Abstract:
A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical nullfly's eyenull lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
Abstract:
A scanning type optical device comprises one optical characteristics measuring unit per color. Each optical characteristics measuring unit further includes three units. The first unit is provided on a writing start side within a scanning region, the second unit is provided on the other end side within the scanning region, and the third unit is arranged substantially at the center in the scanning region. Laser beams emitted from each of four semiconductor lasers are demodulated based on signals detected by the three units in such a manner that a difference between a real image height and an ideal image height is reduced over the entire scanning region.
Abstract:
A method and system for monitoring a region of interest are presented. Incident radiation is transmitted towards the region of interest with a certain transmitting angle and with a predetermined angular intensity distribution of the incident radiation. The transmitting angle defines a plane of propagation of the incident radiation, the region of interest being located within this plane. Reflections of the incident radiation are collected with a solid angle of collection intersecting with said plane. A region of intersection presents a detecting window of a predetermined geometry containing at least a portion of the region of interest. The collected radiation coming from within the detecting window is detected, and output signals indicative thereof are generated.
Abstract:
A beam shaper is made up of a single lens whose both surfaces are toric surfaces. Assuming that directions where the beam divergence angle are larger and smaller in the far field from the semiconductor laser source are referred to as the vertical and horizontal directions, respectively, both of the toric surfaces have aspheric surfaces in a cross-section in the vertical direction, both of the toric surfaces have spherical surfaces in a cross-section in the horizontal direction, and both centers of curvature of the spherical surfaces are located substantially at a luminous point of the semiconductor laser source.
Abstract:
A scanning microscope has at least one illumination source for emitting a light beam, which is fed via a microscope optic to a specimen and scans the latter. In order to correct the imaging defect of the microscope optic, said defect is determined and a correction value is determined therefrom. This correction value is used for influencing control signals which control the impinging of the light beam on the specimen.
Abstract:
Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.
Abstract:
A flexure carriage assembly (24) has a carriage (25) formed of a substantially rigid material. The carriage has four elongate columns (32A, 32B, 32C, 32D) arranged spaced apart and parallel to one another. Each of the elongate columns has first and second ends. The flexure carriage (25) has four first cross members disposed between adjacent pairs of elongate columns and arranged to interconnect the first ends. The flexure carriage also includes four second cross members (38A-D) arranged between adjacent pairs of elongate columns and arranged to interconnect the bottom ends. The elongate columns and first and second cross members define a three-dimensional rectangular structure. The flexure carriage also has disposed centrally between the four elongate columns a translating section (29) spaced equidistant between the first and second ends of the columns. A plurality of flexures (50) are disposed between the translating element and elongate columns and between the elongate columns and first and second cross members in order to permit precise movement of the translating section (20) in a plane according to applied forces against edges of the translating section. A pair of piezoelectric assemblies (26) are connected to the translating section. One applies force to the translating section in a first linear path and the other applies force to the translating section in a second linear path perpendicular path.
Abstract:
A multiple source array for illuminating an object including: a reflective mask having an array of spatially separated apertures; at least one optic positioned relative to the mask to form an optical cavity with the mask; and a source providing electromagnetic radiation to the optical cavity to resonantly excite a mode supported by the optical cavity, wherein during operation a portion of the electromagnetic radiation built-up in the cavity leaks through the mask apertures towards the object.
Abstract:
An illumination device for a light microscope comprises a scanning microscope probe which is integrated in the center thereof. A scanning probe microscope comprising such illumination device is also disclosed.
Abstract:
A method and apparatus are provided for securing an optical component, such as a lens, into a receptacle hole. A spring ring is provided having a plurality of sections that exert pressure on the periphery of the optical component and the inside surface of the receptacle hole, thus holding the optical component in place.