Abstract:
The method for forming a metal line stacking structure according to a preferred embodiment of the present invention comprises: sequentially forming a first barrier metal and a first metal layer on a lower dielectric layer that is disposed over a semiconductor substrate, and performing a plasma treatment; forming a second barrier metal on the plasma-treated first metal layer; selectively etching the second barrier metal, the first metal layer, and the first barrier metal to form a metal line layer including the second barrier metal, the first metal layer, and the first barrier metal, which respectively have a predetermined width; and sintering the metal line layer to raise a reaction between the first metal layer and the second barrier metal, thereby generating a metal compound layer.
Abstract:
Disclosed is a remote control instructions generating system which is installed at a portable phone having Bluetooth communication function to perform a remote controlling function of a computer, the system including: a detection value inputting unit for receiving a detection value that a user inputs using a keypad of the portable phone; a detection value storing unit for storing the detection value inputted through the detection value inputting unit and information on a time at which the detection value is inputted; and a detection value query processing module for transmitting the detection value and its corresponding time information stored in the detection value storing unit to the computer in case that the computer queries a detection value through Bluetooth communication.
Abstract:
Disclosed is a welding-type fixing cap used for attachment to both ends of a cylindrical battery composed of metal materials. The welding-type fixing cap comprises a ring-shaped side wall; a visor surface extending outwards from one end of the side wall; a welding lug formed on the visor surface, wherein the welding lug is meltable in a welding process; a cutting hole formed in the side wall, wherein the cutting hole is dimensioned and configured for discharging gas. The welding lug is positioned distal to the side wall and proximal to a cutting hole. The welding-type fixing cap has a sufficient strength, while recuding electric current leakage during a contact-resistance welding.
Abstract:
A heat exchange element of a heat exchanger prevents losses due to internal pressure non-uniformity. The heat exchanger includes a plurality of heat exchange sheets which are stacked together. A plurality of airflow guide ribs located between the sheets have connection passages that allow gases to flow between adjacent ducts. The flow of gasses through the connection passages offsets pressure non-uniformity between adjacent ducts. Also, the ribs can be continuously arranged over the length of the heat exchange ducts to increase an area supporting the heat exchange sheets, and thus the sag phenomenon of the heat exchange sheet can be prevented.
Abstract:
An apparatus and method for generating tactile sensation by using constellation metaphor are provided. The apparatus includes: a tactile generator generating a tactile pattern by using a shape of image inputted from a user and generating a tactile icon having a shape of dots and lines by using the constellation metaphor according to the tactile pattern; a tactile indicator indicating a tactile sensation by using the generated tactile pattern; and a display unit displaying the generated tactile icon. Accordingly, there is an advantage in that the tactile pattern is easily generated, and a user can easily recognize the generated tactile pattern.
Abstract:
According to embodiments, a semiconductor device may include a PMD layer provided with a contact, and a wiring layer formed on the PMD layer and connected to the contact by stacking and forming a plurality of metal layers thereon. In embodiments, the plurality of metal layers may include a first metal layer and a second metal layer.
Abstract:
A Plasma Display Panel (PDP) with improved luminous efficiency includes: a rear substrate; a front substrate facing the rear substrate; a plurality of barrier ribs interposed between the front and rear substrates and partitioning a plurality of discharge cells; a plurality of sustain electrode pairs arranged separate from each other on the front substrate facing the rear substrate, each pair of sustain electrodes including an X electrode and an Y electrode; and a front dielectric layer covering the sustain electrode pairs and having at least two grooves in each of the discharge cells; a distance between the X and Y electrodes of each sustain electrode pair is greater than a height of the barrier ribs.
Abstract:
For a semiconductor device having copper wiring, an exemplary method according to an embodiment of the present invention may include forming a first insulation layer on a silicon substrate having a transistor thereon; forming a contact hole by etching the first insulation layer; forming a metal plug so as to fill the contact hole; forming a second insulation layer on the metal plug; forming a trench exposing an upper surface of the metal plug by partially removing the second insulation layer; sputter-etching an interior wall and bottom surface of the trench with a plasma; and forming a copper line layer so as to fill the sputter-etched trench. According to this method, electrical contact between a metal plug and a copper line layer may be maintained or improved prevented by reducing or removing by-products on the metal plug using the sputter-etching process.
Abstract:
A Plasma Display Panel (PDP) that reduces a discharge voltage includes: a substrate; pairs of sustain electrodes arranged on the substrate; and a dielectric layer covering the pairs of sustain electrodes, the dielectric layer having grooves and the grooves having a plurality of protrusions arranged thereon.
Abstract:
A plasma display panel has connection passage units that facilitate exhaust and injection processes during manufacture of the plasma display panel. The plasma display panel includes a first substrate, a second substrate facing the first substrate, the first and second substrates being spaced apart by a predetermined distance, barrier ribs for defining a plurality of discharge cells in a space between the first substrate and the second substrate, first and second electrodes extending parallel to each other on the first substrate, and a first dielectric layer covering the first and second electrodes, the first dielectric layer including a field concentration groove between the first and second electrodes within each discharge cell, and connection passage units for connecting field concentration grooves in adjacent discharge cells