Methods of fabricating trench isolation structures having varying depth
    42.
    发明授权
    Methods of fabricating trench isolation structures having varying depth 有权
    制造具有不同深度的沟槽隔离结构的方法

    公开(公告)号:US07521333B2

    公开(公告)日:2009-04-21

    申请号:US11363688

    申请日:2006-02-28

    IPC分类号: H01L21/76

    CPC分类号: H01L21/76229

    摘要: A device isolation structure of semiconductor device includes a semiconductor substrate having a cell region, a low voltage region and a high voltage region defined therein. A cell trench isolation region is disposed in the cell region. A low voltage trench isolation region is disposed in the low voltage region and extends deeper into the substrate than the cell trench isolation region. A first high voltage trench isolation region is disposed in the high voltage region and extends deeper into the substrate than the low voltage trench isolation region. A second high voltage trench isolation region is disposed in the high voltage region and extends deeper into the substrate than the low voltage trench isolation region but shallower than the first high voltage trench isolation region.

    摘要翻译: 半导体器件的器件隔离结构包括具有限定在其中的单元区域,低电压区域和高电压区域的半导体衬底。 电池沟槽隔离区设置在电池区中。 低电压沟槽隔离区域设置在低电压区域中并且比单元沟槽隔离区域更深地延伸到衬底中。 第一高电压沟槽隔离区设置在高电压区域中,并且比低电压沟槽隔离区域更深地延伸到衬底中。 第二高电压沟槽隔离区设置在高电压区域中,并且比低压沟槽隔离区域更深地延伸到衬底中,但比第一高电压沟槽隔离区域浅。

    Trench isolation structures for semiconductor devices and methods of fabricating the same
    43.
    发明申请
    Trench isolation structures for semiconductor devices and methods of fabricating the same 有权
    用于半导体器件的沟槽隔离结构及其制造方法

    公开(公告)号:US20060220171A1

    公开(公告)日:2006-10-05

    申请号:US11363688

    申请日:2006-02-28

    IPC分类号: H01L29/00

    CPC分类号: H01L21/76229

    摘要: A device isolation structure of semiconductor device includes a semiconductor substrate having a cell region, a low voltage region and a high voltage region defined therein. A cell trench isolation region is disposed in the cell region. A low voltage trench isolation region is disposed in the low voltage region and extends deeper into the substrate than the cell trench isolation region. A first high voltage trench isolation region is disposed in the high voltage region and extends deeper into the substrate than the low voltage trench isolation region. A second high voltage trench isolation region is disposed in the high voltage region and extends deeper into the substrate than the low voltage trench isolation region but shallower than the first high voltage trench isolation region.

    摘要翻译: 半导体器件的器件隔离结构包括具有限定在其中的单元区域,低电压区域和高电压区域的半导体衬底。 电池沟槽隔离区设置在电池区中。 低电压沟槽隔离区域设置在低电压区域中并且比单元沟槽隔离区域更深地延伸到衬底中。 第一高电压沟槽隔离区设置在高电压区域中,并且比低电压沟槽隔离区域更深地延伸到衬底中。 第二高电压沟槽隔离区设置在高电压区域中,并且比低压沟槽隔离区域更深地延伸到衬底中,但比第一高电压沟槽隔离区域浅。

    Obstruction-determining apparatus for preventing mobile robot from becoming obstructed and boundary-estimation method and medium using the obstruction-determining apparatus
    45.
    发明授权
    Obstruction-determining apparatus for preventing mobile robot from becoming obstructed and boundary-estimation method and medium using the obstruction-determining apparatus 失效
    用于防止移动机器人被阻挡的障碍物确定装置和使用障碍物确定装置的边界估计方法和介质

    公开(公告)号:US08521329B2

    公开(公告)日:2013-08-27

    申请号:US11898060

    申请日:2007-09-07

    IPC分类号: G05B19/418 G06F19/00

    摘要: An obstruction-determining apparatus for preventing a mobile robot from being obstructed in a niche and a boundary-estimation method and medium using the obstruction-determining apparatus are disclosed. More particularly, an obstruction-determining apparatus which can determine whether a mobile robot is obstructed in a niche, and enable a mobile robot to easily escape from an obstacle if the mobile robot is determined to be obstructed in the niche, and a boundary-estimation method and medium for estimating the boundaries of an obstacle with a niche using the obstruction-determining apparatus. The obstruction-determining apparatus includes a contact module which collides with an obstacle above the mobile robot, a contact-operating module which rotates or moves linearly as a result of the collision between the contact module and the obstacle, and a sensing module which detects the rotation or the linear movement of the contact-operating module and determines whether the mobile robot is obstructed in a niche.

