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41.发明授权Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US07532309B2
公开(公告)日：2009-05-12
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
摘要翻译： 光刻设备包括可以完全浸没衬底的成像表面的流体限制板。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。
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42.发明申请Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US20080231822A1
公开(公告)日：2008-09-25
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地面积”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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43.发明申请Apparatus and methods for removing immersion liquid from substrates using temperature gradient 审中-公开使用温度梯度从底物中去除浸渍液体的设备和方法公开(公告)号：US20080212050A1
公开(公告)日：2008-09-04
申请号：US12068077
申请日：2008-02-01
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70341
摘要： Apparatus and methods assist in the removal of immersion liquid from a surface of a substrate. In particular, the apparatus/method removes immersion liquid from a surface of a substrate that has been subjected to immersion lithographic exposure. A temperature control unit controls a temperature of the substrate to create a temperature gradient across at least a portion of the surface of the substrate such that a first portion of the surface of the substrate has a first temperature that is higher than a second temperature of a second portion of the surface of the substrate. The temperature gradient induces the immersion liquid remaining on the substrate to move from the higher temperature portion(s) toward the lower temperature portion(s).
摘要翻译： 装置和方法有助于从衬底的表面去除浸没液体。 特别地，该装置/方法从浸没式光刻曝光的基板表面去除浸没液。 温度控制单元控制衬底的温度以在衬底的表面的至少一部分上产生温度梯度，使得衬底的表面的第一部分具有高于第一温度的第一温度 衬底表面的第二部分。 温度梯度引起残留在基板上的浸渍液体从较高温度部分向下温度部分移动。
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44.发明申请Immersion lithography system and method having a wafer chuck made of a porous material 审中-公开浸渍光刻系统和方法具有由多孔材料制成的晶片卡盘公开(公告)号：US20080100812A1
公开(公告)日：2008-05-01
申请号：US11907218
申请日：2007-10-10
CPC分类号： G03F7/70341 , G03F7/707
摘要： An immersion lithography apparatus having a substrate chuck made of a porous material. The porous substrate chuck is provided to contact and support the back surface of the substrate and hold the substrate in place. The porous substrate chuck facilitates in the removal of any immersion liquid under the substrate.
摘要翻译： 一种浸没式光刻设备，具有由多孔材料制成的基板卡盘。 提供多孔基材卡盘以接触和支撑基底的背面并将基底保持在适当的位置。 多孔基材卡盘有助于去除底物下的任何浸没液体。
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