公开(公告)号：US08519408B2

公开(公告)日：2013-08-27

申请号：US13599518

申请日：2012-08-30

Applicant: Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

Inventor： Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

IPC: G03C1/72 ,  G03C7/00 ,  C08J3/28

CPC classification number: H01L27/1288 ,  H01L27/1214

Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.

Abstract translation: 公开了一种制造具有高光敏感性，耐热性，耐冲击性的光致变化薄膜晶体管基板的方法及使用该薄膜晶体管基板的方法，该方法包括：在绝缘基片上形成数据线，在其上形成有机绝缘膜 数据线通过应用包含三元共聚物的光敏组合物，其中三元共聚物衍生自不饱和羧酸，不饱和羧酸酐或其混合物，不饱和环氧基化合物和烯属化合物的单体。

公开(公告)号：US20130162965A1

公开(公告)日：2013-06-27

申请号：US13565073

申请日：2012-08-02

Applicant: Chang-Hoon KIM ,  Kab-Jong SEO ,  Hi-Kuk LEE ,  Tsunemitsu TORIGOE

Inventor： Chang-Hoon KIM ,  Kab-Jong SEO ,  Hi-Kuk LEE ,  Tsunemitsu TORIGOE

IPC: G03B27/54

CPC classification number: G03F7/70066 ,  G03F7/7035 ,  G03F7/70475

Abstract: An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.

Abstract translation: 曝光装置包括照射光的照射部分，在遮光部件的一侧包括聚光部分的遮光部件，其中聚光部分聚光，将与遮光部件间隔开的面罩通过 第一距离，以及沿第一方向输送目标基板的输送部。

公开(公告)号：US20120328991A1

公开(公告)日：2012-12-27

申请号：US13599518

申请日：2012-08-30

Applicant: Hoon KANG ,  Jae-sung KIM ,  Yang-ho JUNG ,  Hi-kuk LEE

Inventor： Hoon KANG ,  Jae-sung KIM ,  Yang-ho JUNG ,  Hi-kuk LEE

IPC: G03F7/20

CPC classification number: H01L27/1288 ,  H01L27/1214

Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.

Abstract translation: 公开了一种制造具有高光敏感性，耐热性，耐冲击性的光致变化薄膜晶体管基板的方法及使用该薄膜晶体管基板的方法，该方法包括：在绝缘基片上形成数据线，在其上形成有机绝缘膜 数据线通过应用包含三元共聚物的光敏组合物，其中三元共聚物衍生自不饱和羧酸，不饱和羧酸酐或其混合物，不饱和环氧基化合物和烯属化合物的单体。

公开(公告)号：US08278021B2

公开(公告)日：2012-10-02

申请号：US12170487

申请日：2008-07-10

Applicant: Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

Inventor： Hoon Kang ,  Jae-sung Kim ,  Yang-ho Jung ,  Hi-kuk Lee

IPC: C08J3/28 ,  G03C7/00 ,  G03C1/72 ,  C08F2/46

CPC classification number: H01L27/1288 ,  H01L27/1214

Abstract: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.

Abstract translation: 公开了一种制造具有高光敏感性，耐热性，耐冲击性的光致变化薄膜晶体管基板的方法及使用该薄膜晶体管基板的方法，该方法包括：在绝缘基片上形成数据线，在其上形成有机绝缘膜 数据线通过应用包含三元共聚物的光敏组合物，其中三元共聚物衍生自不饱和羧酸，不饱和羧酸酐或其混合物，不饱和环氧基化合物和烯属化合物的单体。

公开(公告)号：US20120241740A1

公开(公告)日：2012-09-27

申请号：US13407423

申请日：2012-02-28

Applicant: Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

Inventor： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

IPC: H01L29/04 ,  G03F7/20 ,  H01L33/08

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/1288

Abstract: A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

Abstract translation: 在其上设置有感光层的基板上形成感光图案的方法可以包括在第一方向上移动基板和一组微镜中的至少一个，所述微镜组设置在基板上方并且 排列为阵列，所述阵列具有沿第二方向延伸的第一边缘，所述第二方向相对于所述第一方向成锐角。 该方法还可以包括根据微镜相对于感光层的位置选择性地打开该组微镜的一个或多个微镜，从而在感光层上照射一个或多个光束。 由点光束曝光的感光层被显影以形成具有沿与第一和第二方向交叉的第三方向延伸的边缘部分的感光图案。

