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343 条记录 (耗时 0.042 秒)

    Source module, radiation source and lithographic apparatus
    43.
    发明授权
    Source module, radiation source and lithographic apparatus 有权
    源模块，辐射源和光刻设备

    公开(公告)号：US08405055B2

    公开(公告)日：2013-03-26

    申请号：US12566060

    申请日：2009-09-24

    申请人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    发明人： Dzmitry Labetski ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels

    IPC分类号： H05H1/42

    CPC分类号： H05G2/001 ,  H05G2/003

    摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plasma that emits extreme ultraviolet radiation is generated when the beam of radiation impacts the fuel; a fuel particulate interceptor constructed and arranged to shield at least part of the radiation source from fuel particulates that are emitted by the plasma, the fuel particulate interceptor comprising a first portion and a second portion, the second portion being positioned closer to the plasma formation site than the first portion, and the first portion being rotatable; and a fuel particulate remover constructed and arranged to remove fuel particulates from a surface of the fuel particulate interceptor and to direct the fuel particulates towards a collection location.

    摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造成将燃料供应到等离子体形成位置的燃料供应; 激光器被配置为向等离子体形成位置发射辐射束，使得当辐射束影响燃料时产生发射极紫外辐射的等离子体; 燃料颗粒拦截器，其被构造和布置成将辐射源的至少一部分屏蔽在由等离子体发射的燃料颗粒中，所述燃料颗粒拦截器包括第一部分和第二部分，所述第二部分位于更靠近等离子体形成位置 并且所述第一部分可旋转; 以及构造和布置成从燃料颗粒拦截器的表面去除燃料颗粒并将燃料颗粒引导到收集位置的燃料颗粒去除器。

    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    45.
    发明申请
    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
    辐射源，光刻设备和器件制造方法

    公开(公告)号：US20100157267A1

    公开(公告)日：2010-06-24

    申请号：US12540542

    申请日：2009-08-13

    申请人： Hendrikus Gijsbertus SCHIMMEL ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

    发明人： Hendrikus Gijsbertus SCHIMMEL ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra

    IPC分类号： G03B27/54 ,  B01J19/12

    CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/003

    摘要： A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma generating EUV radiation. A mirrored collector collects and reflects the EUV radiation generated at a first focus towards a second focus. A contamination barrier is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime.

    摘要翻译： 用于产生极紫外辐射或用于高分辨率光刻的辐射源包括等离子体形成位置，其中燃料通过辐射束接触以形成等离子体产生的EUV辐射。 镜像收集器收集并反射在第一焦点处产生的EUV辐射朝向第二焦点。 定位污染屏障，污染屏障的周边不会堵塞在第二焦点处由反射镜对着的立体角的50％以上，使得由集光镜反射的EUV辐射不会通过污染物过度衰减 屏障。 污染屏障用于从等离子体中捕获诸如离子，原子，分子或纳米液体的燃料，以防止它们沉积到收集器反射镜上，从而减少镜的有效寿命。