公开(公告)号：US20100177321A1

公开(公告)日：2010-07-15

申请号：US12684632

申请日：2010-01-08

申请人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

发明人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

IPC分类号： G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

公开(公告)号：US20100134789A1

公开(公告)日：2010-06-03

申请号：US12628074

申请日：2009-11-30

申请人： Stéphane BOUTINON ,  Philippe PINAULT

发明人： Stéphane BOUTINON ,  Philippe PINAULT

IPC分类号： G01M11/02

CPC分类号： B24B49/12 ,  G01M11/025 ,  G01M11/0264

摘要： A device for measuring at least one camber geometrical characteristic of an ophthalmic lens provided on at least one of its faces with at least one position-identifying mark, the device including a support for the ophthalmic lens, and on opposite sides of the support, firstly lighting element for lighting the ophthalmic lens along at least two different lighting directions, and secondly acquisition and analysis element for acquiring and analyzing the light transmitted by the ophthalmic lens, the analysis element being adapted to identify shadows of the mark when lighted in the at least two lighting directions, and to deduce from their positions a measured value for the camber geometrical characteristic of the ophthalmic lens.

摘要翻译： 一种用于测量在其至少一个表面上设置有至少一个位置识别标记的眼科镜片的至少一个外观几何特征的装置，该装置包括用于眼科镜片的支撑件，并且在支架的相对侧上，首先 照明元件，用于沿着至少两个不同的照明方向照明眼科镜片;以及第二获取和分析元件，用于获取和分析由眼科镜片透射的光，所述分析元件适于识别至少在所述眼镜片上照亮时所述标记的阴影 两个照明方向，并且从它们的位置推断出眼镜片的曲面几何特征的测量值。

公开(公告)号：US20100097619A1

公开(公告)日：2010-04-22

申请号：US12571993

申请日：2009-10-01

申请人： Zongtao GE ,  Hideo KANDA ,  Takayuki SAITO ,  Noboru KOIZUMI

发明人： Zongtao GE ,  Hideo KANDA ,  Takayuki SAITO ,  Noboru KOIZUMI

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01M11/025 ,  G01M11/0271

摘要： The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light that travels while being converged by a Mirau objective interference optical system is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.

摘要翻译： 测试表面的相对位置从表面中心轴与测量光轴对准的参考位置顺序地改变，使得测量光轴顺序地移动到通过将测试表面分成直径而获得的多个环形区域 方向。 每当相对位置改变时，测试表面都会在旋转轴上旋转。 在由Mirau物镜干涉光学系统会聚的同时行进的测量光被照射到旋转测试表面，并且一维图像传感器在多个旋转位置的每一个处捕获干涉条纹。 基于每个旋转位置处的捕获的干涉条纹来计算每个环形区域的形状信息，并且形状信息被连接以计算整个测量区域的形状信息。

公开(公告)号：US07433057B2

公开(公告)日：2008-10-07

申请号：US11398193

申请日：2006-04-05

申请人： Paul E. Murphy ,  Dragisha Miladinovic ,  Greg W. Forbes ,  Gary M. DeVries ,  Jon F. Fleig

发明人： Paul E. Murphy ,  Dragisha Miladinovic ,  Greg W. Forbes ,  Gary M. DeVries ,  Jon F. Fleig

IPC分类号： G01B11/24

CPC分类号： G01J9/02 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02063 ,  G01B9/02072 ,  G01B9/02085 ,  G01M11/025 ,  G01M11/0257 ,  G01M11/0271 ,  G01M11/0278

摘要： A system comprising a plurality of methods for measuring surfaces or wavefronts from a test part with greatly improved accuracy, particularly the higher spatial frequencies on aspheres. These methods involve multiple measurements of a test part. One of the methods involves calibration and control of the focusing components of a metrology gauge in order to avoid loss of resolution and accuracy when the test part is repositioned with respect to the gauge. Other methods extend conventional averaging methods for suppressing the higher spatial-frequency structure in the gauge's inherent slope-dependent inhomogeneous bias. One of these methods involve averages that suppress the part's higher spatial-frequency structure so that the gauge's bias can be disambiguated; another method directly suppresses the gauge's bias within the measurements. All of the methods can be used in conjunction in a variety of configurations that are tailored to specific geometries and tasks.

