公开(公告)号：US20090178617A1

公开(公告)日：2009-07-16

申请号：US12406407

申请日：2009-03-18

申请人： John M. White ,  Robin L. Tiner ,  Beom Soo Park ,  Wendell T. Blonigan

发明人： John M. White ,  Robin L. Tiner ,  Beom Soo Park ,  Wendell T. Blonigan

IPC分类号： C23C16/513

CPC分类号： H01J37/32082 ,  H01J37/32174

摘要： An apparatus for providing a short return current path for RF current between a process chamber wall and a substrate support is provided. The RF grounding apparatus, which is RF grounded and is place above the substrate transfer port, establishes electrical contact with the substrate support only during substrate processing, such as deposition, to provide return current path for the RF current. One embodiment of the RF grounding apparatus comprises one or more low impedance flexible curtains, which are electrically connected to the grounded chamber wall, and to one or more low impedance blocks, which make contacts with the substrate support during substrate processing. Another embodiment of the RF grounding apparatus comprises a plurality of low impedance flexible straps, which are electrically connected to the grounded chamber wall, and to one or more low impedance blocks, which make contacts with the substrate support during substrate processing. Yet another embodiment of the RF grounding apparatus comprises a plurality of probes, which either are electrically connected to the grounded chamber wall or are grounded by other means, and actuators accompanying the probes. The actuators move the probes to make electrical contact with the substrate support during substrate processing.

摘要翻译： 提供一种用于在处理室壁和衬底支撑件之间提供用于RF电流的短的返回电流路径的装置。 射频接地装置，其RF接地并位于衬底传送端口之上，仅在衬底处理（例如沉积）期间与衬底支撑件电接触，以提供RF电流的返回电流路径。 RF接地装置的一个实施例包括电连接到接地室壁的一个或多个低阻抗柔性窗帘，以及在衬底处理期间与衬底支撑件接触的一个或多个低阻抗块。 RF接地装置的另一实施例包括多个低阻抗柔性带，其电连接到接地室壁，以及一个或多个低阻抗块，其在衬底处理期间与衬底支撑件接触。 RF接地装置的另一个实施例包括多个探针，它们或者被电连接到接地室壁，或者通过其它装置接地，以及伴随探头的致动器。 致动器在衬底处理期间移动探针以与衬底支撑件电接触。

公开(公告)号：US07375946B2

公开(公告)日：2008-05-20

申请号：US10919457

申请日：2004-08-16

申请人： John M. White ,  Wendell T. Blonigan

发明人： John M. White ,  Wendell T. Blonigan

IPC分类号： H01T23/00

CPC分类号： H01L21/6831 ,  C23C16/4586 ,  C23C16/5096

摘要： A method and apparatus for dechucking a substrate is provided. In one embodiment, a processing chamber is provided that includes a grounded chamber body having a substrate support assembly disposed in an interior volume. A dechucking circuit selectively couples the substrate support assembly to ground or to a power source. In another embodiment of the invention, a method for dechucking a substrate includes the steps of completing a plasma process on a substrate disposed on a grounded substrate support assembly, disconnecting the substrate support assembly from ground, and applying a dechucking voltage to the substrate support assembly.

摘要翻译： 提供了一种用于去除基板的方法和装置。 在一个实施例中，提供了处理室，其包括接地室主体，其具有设置在内部容积中的基板支撑组件。 解扣电路将衬底支撑组件选择性地耦合到地或电源。 在本发明的另一个实施例中，一种用于对基板进行去夹套的方法包括以下步骤：在设置在接地的基板支撑组件上的基板上完成等离子体处理，将基板支撑组件从地面断开，以及向基板支撑组件施加脱扣电压 。

公开(公告)号：US06206176B1

公开(公告)日：2001-03-27

申请号：US09082605

申请日：1998-05-20

申请人： Wendell T. Blonigan ,  John M. White

发明人： Wendell T. Blonigan ,  John M. White

IPC分类号： B65G3500

CPC分类号： H01L21/67742 ,  H01L21/67709 ,  H01L21/6776 ,  Y10S414/139

摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.

