公开(公告)号：US20060144711A1

公开(公告)日：2006-07-06

申请号：US10534232

申请日：2003-07-18

申请人： Itsuki Kobata ,  Masayuki Kumekawa ,  Osamu Nabeya ,  Roberto Serikawa ,  Takayuki Saito ,  Tsukuru Suzuki ,  Akira Kodera ,  Hozumi Yasuda ,  Takeshi Iizumi ,  Mitsuhiko Shirakashi

发明人： Itsuki Kobata ,  Masayuki Kumekawa ,  Osamu Nabeya ,  Roberto Serikawa ,  Takayuki Saito ,  Tsukuru Suzuki ,  Akira Kodera ,  Hozumi Yasuda ,  Takeshi Iizumi ,  Mitsuhiko Shirakashi

IPC分类号： B23H7/20

CPC分类号： B23H3/02 ,  B23H5/08 ,  B23H9/00

摘要： A object of this invention is to provide an electrolytic processing method and apparatus that can suppress a change in the electric conductivity of a fluid due to contaminants, such as processing products produced in electrolytic processing, so that the fluid can maintain good flattening properties. The electrolytic processing apparatus of this invention includes: a processing electrode (42) that can come into contact with a workpiece (W); a feeding electrode (44) for feeding electricity to the workpiece (W); a holder (22) for holding the workpiece (W); a power source (26) for applying a voltage between the processing electrode (42) and the feeding electrode (44); a fluid supply section (50) for supplying a fluid between the workpiece (W) and at least one of the processing electrode (42) and the feeding electrode (44); a sensor (80) for measuring the electric conductivity of the fluid; and a control section (84) for changing the processing conditions based on the electric conductivity measured by the sensor (80).

摘要翻译： 本发明的目的是提供一种电解处理方法和装置，其可以抑制由电解处理中产生的加工产品等污染物引起的流体的导电性变化，使得流体能够保持良好的平坦化性能。 本发明的电解处理装置包括：可与工件（W）接触的处理电极（42）; 用于向工件（W）供电的供电电极（44）; 用于保持工件（W）的保持器（22）; 用于在处理电极（42）和馈电电极（44）之间施加电压的电源（26）; 用于在工件（W）和处理电极（42）和馈电电极（44）中的至少一个之间供应流体的流体供应部分（50）; 用于测量流体的电导率的传感器（80）; 以及用于根据由传感器（80）测量的电导率来改变处理条件的控制部分（84）。

公开(公告)号：US20050115838A1

公开(公告)日：2005-06-02

申请号：US10500576

申请日：2003-01-07

申请人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Masayuki Kumekawa ,  Hozumi Yasuda ,  Itsuki Kobata ,  Yasushi Toma

发明人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Masayuki Kumekawa ,  Hozumi Yasuda ,  Itsuki Kobata ,  Yasushi Toma

IPC分类号： B23H3/00 ,  B23H3/08 ,  B23H5/08 ,  C25F3/00 ,  C25F7/00 ,  C25B9/04 ,  C25D21/12

CPC分类号： B23H3/08 ,  B23H3/00 ,  B23H5/08 ,  C25F3/00 ,  C25F7/00

摘要： There is provided an electrolytic processing apparatus and method that can effect processing of a substrate with high processing precision and can produce an intended form of processed substrate with high accuracy of form. The electrolytic processing apparatus includes: a holder (30) for holding a substrate (W); a processing electrode (32) that can come close to the substrate; a feeding electrode (34) for feeding electricity to the substrate; an ion exchanger (40) disposed in the space between the substrate and the processing electrode, or the substrate and the feeding electrode; a fluid supply section (70) for supplying a fluid into the space; a power source (68) for applying a voltage between the processing electrode and the feeding electrode; a drive sections (44, 56 and 60) for allowing the substrate and the processing electrode, facing each other, to make a relative movement; and a numerical controller (72) for effecting a numerical control of the drive sections. ATTACHMENT “B”

摘要翻译： 提供了一种能够以高加工精度对基板进行加工的电解处理装置和方法，并且可以以高精度的形式产生预期形式的处理基板。 电解处理装置包括：用于保持基板（W）的保持器（30）。 可以靠近所述基板的处理电极（32）; 用于向基板供电的供电电极（34）; 设置在基板和处理电极之间的空间中的离子交换器（40），或基板和馈电电极; 用于将流体供应到所述空间中的流体供应部分（70） 用于在所述处理电极和所述馈电电极之间施加电压的电源（68）; 用于允许基板和处理电极彼此面对的驱动部分（44,56和60）进行相对运动; 以及用于对驱动部进行数值控制的数值控制器（72）。 附件“B”

公开(公告)号：US20050051432A1

公开(公告)日：2005-03-10

申请号：US10498042

申请日：2002-12-11

申请人： Mitsuhiko Shirakashi ,  Masayuki Kumekawa ,  Hozumi Yasuda ,  Itsuki Kobata

发明人： Mitsuhiko Shirakashi ,  Masayuki Kumekawa ,  Hozumi Yasuda ,  Itsuki Kobata

IPC分类号： B23H3/02 ,  B23H5/08 ,  C25F3/00 ,  C25F7/00 ,  H01L21/321 ,  C25D21/12 ,  C25D5/00

CPC分类号： C25F7/00 ,  B23H3/02 ,  B23H5/08 ,  C25F3/00 ,  H01L21/32125

摘要： There is provided an electrolytic processing apparatus and method that can effect processing of a workpiece with high processing precision and can produce an intended form of processed workpiece with high accuracy of form. The electrolytic processing apparatus includes: a processing electrode which can come close to a workpiece; a feeding electrode for feeding electricity to the workpiece; an ion exchanger disposed in at least one of the space between the workpiece and the processing electrode and the space between the workpiece and the feeding electrode; a fluid supply section for supplying a fluid to the space between the workpiece and at least one of the processing electrode and the feeding electrode; and a power source for supplying an electric power between the processing electrode and the feeding electrode while arbitrarily controlling at least one of a voltage and an electric current.

摘要翻译： 提供了能够以高加工精度对工件进行加工的电解处理装置和方法，并且可以以高精度的形式产生加工工件的预期形式。 该电解处理装置包括：可接近工件的处理电极; 用于向工件供电的供电电极; 离子交换器，其设置在所述工件和所述处理电极之间的空间中的至少一个和所述工件与所述馈电电极之间的空间中; 流体供应部分，用于将流体供应到工件与处理电极和馈电电极中的至少一个之间的空间; 以及用于在任意地控制电压和电流中的至少一个的同时在所述处理电极和所述馈电电极之间提供电力的电源。

公开(公告)号：US06743349B2

公开(公告)日：2004-06-01

申请号：US09897913

申请日：2001-07-05

申请人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Yasushi Toma ,  Itsuki Kobata ,  Takayuki Saito

发明人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Yasushi Toma ,  Itsuki Kobata ,  Takayuki Saito

IPC分类号： C25F316

CPC分类号： B23H3/00 ,  B23H3/08

摘要： An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure water. The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.

公开(公告)号：US06602396B2

公开(公告)日：2003-08-05

申请号：US09996674

申请日：2001-11-30

申请人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Takayuki Saito ,  Yasushi Toma ,  Akira Fukunaga ,  Itsuki Kobata

发明人： Yuzo Mori ,  Mitsuhiko Shirakashi ,  Takayuki Saito ,  Yasushi Toma ,  Akira Fukunaga ,  Itsuki Kobata

IPC分类号： B23H300

CPC分类号： C25F3/00 ,  B23H3/08

摘要： An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.