公开(公告)号：US20170044009A1

公开(公告)日：2017-02-16

申请号：US15339149

申请日：2016-10-31

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Simon Joshua Jacobs

IPC: B81C1/00 ,  G02B1/115 ,  G02B26/08 ,  B81B7/00

CPC classification number: B81C1/00317 ,  B81B3/0083 ,  B81B7/0067 ,  B81B2201/042 ,  B81B2207/015 ,  B81C1/00047 ,  B81C1/00119 ,  B81C1/00261 ,  B81C1/00269 ,  B81C1/00595 ,  B81C2201/014 ,  B81C2203/0109 ,  B81C2203/0118 ,  B81C2203/0127 ,  B81C2203/0145 ,  B81C2203/0735 ,  B81C2203/0771 ,  G02B1/115 ,  G02B26/0833

Abstract: For an optical electronic device and method that forms cavities through an interposer wafer after bonding the interposer wafer to a window wafer, the cavities are etched into the bonded interposer/window wafer pair using the anti-reflective coating of the window wafer as an etch stop. After formation of the cavities, the bonded interposer/window wafer pair is bonded peripherally of die areas to the MEMS device wafer, with die area micromechanical elements sealed within respectively corresponding ones of the cavities.

Abstract translation: 对于在将插入器晶片粘合到窗户晶片之后通过插入器晶片形成空腔的光学电子器件和方法，使用窗口晶片的抗反射涂层将空腔蚀刻到粘合的插入物/窗口晶片对中作为蚀刻停止 。 在形成空腔之后，结合的插入物/窗口晶片对在管芯区域周围被结合到MEMS器件晶片，其中管芯区域微机械元件分别密封在相应的一个空腔中。

公开(公告)号：US08803296B2

公开(公告)日：2014-08-12

申请号：US13784423

申请日：2013-03-04

Applicant: Texas Instruments Incorporated

Inventor： William Robert Morrison ,  Mark Christopher Fisher ,  Murali Hanabe ,  Ganapathy Subramaniam Sivakumar ,  Simon Joshua Jacobs

IPC: H01L23/58 ,  B81C1/00 ,  B81B7/00

CPC classification number: B81C1/00984 ,  B81B3/0005 ,  B81B7/0032 ,  B81C1/00261 ,  B81C1/0096 ,  B81C2201/112 ,  H01L21/02112 ,  H04W4/02 ,  Y10S257/914

Abstract: A device has a microelectromechanical system (MEMS) component with at least one surface and a coating disposed on at least a portion of the surface. The coating has a compound of the formula M(CnF2n+1Or), wherein M is a polar head group and wherein n≧2r. The value of n may range from 2 to about 20, and the value of r may range from 1 to about 10. The value of n plus r may range from 3 to about 30, and a ratio of n:r may have a value of about 2:1 to about 20:1.

Abstract translation: 器件具有微机电系统（MEMS）部件，其中至少一个表面和涂层设置在表面的至少一部分上。 该涂层具有式M（CnF2n + 10r）的化合物，其中M是极性头基，其中n≥2r。 n的值可以在2至约20的范围内，并且r的值可以在1至约10的范围内.n加r的值可以在3至约30的范围内，并且n：r的比可以具有值 为约2：1至约20：1。