上单峰金刚石晶粒尺寸分布的平均晶粒尺寸，σ是基本上单峰金刚石晶粒尺寸分布的标准偏差。