摘要翻译： 一种包括用于从测试部分测量表面或波前的多种方法的系统，其精度大大提高，特别是在非球面上的较高的空间频率。 这些方法涉及测试部件的多次测量。 其中一种方法包括校准和控制计量计的聚焦部件，以避免当测试部件相对于量规重新定位时，分辨率和精度的损失。 其他方法扩展了常规的平均方法，用于抑制计量器固有的斜率依赖性非均匀偏差中较高的空间 - 频率结构。 这些方法之一涉及平均值，可以抑制零件的较高的空间 - 频率结构，从而消除量规的偏差; 另一种方法直接抑制仪表在测量中的偏差。 所有这些方法可以结合适用于特定几何和任务的各种配置。

公开(公告)号：US20080068613A1

公开(公告)日：2008-03-20

申请号：US11901010

申请日：2007-09-14

申请人： Michael Kuchel

发明人： Michael Kuchel

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01M11/025 ,  G01M11/0271

摘要： Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the scanning axis and selectively moved along it relative to the known origin so that the reference wavefront intersects the test optic at the apex of the aspherical surface and at one or more radial positions where the reference wavefront and the aspheric surface intersect at points of common tangency (“zones”) to generate interferograms containing phase information about the differences in optical path length between the center of the test optic and the one or more radial positions. The interferograms are imaged onto a detector to provide an electronic signal carrying the phase information. The axial distance, ν, by which the test optic is moved with respect to the origin is interferometrically measured, and the detector pixel height corresponding to where the reference wavefront and test surface slopes match for each scan position is determined. The angles, α, of the actual normal to the surface of points Q at each “zone” are determined against the scan or z-axis. Using the angles, α, the coordinates z and h of the aspheric surface are determined at common points of tangency and at their vicinity with αmin≦α≦αmax, where αmin and αmax correspond to detector pixels heights where the fringe density in the interferogram is still low. The results can be reported as a departure from the design or in absolute terms.

摘要翻译： 用于测量具有非球面表面的测试光学元件的干涉测量扫描方法和装置，包括具有大的偏离球面的那些。 沿着扫描轴从已知原点生成参考波前。 测试光学元件在扫描轴上对准并且相对于已知原点被选择性地移动，使得参考波前与非球面的顶点处的测试光学器件相交，并且在一个或多个径向位置处，其中参考波前和非球面 在公共切线（“区域”）的点处相交以产生干涉图，其包含关于测试光学元件的中心与一个或多个径向位置之间的光程长度差的相位信息。 干涉图被成像到检测器上以提供携带相位信息的电子信号。 测量光学元件相对于原点移动的轴向距离nu被干涉测量，并且确定对应于每个扫描位置的参考波前和测试表面斜率匹配的检测器像素高度。 针对扫描或z轴确定在每个“区域”处的点Q的表面的实际法线的角度α。 使用角度α，非球面的坐标z和h在公共相切点和其附近由α分钟确定。α=α< ，其中α分钟和α最大值对应于干涉图中的边缘密度仍然较低的检测器像素高度。 结果可以报告为偏离设计或绝对值。

公开(公告)号：US07286212B2

公开(公告)日：2007-10-23

申请号：US10979165

申请日：2004-11-03

申请人： Mitsuru Namiki

发明人： Mitsuru Namiki

IPC分类号： G01B9/00

CPC分类号： G01M11/025 ,  G01B11/2408

摘要： An apparatus for measuring the eccentricity of the aspherical surface has a light source unit; a condenser lens condensing light rays in the proximity of the center of paraxial curvature of a surface to be examined, of an aspherical lens; an angle changing means for entering the rays on the surface to be examined, at angles θ1i (i=1, 2, . . . , N) with an optical axis; a holding tool of the aspherical lens; a light-splitting element; an imaging lens; a light-detecting element detecting the situation of light collected by the imaging lens; and an arithmetical unit. The arithmetical unit is such as to calculate the amount of eccentricity of the surface to be examined, from amounts of shift ΔP1i (i=1, 2, . . . , N) between spot positions P1i (i=1, 2, . . . , N) based on the design data of the surface to be examined and spot positions P1mi (i=1, 2, . . . , N) derived from the light-detecting element, with respect to light rays Q1i (i=1, 2, . . . , N) produced by the angle changing means.

