Abstract:
A method of manufacturing a liquid crystal display includes: forming a sacrificial layer by stacking a non-photosensitive resin; initiating formation of an etch stop layer on the sacrificial layer; forming a photoresist pattern; completing the etch stop layer using the photoresist pattern; ashing the photoresist pattern and the sacrificial layer by using the completed etch stop layer as a mask; forming a microcavity by removing the sacrificial layer; and forming a liquid crystal layer in the microcavity. The horizontal area occupied by the sacrificial layer is reduced by forming the common electrode or the etch stop layer at an upper side, thereby increasing the aperture ratio. Further, the vertical electric field is generated without distortion by horizontally forming the common electrode on the sacrificial layer and forming no common electrode on the sidewall thereof.
Abstract:
A thin film transistor array substrate. The thin film transistor array substrate includes a stacked structure of: a light permeable substrate having a trench; a light blocking layer partially or entirely accommodated in the trench; a gate wiring formed on the light blocking layer; a semiconductor pattern layer formed on the gate wiring; and a data wiring formed on the semiconductor pattern layer.
Abstract:
A liquid crystal display includes: a substrate including a major surface; a thin film transistor disposed over the substrate; a pixel electrode connected to the thin film transistor and disposed over the thin film transistor; a common electrode facing the pixel electrode; a roof layer disposed over the common electrode; a microcavity disposed between the pixel electrode and the common electrode; and a liquid crystal material contained in the microcavity, in which a side wall of the microcavity has an angle of 80° to 90° with respect to the major surface.