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公开(公告)号：US4654055A
公开(公告)日：1987-03-31
申请号：US509628
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
CPC分类号： B01D67/0088
摘要： Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric membrane is contacted on one or both surfaces with an effective amount of a Bronsted-Lowry base. The improved asymmetric gas separation membranes, process for producing the improved membrane, and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation are disclosed.
摘要翻译： 具有气态混合物的至少一种气体的选择性渗透的气体混合物的气体混合物的一种或多种剩余气体的选择性渗透的材料的不对称气体分离膜当在一种气体混合物上接触不对称膜时显示出显着改善的至少一种气体的渗透选择性 或具有有效量的Bronsted-Lowry碱的两个表面。 公开了改进的不对称气体分离膜，用于生产改进膜的方法，以及利用这种膜通过渗透从气态混合物中选择性分离至少一种气体的方法。
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公开(公告)号：US4472175A
公开(公告)日：1984-09-18
申请号：US509626
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
CPC分类号： B01D67/0088
摘要： Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric membrane is contacted on one or both surfaces with an effective amount of a Br nsted-Lowry acid. The improved asymmetric gas separation membranes, process for producing the improved membrane, and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation are disclosed.
摘要翻译： 具有气态混合物的至少一种气体的选择性渗透的气体混合物的气体混合物的一种或多种剩余气体的选择性渗透的材料的不对称气体分离膜当在一种气体混合物上接触不对称膜时显示出显着改善的至少一种气体的渗透选择性 或两个表面与有效量的Br nsted-Lowry酸。 公开了改进的不对称气体分离膜，用于生产改进膜的方法，以及利用这种膜通过渗透从气态混合物中选择性分离至少一种气体的方法。
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公开(公告)号：US4468503A
公开(公告)日：1984-08-28
申请号：US509632
申请日：1983-06-30
申请人： Anthony Zampini , Raymond F. Malon
发明人： Anthony Zampini , Raymond F. Malon
CPC分类号： C08G65/485 , B01D71/52
摘要： Cross-linked polyphenylene oxide compositions comprise the reaction product of haloacylated polyphenylene oxide and ammonia. The polyphenylene oxide chains are cross-linked by amino ketone bonding. Such cross-linked polymers are useful as membranes, for instance gas separation membranes.
摘要翻译： 交联聚苯醚组合物包含卤代酰化聚苯醚与氨的反应产物。 聚苯醚链通过氨基酮键交联。 这种交联聚合物可用作膜，例如气体分离膜。
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公开(公告)号：US10365562B2
公开(公告)日：2019-07-30
申请号：US13340989
申请日：2011-12-30
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
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公开(公告)号：US08373241B2
公开(公告)日：2013-02-12
申请号：US12582673
申请日：2009-10-20
IPC分类号： H01L21/76
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
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公开(公告)号：US20130004893A1
公开(公告)日：2013-01-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了有机涂料组合物，特别是抗反射涂料组合物，其包含包含一种或多种对映异构酸部分的组分。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US20110033801A1
公开(公告)日：2011-02-10
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C09D177/00 , G03F7/20
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US07700256B2
公开(公告)日：2010-04-20
申请号：US10313954
申请日：2002-12-06
申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
发明人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
摘要翻译： 本发明涉及包含苯酚重复单元和含有脂环族基团的光酸不稳定酯的新聚合物，优选适合含有7至约20个碳原子的大体积基团，例如烷基金刚烷基，乙基戊基，三环癸烷基或蒎烷基 组。 本发明的聚合物可用作化学增效正性抗蚀剂的组分。
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公开(公告)号：US07605439B2
公开(公告)日：2009-10-20
申请号：US11512140
申请日：2006-08-29
IPC分类号： H01L21/76
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
摘要翻译： 本发明包括可用作外涂光致抗蚀剂的抗反射层的新的含有机组合物。 通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。 本发明的优选组合物具有高Si含量并且包含不同树脂的共混物。
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公开(公告)号：US07390609B2
公开(公告)日：2008-06-24
申请号：US10793427
申请日：2004-03-03
申请人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
发明人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
CPC分类号： G03F7/0757 , C08G77/24 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
摘要翻译： 提供具有含有这种聚合物的非碳四价物质（Si，Ti，Ge，Zr，Sn）和可光成像的组合物的新型聚合物。 优选的聚合物是有机的。 一个或多个聚合物重复单元包含碳原子。 特别优选的是包含SiO 2或TiO 2重复单元的聚合物，其可以作为在短波长例如亚300nm成像的抗蚀剂的树脂组分非常有用， 亚200 nm。
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