摘要翻译： 一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。 具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。 因此，小齿轮的旋转将使梭子沿线性路径移动。 磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。 一个机架和一个小齿轮位于梭子的每一侧。 一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。

公开(公告)号：US08365682B2

公开(公告)日：2013-02-05

申请号：US11140777

申请日：2005-05-31

申请人： Wendell T. Blonigan ,  Carl Sorensen ,  John M. White ,  Robin L. Tiner

发明人： Wendell T. Blonigan ,  Carl Sorensen ,  John M. White ,  Robin L. Tiner

IPC分类号： B65G49/07

CPC分类号： H01L21/67259 ,  H01L21/68742 ,  H01L21/68778

摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.

摘要翻译： 衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。 在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为 感受器被升高并且防止由此产生的基板不均匀的支撑。

公开(公告)号：US07296673B2

公开(公告)日：2007-11-20

申请号：US11176861

申请日：2005-07-07

申请人： Wendell T. Blonigan ,  John M. White

发明人： Wendell T. Blonigan ,  John M. White

IPC分类号： B65G47/46

CPC分类号： B65G49/064 ,  B65G2249/02 ,  B65G2249/04 ,  H01L21/67706 ,  H01L21/67709 ,  H01L21/67736

摘要： Embodiments of a vacuum conveyor system are provided herein. In one embodiment, apparatus for conveying a substrate includes a vacuum sleeve and a plurality of rollers disposed within the vacuum sleeve for supporting and transporting the substrate thereupon. The plurality of rollers is adapted to simultaneously support the substrate thereupon at a plurality of elevations. A leading edge of the substrate is supported at an elevation above an adjacent one of the plurality of rollers in the direction of travel.

摘要翻译： 本文提供了真空输送系统的实施例。 在一个实施例中，用于输送基板的装置包括真空套筒和设置在真空套筒内的多个辊，用于在其上支撑和运输基板。 多个辊适于在多个高度处同时支撑基底。 基板的前缘在行进方向上支撑在多个辊中的相邻的一个上方的高度上。

公开(公告)号：US07017269B2

公开(公告)日：2006-03-28

申请号：US10729565

申请日：2003-12-05

申请人： John M. White ,  Ernst Keller ,  Wendell T. Blonigan

发明人： John M. White ,  Ernst Keller ,  Wendell T. Blonigan

IPC分类号： B23P15/00 ,  C23C16/455 ,  H01L21/00

CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/5096 ,  H01J37/3244 ,  Y10T29/49428 ,  Y10T29/49826

摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber.

摘要翻译： 一种用于等离子体室的气体入口歧管，其具有由柔性侧壁悬挂的穿孔气体分配板。 柔性悬架使气体分配板的热膨胀的机械应力最小化。 在另一方面，悬架提供气体分配板和腔室的其它部件之间的热隔离。

公开(公告)号：US06881276B2

公开(公告)日：2005-04-19

申请号：US10393311

申请日：2003-03-18

申请人： Wendell T. Blonigan ,  James T. Gardner

发明人： Wendell T. Blonigan ,  James T. Gardner

IPC分类号： H01L21/205 ,  C23C14/56 ,  C23C16/44 ,  H01J37/32 ,  B08B7/04

CPC分类号： C23C14/564 ,  C23C16/4405 ,  H01J37/32862 ,  H01J37/32963 ,  Y10S438/905

摘要： A method and apparatus for cleaning a CVD chamber including optoelectronic detection of the completion or endpoint of the cleaning procedure once a ratio of emission lines reaches a threshold value. The method comprises the steps of: providing a plasma of a cleaning gas into the chamber and creating a plasma from the cleaning gas. The intensity of emission lines of the cleaning gas and of at least one background gas in the chamber are monitored. A ratio of the intensity of the cleaning gas emission line to the intensity of the background gas emission line is determined and monitored as a function of time. The determined ratio is compared to a preset threshold calibration value. The flow of gas is controlled based on the comparing step. The apparatus includes a cleaning gas supply with a valved inlet providing an entrance to the interior of the chamber for passing cleaning gas to the interior of the chamber. A detector having an optical input is disposed for sensing the electromagnetic radiation. The detector has a first channel for detecting a relative intensity of an emission line corresponding to the cleaning gas and a second channel for detecting a relative intensity of the emission line corresponding to the background gases. Software or circuitry is employed to determine a normalized signal using a signal from the first channel and a signal from the second channel. The value of the normalized signal is substantially invariant with respect to simultaneous corresponding changes in the intensity of the signal measured by the first channel and the intensity of the signal measured by the second channel.

