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    Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope
    41.
    发明授权
    Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope 有权
    扫描探针显微镜和样本观察方法以及使用所述扫描探针显微镜的半导体器件制造方法

    公开(公告)号：US07323684B2

    公开(公告)日：2008-01-29

    申请号：US11439618

    申请日：2006-05-23

    申请人： Masahiro Watanabe ,  Toshihiko Nakata

    发明人： Masahiro Watanabe ,  Toshihiko Nakata

    IPC分类号： G01N13/16 ,  G01B5/28

    CPC分类号： G01Q10/06 ,  G01Q10/02 ,  G01Q20/02 ,  G01Q60/32 ,  Y10S977/852

    摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.

    摘要翻译： 为了提供一种扫描探针显微镜，能够与样品的局部特性相关的高通量分布信息同时测量而不损害样品的准确的三维形状信息，因此，每个测量位置的接近速度通过 通过提供光学类型的高灵敏度接近传感器来控制样品和探针的接近。 此外，通过以下方式可以获得关于样品的材料质量分布的附加信息，而不降低扫描速度：向探针施加电压，或测量振动探针时的响应，或检测样品表面的局部光强度 同时获得样品高度数据，同时与样品的接触期，同时确保探针未被拖动到样品上，通过使探针间断地与样品接触。

    Thermally assisted magnetic recording head inspection method and apparatus
    43.
    发明授权
    Thermally assisted magnetic recording head inspection method and apparatus 有权
    热辅助磁记录头检查方法和装置

    公开(公告)号：US08483035B2

    公开(公告)日：2013-07-09

    申请号：US13482065

    申请日：2012-05-29

    申请人： Kaifeng Zhang ,  Takenori Hirose ,  Masahiro Watanabe ,  Shinji Homma ,  Tsuneo Nakagomi ,  Teruaki Tokutomi ,  Toshihiko Nakata ,  Takehiro Tachizaki

    发明人： Kaifeng Zhang ,  Takenori Hirose ,  Masahiro Watanabe ,  Shinji Homma ,  Tsuneo Nakagomi ,  Teruaki Tokutomi ,  Toshihiko Nakata ,  Takehiro Tachizaki

    IPC分类号： G11B7/00 ,  G11B5/09

    CPC分类号： G11B5/455 ,  G11B2005/0021

    摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

    摘要翻译： 在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光 通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布 使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。

    INTERNAL DEFECT INSPECTION METHOD AND APPARATUS FOR THE SAME
    44.
    发明申请
    INTERNAL DEFECT INSPECTION METHOD AND APPARATUS FOR THE SAME 有权
    内部缺陷检查方法及其设备

    公开(公告)号：US20130160552A1

    公开(公告)日：2013-06-27

    申请号：US13819355

    申请日：2011-06-01

    申请人： Toshihiko Nakata ,  Tetsuya Matsui ,  Takehiro Tachizaki ,  Kazushi Yoshimura ,  Masahiro Watanabe

    发明人： Toshihiko Nakata ,  Tetsuya Matsui ,  Takehiro Tachizaki ,  Kazushi Yoshimura ,  Masahiro Watanabe

    IPC分类号： G01N29/22 ,  G01N29/04

    CPC分类号： G01N29/221 ,  G01N29/04 ,  G01N29/043 ,  G01N29/0654 ,  G01N29/2418

    摘要： It is intended to provide an internal defect inspection method and an apparatus for implementing the method by which an ultrasonic wave is excited in a sample without contact with the sample and accordingly without damaging the sample, and an ultrasonic wave from any internal defect of the sample is detected without being affected by the sample surface, in a non-contact state and with high sensitivity.By the internal defect inspection method, an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, an ultrasonic wave reflected by the sample is detected as an interference signal with an imaging type common-path interferometer, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal.