公开(公告)号：US08203674B2

公开(公告)日：2012-06-19

申请号：US13179436

申请日：2011-07-08

Applicant: Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

Inventor： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC: G02F1/1333 ,  G02F1/136 ,  G02F1/1343

CPC classification number: H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

Abstract: A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

Abstract translation: 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。

公开(公告)号：US20120009842A1

公开(公告)日：2012-01-12

申请号：US13239759

申请日：2011-09-22

Applicant: Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

Inventor： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

IPC: H01J9/00 ,  G03F1/00

CPC classification number: G02F1/136213 ,  G02F1/13458 ,  G02F2001/136236 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.

Abstract translation: 提供面罩。 面罩包括面罩主体，第一曝光部和第二曝光部。 第一曝光部分在面罩主体上。 第一曝光部分包括第一透光部分和第二透光部分。 第一光透射部分将与输出端子相对应的光致抗蚀剂膜的一部分暴露于第一光量的光。 第二透光部分使邻近输出端子的光致抗蚀剂膜的相邻部分暴露于小于第一光量的第二光量的光。 第二曝光部位在面罩主体上。 第二曝光部分包括用于将对应于存储电极的光致抗蚀剂膜部分地曝光到处于第一和第二光量之间的第三光量的光的第三透光部分。

公开(公告)号：US20110205508A1

公开(公告)日：2011-08-25

申请号：US12906623

申请日：2010-10-18

Applicant: Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

Inventor： Sang-Hyun Yun ,  Hi-Kuk Lee ,  Sang-Woo Bae ,  Cha-Dong Kim ,  Jung-In Park

IPC: G03B27/52

CPC classification number: G03B27/526 ,  G03B27/52 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70541

Abstract: A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs.

Abstract translation: 公开了一种用于执行该方法的数字曝光方法和数字曝光装置。 在该方法中，与形成在基板上的多个图案中的每一个对应地生成图形数据系统文件。 然后，从图形数据系统文件生成数字微镜装置开/关数据。 然后，响应于数字微镜装置的开/关数据曝光基板。 因此，可以同时执行用于形成显示面板的第一图案的第一曝光和用于形成基板和每个显示面板的识别号和去除基板的边缘部分的第二曝光，以简化曝光过程 降低成本

公开(公告)号：US07927897B2

公开(公告)日：2011-04-19

申请号：US12327215

申请日：2008-12-03

Applicant: Hi-Kuk Lee ,  Sang-Hyun Yun ,  Min-Soo Lee ,  Deok-Man Kang ,  Sae-Tae Oh ,  Jae-Young Choi

Inventor： Hi-Kuk Lee ,  Sang-Hyun Yun ,  Min-Soo Lee ,  Deok-Man Kang ,  Sae-Tae Oh ,  Jae-Young Choi

IPC: H01L21/00

CPC classification number: H01L27/1288 ,  G03F7/0233 ,  H01L27/1214

Abstract: A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

Abstract translation: 光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

公开(公告)号：US07799509B2

公开(公告)日：2010-09-21

申请号：US11445846

申请日：2006-06-02

Applicant: Hi-Kuk Lee ,  Dong-Ki Lee ,  Jae-Sung Kim ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Joo-Pyo Yun ,  Sang-Gak Choi

Inventor： Hi-Kuk Lee ,  Dong-Ki Lee ,  Jae-Sung Kim ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Joo-Pyo Yun ,  Sang-Gak Choi

IPC: G03F7/30 ,  G03F7/023

CPC classification number: G03F7/0233 ,  G02F1/133707 ,  G02F1/133711 ,  G03F7/40

Abstract: A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.

Abstract translation: 用于有机层图案的感光性树脂组合物包括约100重量份的丙烯酸类共聚物和约5至约100重量份的1,2-醌二叠氮化合物。 基于丙烯酸类的共聚物通过基于丙烯酸类共聚物的总重量共聚约5至约60重量％的基于羧酸异冰片的化合物来制备，约10至约30重量％的不饱和化合物携带 约20至约40重量％的烯烃基不饱和化合物，和约10至约40重量％的选自不饱和羧酸，不饱和羧酸酐及其混合物的一种。 还提供了使用该感光性树脂组合物制造TFT基板和公共电极基板的方法。 有利地，有机层图案可以具有具有改进的局部平坦度而没有凹凸结构的山体结构。