摘要翻译： 一旦发射线的比率达到阈值，清洁CVD室的方法和装置包括清洁程序的完成或终点的光电检测。 该方法包括以下步骤：将清洁气体的等离子体提供到室中并从清洁气体产生等离子体。 监测清洁气体和室中的至少一种背景气体的排放线的强度。 根据时间的函数确定和监测清洁气体排放管线的强度与背景气体排放管线的强度的比率。 将确定的比率与预设的阈值校准值进行比较。 基于比较步骤控制气体流量。 该设备包括具有阀门入口的清洁气体供应器，该入口提供到室的内部的入口，用于将清洁气体传送到室的内部。 设置具有光学输入的检测器用于感测电磁辐射。 检测器具有用于检测对应于清洁气体的发射线的相对强度的第一通道和用于检测对应于背景气体的发射线的相对强度的第二通道。 使用软件或电路来使用来自第一信道的信号和来自第二信道的信号来确定归一化信号。 归一化信号的值相对于由第一通道测量的信号的强度的同时相应变化和由第二通道测量的信号的强度基本上是不变的。

公开(公告)号：US06552297B2

公开(公告)日：2003-04-22

申请号：US10003129

申请日：2001-11-01

申请人： Wendell T. Blonigan ,  Carl A. Sorensen

发明人： Wendell T. Blonigan ,  Carl A. Sorensen

IPC分类号： B23K1000

CPC分类号： H01J37/32174 ,  H01J37/32082

摘要： An apparatus for distributing RF power outputs to a first electrode in a parallel plate electrode system for generating plasma in depositing films on a substrate. A RF power output is applied to a distributed RF matching network to excite a plasma from a process gas stream to deposit a uniform film onto the substrate. The distributed matching network includes a load capacitor for receiving a radio frequency power input and an inductor having first and second ends with the first end coupled to the load capacitor. The matching network also includes multiple drive capacitors each of which couples the second end of the inductor to a different one of multiple points distributed on the first electrode. The capacitance of each drive capacitor is user-selectable, and the points on the backing plate to which the drive capacitors are coupled are user-selectable.

公开(公告)号：US06471459B2

公开(公告)日：2002-10-29

申请号：US09447930

申请日：1999-11-23

申请人： Wendell T. Blonigan ,  John M. White

发明人： Wendell T. Blonigan ,  John M. White

IPC分类号： B65G4907

CPC分类号： H01L21/67742 ,  H01L21/67709 ,  H01L21/6776 ,  Y10S414/139

摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.

摘要翻译： 一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。 具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。 因此，小齿轮的旋转将使梭子沿线性路径移动。 磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。 一个机架和一个小齿轮位于梭子的每一侧。 一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。

公开(公告)号：US06286230B1

公开(公告)日：2001-09-11

申请号：US09391012

申请日：1999-09-07

申请人： John M. White ,  Wendell T. Blonigan ,  Michael W. Richter

发明人： John M. White ,  Wendell T. Blonigan ,  Michael W. Richter

IPC分类号： F26B504

CPC分类号： H01L21/67173 ,  H01L21/67017 ,  Y10S414/139

摘要： A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled.

摘要翻译： 一种在位于邻近处理室和背靠背处理室的可抽空室中以及可抽空室和处理室的其它组合之间传送和处理衬底的方法。 该方法包括使用设置在相邻室之间的各种隔离阀以及气体流量阀和真空阀。 通过控制阀的位置，可以控制进出不同室的气体流量。