    摘要翻译： 旨在提供一种内部缺陷检查方法和实现这样一种方法的装置，其中超声波在样品中被激发而不与样品接触，因此不损伤样品，并且来自样品的任何内部缺陷的超声波 被检测而不受样品表面的影响，处于非接触状态并具有高灵敏度。 通过内部缺陷检查方法，从超声波发射器向样品发射超声波，将由样本反射的超声波作为干涉信号与成像式共轨干涉仪进行检测，从超声波信号 从超声波信号中检测出干扰信号和样本内的任何缺陷。

    Method and its apparatus for measuring displacement of a specimen
    48.
    发明申请
    Method and its apparatus for measuring displacement of a specimen 有权
    测量样品位移的方法及其装置

    公开(公告)号：US20090073457A1

    公开(公告)日：2009-03-19

    申请号：US12153227

    申请日：2008-05-15

    申请人： Toshihiko Nakata ,  Masahiro Watanabe

    发明人： Toshihiko Nakata ,  Masahiro Watanabe

    IPC分类号： G01B11/02

    CPC分类号： G01B9/02081 ,  G01B9/02018 ,  G01B2290/30 ,  G01B2290/70

    摘要： In measuring the displacement of an object using the phase-shifting light interference, since three beam splitters were used for generating the four phase-shifting optical paths, an interferometer was increased in size, whereby the application objects were limited. Also, to solve an essential problem that if there is a disturbance such as a temperature distribution, a humidity distribution, an air pressure distribution, a density distribution or an air flow change on the phase-shifting optical paths, a measurement error occurs, the four phase-shifting optical paths are produced spatially in parallel by combining a four division prism with a photonic crystal λ/4 element and a photonic crystal polarizing element arranged like an array, constructing a small light interference displacement sensor in the invention, whereby the application objects are expanded, and the microscopic displacement or surface roughness of the object can be measured at a resolution of sub nanometer or less and with high reproducibility without influence of the disturbance.

    摘要翻译： 在使用相移光干涉来测量物体的位移时，由于使用三个分束器来产生四个移相光路，因此干涉仪的尺寸增加，由此施加物体受到限制。 此外，为了解决如果在移相光路上存在诸如温度分布，湿度分布，空气压力分布，密度分布或气流变化等干扰的测量误差，则发生测量误差， 通过组合四分割棱镜与光子晶体λ/ 4元件和排列成阵列的光子晶体偏振元件在本发明中构成小型光干涉位移传感器，四个相移光路被空间地产生，由此应用 物体被扩大，并且物体的微观位移或表面粗糙度可以以亚纳米或更小的分辨率测量，并且具有高重现性而不受干扰的影响。

    Defect detector and defect detecting method
    49.
    发明授权
    Defect detector and defect detecting method 有权
    缺陷检测器和缺陷检测方法

    公开(公告)号：US07417721B2

    公开(公告)日：2008-08-26

    申请号：US10536715

    申请日：2003-11-27

    申请人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

    发明人： Sachio Uto ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Akira Hamamatsu ,  Takahiro Jingu ,  Toshihiko Nakata ,  Masahiro Watanabe

    IPC分类号： G01N21/00

    CPC分类号： G01N21/00 ,  G01N21/9501 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.

    摘要翻译： 一种缺陷检查装置，具有：在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统，用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统，包括：用于接收从检查对象基板向上发射的上方反射/散射光的上位光检测器，从而将其转换为高定向图像信号;以及侧向光检测器， 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向，以与照明光束平坦地相交，从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

    Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope
    50.
    发明申请
    Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope 有权
    扫描探针显微镜和样本观察方法以及使用所述扫描探针显微镜的半导体器件制造方法

    公开(公告)号：US20060219900A1

    公开(公告)日：2006-10-05

    申请号：US11439618

    申请日：2006-05-23

    申请人： Masahiro Watanabe ,  Toshihiko Nakata

    发明人： Masahiro Watanabe ,  Toshihiko Nakata

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： G01Q10/06 ,  G01Q10/02 ,  G01Q20/02 ,  G01Q60/32 ,  Y10S977/852

    摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.

    摘要翻译： 为了提供一种扫描探针显微镜，能够与样品的局部特性相关的高通量分布信息同时测量而不损害样品的准确的三维形状信息，因此，每个测量位置的接近速度通过 通过提供光学类型的高灵敏度接近传感器来控制样品和探针的接近。 此外，通过以下方式可以获得关于样品的材料质量分布的附加信息，而不降低扫描速度：向探针施加电压，或测量振动探针时的响应，或检测样品表面的局部光强度 同时获得样品高度数据，同时与样品的接触期，同时确保探针未被拖动到样品上，通过使探针间断地与样品接触。