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    Metallic Ion Source
    38.
    发明申请
    Metallic Ion Source 审中-公开

    公开(公告)号：US20190198281A1

    公开(公告)日：2019-06-27

    申请号：US16313051

    申请日：2017-11-30

    Applicant: ION LAB Co., Ltd.

    Inventor： Masanobu NUNOGAKI

    IPC: H01J27/22 ,  H01J27/08 ,  H01J27/16 ,  H01J27/04 ,  H01J37/08

    CPC classification number: H01J27/22 ,  H01J27/04 ,  H01J27/08 ,  H01J27/16 ,  H01J27/20 ,  H01J37/08

    Abstract: Metallic ion source for resolving the issue of not being able to produce high-density ions efficiently with small-scale ion sources in situations where an electron beam injecting scheme is employed as the evaporation source to evaporate a solid, and for producing high-density ions highly efficiently. Designed to be compact and lightweight, the metallic ion source also facilitates selection of the ion extraction direction. The ion source, structured exploiting the characteristic physical property that whether ionization takes place is dependent on the energy of the electron beam, is furnished with a dual evaporation-plasma chamber that inside the same chamber enables a high-speed electron beam, whose ionization efficiency is low, and low-speed electrons generated by electric discharge, whose ionization efficiency is high, to participate independently and simultaneously in, respectively, evaporation of precursor and ionization action.

    Ion source and a method of generating an ion beam using an ion source
    40.
    发明授权
    Ion source and a method of generating an ion beam using an ion source 有权
    离子源和使用离子源产生离子束的方法

    公开(公告)号：US08324592B2

    公开(公告)日：2012-12-04

    申请号：US12917510

    申请日：2010-11-02

    Applicant: Geoffrey Ryding ,  Drew Arnold ,  William H. Park ,  Ronald Horner

    Inventor： Geoffrey Ryding ,  Drew Arnold ,  William H. Park ,  Ronald Horner

    IPC: H01J27/00 ,  H01J27/02 ,  H01J27/04

    CPC classification number: H01J27/04 ,  H01J37/08 ,  H01J2237/082

    Abstract: Multiple control electrodes are provided asymmetrically within the plasma chamber of an ion source at respective positions along the length of the plasma chamber. Biasing the control electrodes selectively can selectively enhance the ion extraction current at adjacent positions along the length of the extraction slit. A method of generating an ion beam is disclosed in which the strengths of the transverse electric fields at different locations along the length of the plasma chamber are controlled to modify the ion beam linear current density profile along the length of the slit. The method is used for controlling the uniformity of a ribbon beam.

    Abstract translation: 多个控制电极在离子源的等离子体室内沿着等离子体室的长度的各个位置处非对称地设置。 选择性地偏压控制电极可以选择性地提高沿着提取狭缝的长度的相邻位置处的离子提取电流。 公开了一种产生离子束的方法，其中控制沿着等离子体室的长度的不同位置处的横向电场的强度，以沿着狭缝的长度修改离子束线性电流密度分布。 该方法用于控制带束束的均匀性。

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