    摘要翻译: 公开了一种用于防止移动机器人在利基中被阻碍的障碍物确定装置和使用障碍物确定装置的边界估计方法和介质。 更具体地,涉及一种障碍物判定装置,其能够判断移动机器人是否受到利基的阻碍,并且如果移动机器人被确定为在利基中被阻碍,则能够使移动机器人容易地从障碍物逃脱,并且边界估计 方法和介质,用于使用障碍物确定装置估计具有利基的障碍物的边界。 障碍物确定装置包括与移动机器人上方的障碍物相撞的接触模块,由于接触模块与障碍物之间的碰撞而线性旋转或移动的接触操作模块,以及检测模块 旋转或接触操作模块的线性移动,并确定移动机器人是否在利基中被阻挡。

    Semiconductor device having load resistor and method of fabricating the same
    46.
    发明授权
    Semiconductor device having load resistor and method of fabricating the same 有权
    具有负载电阻的半导体器件及其制造方法

    公开(公告)号:US07598536B2

    公开(公告)日:2009-10-06

    申请号:US11932740

    申请日:2007-10-31

    IPC分类号: H01L21/338

    摘要: A semiconductor device includes a semiconductor substrate having a resistor region, an isolation layer disposed in the resistor region, the isolation layer defining active regions, first conductive layer patterns disposed on the active regions, a second conductive layer pattern covering the first conductive layer patterns and disposed on the isolation layer, the second conductive layer pattern and the first conductive layer patterns constituting a load resistor pattern, an upper insulating layer disposed over the load resistor pattern, and resistor contact plugs disposed over the active regions, the resistor contact plugs penetrating the upper insulating layer to contact the load resistor pattern.

    摘要翻译: 半导体器件包括具有电阻器区域的半导体衬底,设置在电阻器区域中的隔离层,限定有源区的隔离层,设置在有源区上的第一导电层图案,覆盖第一导电层图案的第二导电层图案和 设置在隔离层上,第二导电层图案和构成负载电阻图案的第一导电层图案,设置在负载电阻图案上的上绝缘层和设置在有源区上的电阻器接触插塞,电阻器接触插塞穿透 上绝缘层接触负载电阻图案。

    Obstruction-determining apparatus for preventing mobile robot from becoming obstructed and boundary-estimation method and medium using the obstruction-determining apparatus
    49.
    发明申请
    Obstruction-determining apparatus for preventing mobile robot from becoming obstructed and boundary-estimation method and medium using the obstruction-determining apparatus 失效
    用于防止移动机器人被阻挡的障碍物确定装置和使用障碍物确定装置的边界估计方法和介质

    公开(公告)号:US20080084284A1

    公开(公告)日:2008-04-10

    申请号:US11898060

    申请日:2007-09-07

    IPC分类号: G05B15/00 B60Q1/00 G05B19/00

    摘要: An obstruction-determining apparatus for preventing a mobile robot from being obstructed in a niche and a boundary-estimation method and medium using the obstruction-determining apparatus are disclosed. More particularly, an obstruction-determining apparatus which can determine whether a mobile robot is obstructed in a niche, and enable a mobile robot to easily escape from an obstacle if the mobile robot is determined to be obstructed in the niche, and a boundary-estimation method and medium for estimating the boundaries of an obstacle with a niche using the obstruction-determining apparatus. The obstruction-determining apparatus includes a contact module which collides with an obstacle above the mobile robot, a contact-operating module which rotates or moves linearly as a result of the collision between the contact module and the obstacle, and a sensing module which detects the rotation or the linear movement of the contact-operating module and determines whether the mobile robot is obstructed in a niche.

    摘要翻译: 公开了一种用于防止移动机器人在利基中被阻碍的障碍物确定装置和使用障碍物确定装置的边界估计方法和介质。 更具体地,涉及一种障碍物判定装置,其能够判断移动机器人是否受到利基的阻碍,并且如果移动机器人被确定为在利基中被阻碍,则能够使移动机器人容易地从障碍物逃脱,并且边界估计 方法和介质,用于使用障碍物确定装置估计具有利基的障碍物的边界。 障碍物确定装置包括与移动机器人上方的障碍物相撞的接触模块,由于接触模块与障碍物之间的碰撞而线性旋转或移动的接触操作模块,以及检测模块 旋转或接触操作模块的线性移动,并确定移动机器人是否在利基中被阻挡。

    Semiconductor device having load resistor and method of fabricating the same

    公开(公告)号:US20060118909A1

    公开(公告)日:2006-06-08

    申请号:US11292633

    申请日:2005-12-02

    IPC分类号: H01L29/00

    摘要: A semiconductor device includes a semiconductor substrate having a resistor region, an isolation layer disposed in the resistor region, the isolation layer defining active regions, first conductive layer patterns disposed on the active regions, a second conductive layer pattern covering the first conductive layer patterns and disposed on the isolation layer, the second conductive layer pattern and the first conductive layer patterns constituting a load resistor pattern, an upper insulating layer disposed over the load resistor pattern, and resistor contact plugs disposed over the active regions, the resistor contact plugs penetrating the upper insulating layer to contact the load resistor pattern.