公开(公告)号：US20110001942A1

公开(公告)日：2011-01-06

申请号：US12698938

申请日：2010-02-02

Applicant: Joeri Lof ,  Erik Theodorus Maria Butler ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Staaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri Lof ,  Erik Theodorus Maria Butler ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Staaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/58

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。

公开(公告)号：US20100265484A1

公开(公告)日：2010-10-21

申请号：US12809730

申请日：2008-12-22

Applicant: Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

Inventor： Peter Gerhardus Wilhelmus Bussink ,  Anastasius Jacobus Anicetus Bruinsma ,  Hendricus Johannes Maria Meijer

IPC: G03B27/72

CPC classification number: G03F9/7034 ,  G03F9/7003

Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a substrate. The apparatus includes a support configured to hold a patterned object, and a measurement system configured to detect orientations and/or densities of user area structures that are present on a user area of the patterned object.

Abstract translation: 一种光刻设备，被配置为将图案化的辐射束投影到基底上。 该装置包括被配置为保持图案化物体的支撑件和被配置为检测存在于图案化物体的用户区域上的用户区域结构的取向和/或密度的测量系统。

公开(公告)号：US20090290135A1

公开(公告)日：2009-11-26

申请号：US12512754

申请日：2009-07-30

Applicant: Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar San Santen

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar San Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

公开(公告)号：US07426015B2

公开(公告)日：2008-09-16

申请号：US11654037

申请日：2007-01-17

Applicant: Hendricus Johannes Maria Meijer ,  Michael Jozef Mathijs Renkens

Inventor： Hendricus Johannes Maria Meijer ,  Michael Jozef Mathijs Renkens

IPC: G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70933 ,  G03F7/70841 ,  G03F7/70858

Abstract: A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.

Abstract translation: 一种装置的制造方法，其特征在于，使光刻投影装置的真空室内的压力达到温度稳定化压力范围; 将真空室内的压力保持在温度稳定压力范围内一段时间，以稳定真空室中的温度; 将真空室内的压力降低到生产压力范围; 用辐射系统产生辐射束; 图案化辐射束; 并将图案化的辐射束通过真空室投射到基底上的辐射敏感材料层的目标部分上。

公开(公告)号：US07193232B2

公开(公告)日：2007-03-20

申请号：US10705816

申请日：2003-11-12

Applicant: Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

Inventor： Joeri Lof ,  Joannes Theodoor De Smit ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Hendricus Johannes Maria Meijer ,  Erik Roelof Loopstra

IPC: G01N21/86 ,  G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7088

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。