摘要翻译： 用于测量非球面的偏心度的装置具有光源单元; 将聚光透镜聚焦在非球面透镜的待检测表面的近轴曲率中心附近的光线; 角度改变装置，用角度θ1i（i = 1,2，...，N）以光轴进入待检测的表面上的光线; 非球面透镜的保持工具; 光分离元件; 成像透镜; 检测由所述摄像透镜收集的光的情况的光检测元件; 和一个算术单位。 算术单位是从斑点位置P1i（i = 1,2，...）之间的移动量ΔP1i（i = 1,2，...，N）的角度计算待检测表面的偏心量。 基于待检查表面的设计数据和来自光检测元件的点位置P1mi（i = 1,2，...，N）相对于光线Q1i（i = 1） ，2，...，N）。

公开(公告)号：US07218403B2

公开(公告)日：2007-05-15

申请号：US11064731

申请日：2005-02-24

申请人： Michael Küchel

发明人： Michael Küchel

IPC分类号： G01B11/02

CPC分类号： G01M11/0257 ,  G01B9/02019 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02081 ,  G01B9/02087 ,  G01B11/2441 ,  G01B11/255 ,  G01B2290/45 ,  G01B2290/70 ,  G01M11/025 ,  G01M11/0271

摘要： Interferometric scanning method(s) and apparatus for measuring optics either having aspherical surfaces or that produce aspherical wavefronts. A test optic is aligned and moved with respect to a scanning axis relative to the origin of a known spherical wavefront that is generated with a reference surface to intersect the test optic at the apex of the aspherical surface and at radial zones where the spherical wavefront and the aspheric surface possess common tangents. The test surface is imaged onto a space resolving detector to form interferograms containing phase information about the differences in optical path length between the reference surface and the test surface while the axial distance which the test optic moves relative to the spherical reference surface is interferometrically measured. The deviation in the shape of the aspheric surface from its design in a direction normal to the aspheric surface is determined and reported.

摘要翻译： 用于测量具有非球面或产生非球面波前的光学器件的干涉扫描方法和装置。 测试光学器件相对于已知球面波阵面的原点相对于扫描轴线对准和移动，该已知球面波面的原点与非球面顶点处的测试光学器件相交，并在球面波前和 非球面具有共同切线。 将测试表面成像到空间分辨检测器上以形成干涉图，该干涉图包含有关参考表面和测试表面之间的光程长度差异的相位信息，同时对测量光学器件相对于球形参考表面移动的轴向距离进行干涉测量。 确定并报告非球面形状在与非球面垂直的方向上的设计偏离。

公开(公告)号：US06791696B1

公开(公告)日：2004-09-14

申请号：US09328972

申请日：1999-06-09

申请人： Stephen D. Fantone ,  Stephen R. Wilk ,  Jian Zhang ,  Daniel J. Braunstein

发明人： Stephen D. Fantone ,  Stephen R. Wilk ,  Jian Zhang ,  Daniel J. Braunstein

IPC分类号： G01B1124

CPC分类号： G01M11/025 ,  G01B11/00 ,  G01B11/24 ,  G01J9/00 ,  G01M11/0228 ,  G01M11/0235 ,  G01M11/0242 ,  G01M11/0257

摘要： An automated apparatus and method for measuring properties of optical components based on wavefront sensing and analysis. A wavefront of predetermined profile is directed at a surface to be measured so that it is more or less distorted in accordance with the shape of the surface and the distorted wavefront is sensed and analyzed. From the information derived from the distorted wavefront and other knowledge of the relationship between the surface and position of the wavefront of predetermined profile, the shape of the surface may be inferred along with other properties such as radius of curvature, focal length, conic constants, asphericity, toricity, tilt, and decentering. Concave, convex, cylindrical, and flat parts may be measured along with wavefront errors in bandpass transmitting components such as lenses, filters, and windows.

