公开(公告)号：US20070008541A1

公开(公告)日：2007-01-11

申请号：US11520512

申请日：2006-09-13

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US20060262314A1

公开(公告)日：2006-11-23

申请号：US11492583

申请日：2006-07-25

申请人： Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

发明人： Lena Nicolaides ,  Jeffrey Fanton ,  Alex Salnik ,  Jon Opsal

IPC分类号： G01N21/55

CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

公开(公告)号：US07126690B2

公开(公告)日：2006-10-24

申请号：US10659626

申请日：2003-09-10

申请人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

发明人： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC分类号： G01N21/55

CPC分类号： G01N21/636 ,  G01N21/1717

摘要： A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

摘要翻译： 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US06989899B2

公开(公告)日：2006-01-24

申请号：US10387259

申请日：2003-03-12

申请人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

发明人： Alex Salnik ,  Lena Nicolaides ,  Jon Opsal

IPC分类号： G01N21/00 ,  G01N21/55

CPC分类号： G01N21/276 ,  G01N21/1717 ,  G01N21/55 ,  G01N2021/3568

摘要： A method for simultaneously monitoring ion implantation dose, damage and/or dopant depth profiles in ion-implanted semiconductors includes a calibration step where the photo-modulated reflectance of a known damage profile is identified in I-Q space. In a following measurement step, the photo-modulated reflectance of a subject is empirically measured to obtain in-phase and quadrature values. The in-phase and quadrature values are then compared, in I-Q space, to the known damage profile to characterize the damage profile of the subject.

摘要翻译： 在离子注入的半导体中同时监测离子注入剂量，损伤和/或掺杂剂深度分布的方法包括校准步骤，其中在I-Q空间中识别已知损伤谱的光调制反射率。 在随后的测量步骤中，经验地测量受试者的光调制反射率以获得同相和正交值。 然后在I-Q空间中将同相和正交值与已知的损伤特征进行比较，以表征受试者的损伤特征。

公开(公告)号：US06584341B1

公开(公告)日：2003-06-24

申请号：US09628812

申请日：2000-07-28

申请人： Andreas Mandelis ,  Stephen H. Abrams ,  Lena Nicolaides ,  Jose Agustin Garcia-Hecules

发明人： Andreas Mandelis ,  Stephen H. Abrams ,  Lena Nicolaides ,  Jose Agustin Garcia-Hecules

IPC分类号： A61B600

CPC分类号： A61B5/0088

摘要： There is provided a metrologic methodology and instrument, useful for a high-spatial-resolution dynamic diagnostic metrology and instrument, which can provide simultaneous measurements of laser-induced frequency-domain infrared photothermal radiometry (FD-PTR) and alternating-current (ac) modulated luminescence (FD-LM) signals from defects and caries in teeth intraorally. The combination of the luminescence and radiometric frequency scan techniques for inspection of defects and caries in teeth involves irradiating the tooth with a modulated (direct-current (dc) to 100 kHz) excitation source (laser) emitting in the near-ultraviolet, visible, or near-infrared spectral range, generating blackbody Planck-radiation (infrared radiometry) and ac luminescence, and comparing the obtained (amplitude and phase) luminescence and radiometric signals to those obtained from a well characterized sample (reference) to provide the clinician with numerical information on the status of a tooth. The method and device is used to scan teeth intraorally to detect caries and classify caries or the integrity of the enamel or cementum surface, classify the health and integrity of the enamel at the base of occlusal fissures, classify the health and integrity of enamel or cementum surface of the tooth and defects around the margins of restorations, locate the presence of cracks on the enamel or cementum surface, and locate and characterize cracks in dentin on prepared teeth.

摘要翻译： 提供了一种用于高空间分辨率动态诊断计量和仪器的计量方法和仪器，可以提供激光诱导的频域红外光热辐射测量（FD-PTR）和交流（ac） 调制发光（FD-LM）信号从牙齿中的缺陷和龋齿。 用于检查牙齿中的缺陷和龋齿的发光和辐射测量频率扫描技术的组合包括用在近紫外线，可见光区域中发射的调制（直流（dc）至100kHz）激发源（激光）照射牙齿， 或近红外光谱范围，产生黑体普朗克辐射（红外辐射测量）和交流发光，并将获得的（振幅和相位）发光和辐射信号与从良好表征的样品（参考）获得的信号进行比较，以向临床医生提供数字 关于牙齿状况的信息。 该方法和装置用于口内扫描牙齿以检测龋齿和分类龋齿或釉质或牙骨质表面的完整性，将牙釉质基底处的牙釉质的健康和完整性分类，分类牙釉质或牙骨质的健康和完整性 牙齿表面和修复边缘周围的缺陷，定位在牙釉质或牙骨质表面上存在裂纹，并定位并表征牙齿上的牙质上的裂纹。

公开(公告)号：US20050225765A1

公开(公告)日：2005-10-13

申请号：US11143203

申请日：2005-06-02

申请人： Lena Nicolaides ,  Alex Salonik

发明人： Lena Nicolaides ,  Alex Salonik

IPC分类号： G01N21/17 ,  G01N21/95 ,  G01N25/72 ,  G01N21/00

CPC分类号： G01N21/1717 ,  G01N21/171 ,  G01N21/9501

摘要： A method and apparatus for evaluating a semiconductor wafer. A combination of a photothermal modulated reflectance method and system with a photothermal IR radiometry system and method is utilized to provide information which can be used to determine properties of semiconductor wafers being evaluated. The system and method can provide for utilizing a common probe source and a common intensity modulated energy source. The system and method further provide an infrared detector for monitoring changes in infrared radiation emitted from a sample, and photodetector for monitoring changes in beam reflected from the sample.

摘要翻译： 一种用于评估半导体晶片的方法和装置。 利用光热调制反射方法和具有光热IR辐射测量系统和方法的系统的组合来提供可用于确定被评估的半导体晶片的性质的信息。 该系统和方法可以提供利用公共探测源和共同的强度调制能量源。 该系统和方法还提供一种红外检测器，用于监测从样品发射的红外辐射的变化，以及用于监测从样品反射的光束变化的光电检测器。

公开(公告)号：US07755752B1

公开(公告)日：2010-07-13

申请号：US12098979

申请日：2008-04-07

申请人： Alexei Salnik ,  Lena Nicolaides

发明人： Alexei Salnik ,  Lena Nicolaides

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/1717 ,  H01L22/12

摘要： The capabilities of the Modulated Optical Reflectance (MOR) technology in dopant metrology applications are combined with the sensitivity of the PhotoReflectance (PR) method in the present system to provide stress and other measurements in semiconductor samples. Such combination enhances the measurement performance of MOR based systems in ion implant applications (implantation dose and energy) and expands system capabilities into a new area of structural parameters measurements, for example, strain in silicon wafers.

摘要翻译： 掺杂剂测量应用中的调制光反射（MOR）技术的能力与本系统中的PhotoReflectance（PR）方法的灵敏度相结合，以在半导体样品中提供应力和其他测量。 这种组合增强了离子注入应用（植入剂量和能量）中基于MOR的系统的测量性能，并将系统能力扩展到结构参数测量的新领域，例如硅晶片中的应变。

公开(公告)号：US07660686B1

公开(公告)日：2010-02-09

申请号：US12098991

申请日：2008-04-07

申请人： Lena Nicolaides ,  Alexei Salnik ,  Bin-ming Benjamin Tsai

发明人： Lena Nicolaides ,  Alexei Salnik ,  Bin-ming Benjamin Tsai

IPC分类号： G01N37/00 ,  G01N21/00

CPC分类号： G01N21/1717 ,  G01N21/9501

摘要： Samples subject to ion implantation are measured using a modulated optical reflectance system and the results of the measurements are compared to specification ranges for acceptable samples and a plurality of parametric ranges. Each parametric range is associated with a different known type of implantation fault. Measurement results outside of the specification range may be characterized by fault type by comparing the measurement results to a plurality of parametric ranges. In this way, a fault type may be quickly identified and the corresponding source of the fault may be corrected.

摘要翻译： 使用调制光学反射系统测量进行离子注入的样品，并将测量结果与可接受样品的规格范围和多个参数范围进行比较。 每个参数范围与不同的已知类型的植入断层相关联。 在规格范围之外的测量结果可以通过将测量结果与多个参数范围进行比较来表征故障类型。 以这种方式，可以快速识别故障类型，并且可以纠正相应的故障源。