摘要翻译： 一种用于基于波前感测和分析来测量光学部件的性质的自动化装置和方法。 预定轮廓的波前指向要测量的表面，使得其根据表面的形状或多或少失真，并且检测和分析失真的波前。 根据从失真的波前得到的信息和预定轮廓的波面的表面和位置之间的关系的其他知识，可以推断表面的形状以及其他属性，例如曲率半径，焦距，圆锥常数， 非球面性，复曲面，倾斜和偏心。 可以测量凹凸，圆柱形和平坦部分以及带通传输部件如透镜，滤光片和窗口中的波前误差。

公开(公告)号：US20040174531A1

公开(公告)日：2004-09-09

申请号：US10731697

申请日：2003-12-09

申请人： Carl Zeiss SMT AG

发明人： Rolf Freimann

IPC分类号： G01B009/021

CPC分类号： G01M11/0271 ,  G01B11/2441 ,  G01M11/005 ,  G01M11/0242 ,  G01M11/025 ,  G01N21/8806 ,  G03F7/706

摘要： A system for interferometric fit testing of a specimen having an aspherical surface in reflection, the specimen being a segment (2) (footprint) of a rotationally symmetrical basic body (1) (parent), comprises an interferometer (3) and a diffractive optical element (DOE) (5). An optical axis of the interferometer (3) in the beam direction behind the diffractive optical element (5) and an axis of rotation of the basic body (1) form an angle that differs from zero. The diffractive optical element (5) is designed in such a way that the rays produced by the interferometer (3) and falling into the diffractive optical element (5) strike the specimen (2) perpendicularly and from there run back in themselves.

摘要翻译： 一种用于干涉测试的系统，其具有反射中的非球面表面的样本，所述样本是旋转对称的基体（1）（母体）的段（2）（占据面积），包括干涉仪（3）和衍射光学 元素（DOE）（5）。 在衍射光学元件（5）后面的光束方向上的干涉仪（3）的光轴和基体（1）的旋转轴线形成不同于零的角度。 衍射光学元件（5）被设计成使得由干涉仪（3）产生并落入衍射光学元件（5）中的光线垂直地撞击到样品（2）并从其中自身返回。

公开(公告)号：US06765683B2

公开(公告)日：2004-07-20

申请号：US10217015

申请日：2002-08-13

申请人： Hiroshi Ichihara

发明人： Hiroshi Ichihara

IPC分类号： G01B902

CPC分类号： G01M11/0271 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B11/2441 ,  G01M11/0214 ,  G01M11/025 ,  G01M11/0264 ,  G03F7/706

摘要： A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured. A surface correction calculation step is also included wherein the amount by which the shape of the optical test surface should be corrected is calculated based on wavefront aberration data obtained at the wavefront-aberration-measuring step and surface shape data obtained from the surface-shape-measuring step. The method also includes a surface shape correction step wherein the shape of the optical test surface is corrected based on calculation performed at the surface correction calculation step. Surface shape measuring interferometer systems and wavefront-aberration-measuring interferometer systems (22J-22Q) used in performing the manufacturing method are also disclosed.

摘要翻译： 一种制造用于将图案从掩模版投影到感光基板的投影光学系统（37）的方法，包括表面形状测量步骤，其中光学元件（36）的光学测试表面（38）的形状 通过在将光学测试表面（38）和所述参考表面（70）保持在其中的同时来自光学表面（38）的光和来自非球面参考表面（70）的光之间的干涉来测量投影光学系统中的分量。 一体化的时尚紧密相邻。 包括波前像差测量步骤，其中光学元件组装在投影光学系统中，并且测量投影光学系统的波前像差。 还包括表面校正计算步骤，其中根据在波前像差测量步骤获得的波前像差数据和从表面形状测量步骤获得的表面形状数据来计算光学测试表面的形状应被校正的量， 测量步骤。 该方法还包括表面形状校正步骤，其中基于在表面校正计算步骤执行的计算来校正光学测试表面的形状。 还公开了用于执行制造方法的表面形状测量干涉仪系统和波前像差测量干涉仪系统（22J-22Q）。