摘要:
An image forming apparatus including: a first and a second photoconductor groups constituted of one or more photoconductors respectively; a first and a second drive control sections for controlling the drive of the first and the second photoconductor groups respectively to rotate the photoconductors thereof, wherein the rotational phases of the first photoconductor group and the second photoconductor group are adjusted to be matched therebetween; and the first and the second drive control sections control so that the first and the second photoconductor groups are driven simultaneously with an equal target speed during a formation of a image, wherein an initial drive speed is lower than a predetermined speed for image-formation, and after the first and the second photoconductor groups reaches the initial drive speed, the target speed is changed from the initial drive speed to the speed for image-formation.
摘要:
A method of designing a wiring structure of an LSI is capable of reducing a capacitance variation ratio ΔC/C or a resistance-by-capacitance variation ratio Δ(RC)/(RC) of the wiring structure. The method sets a process-originated variation ratio (∈P) for the wiring structure, a tolerance (ξC) for the capacitance variation ratio (ΔC/C), and a tolerance (ξRC) for the resistance-by-capacitance variation ratio (Δ(RC)/(RC)), evaluates a fringe capacitance ratio (F=CF/CP) according to a fringe capacitance CF and parallel-plate capacitance CP of the wiring structure, and determines the wiring structure so that the fringe capacitance ratio (F) may satisfy the following: For Δ C C ≤ ξ C , F ≥ δ P ξ C - 1 ( 1 ) For Δ ( RC ) RC ≤ ξ RC , F ≤ ( 1 - δ P ) δ P δ P - ξ RC - 1 ( 2 ) The method employs an equivalent-variations condition defined as |ΔC/C|=|Δ(RC)/(RC)| to determine the shape parameters of each wire of the wiring structure.
摘要:
The present invention provides a solid-state image pickup apparatus which is able to easily discharge signal charges in a signal accumulating section and which is free from reduction in the dynamic range of the element, thermal noise in a dark state, an image-lag and so forth even if the pixel size of the MOS solid-state image pickup apparatus is reduced, the voltage of a reading gate is lowered and the concentration in the well is raised. The solid-state image pickup apparatus according to the present invention incorporates a p-type silicon substrate having a surface on which a p+ diffusion layer for constituting a photoelectric conversion region and a drain of a reading MOS field effect transistor are formed. A signal accumulating section formed by an n-type diffusion layer is formed below the p+ diffusion layer. A gate electrode of the MOS field effect transistor is, on the surface of the substrate, formed between the p+ diffusion layer and the drain. The position of an end of the signal accumulating section adjacent to the gate electrode of the MOS transistor extends over the end of the reading gate electrode of the p+ diffusion layer to a position below the gate electrode.
摘要:
The present invention provides a solid-state image pickup apparatus which is able to easily discharge signal charges in a signal accumulating section and which is free from reduction in the dynamic range of the element, thermal noise in a dark state, an image-lag and so forth even if the pixel size of the MOS solid-state image pickup apparatus is reduced, the voltage of a reading gate is lowered and the concentration in the well is raised. The solid-state image pickup apparatus according to the present invention incorporates a p-type silicon substrate having a surface on which a p+ diffusion layer for constituting a photoelectric conversion region and a drain of a reading MOS field effect transistor are formed. A signal accumulating section formed by an n-type diffusion layer is formed below the p+ diffusion layer. A gate electrode of the MOS field effect transistor is, on the surface of the substrate, formed between the p+ diffusion layer and the drain. The position of an end of the signal accumulating section adjacent to the gate electrode of the MOS transistor extends over the end of the reading gate electrode of the p+ diffusion layer to a position below the gate electrode.
摘要:
A wiring structure of a semiconductor device, includes a wiring layer formed on an insulating film, a width (W) of each wire in the wiring layer and a thickness (H) of the insulating film satisfying “W/H
摘要翻译:半导体器件的布线结构包括形成在绝缘膜上的布线层,布线层中的布线的宽度(W)和绝缘膜的厚度(H)满足“W / H <1”的长度 布线层中的各布线的长度(L)等于或大于1mm。
摘要:
In the disclosed invention, the influence of the dispersions of the gate lengths and the gate widths is prevented from adversely affecting circuit parameters except for the specific circuit parameter. According to this invention, the circuit parameters can be correctly extracted, and circuit characteristics can be accurately predicted.
摘要:
The present invention provides a solid-state image pickup apparatus which is able to easily discharge signal charges in a signal accumulating section and which is free from reduction in the dynamic range of the element, thermal noise in a dark state, an image-lag and so forth even if the pixel size of the MOS solid-state image pickup apparatus is reduced, the voltage of a reading gate is lowered and the concentration in the well is raised. The solid-state image pickup apparatus according to the present invention incorporates a p-type silicon substrate having a surface on which a p+ diffusion layer for constituting a photoelectric conversion region and a drain of a reading MOS field effect transistor are formed. A signal accumulating section formed by an n-type diffusion layer is formed below the p+ diffusion layer. A gate electrode of the MOS field effect transistor is, on the surface of the substrate, formed between the p+ diffusion layer and the drain. The position of an end of the signal accumulating section adjacent to the gate electrode of the MOS transistor extends over the end of the reading gate electrode of the p+ diffusion layer to a position below the gate electrode.
摘要:
A solid state imaging device comprises a plurality of unit cells formed in a surface region of a semiconductor substrate. Each of the unit cells comprises a photoelectric converter, an MOS-type read-out transistor for reading a signal from the photoelectric converter, an MOS-type amplifying transistor having a gate connected to a drain of the read-out transistor and for amplifying the signal read by the read-out transistor, a reset transistor having a source connected to the drain of the read-out transistor and for resetting a potential of a gate of the amplifying transistor, and an addressing element connected in series to the amplifying transistor and for selecting the unit cell. The read-out transistor is formed in a first device region in the semiconductor substrate. The reset transistor is formed in a second device region in the semiconductor substrate. The drain of the read-out transistor is connected to the source of the reset transistor through a wiring layer formed on the surface of the semiconductor substrate.
摘要:
A scroll type compressor having a housing unit in which a movable scroll element and a stationary scroll element are received in such a relationship that the movable scroll element orbits about the center of the stationary scroll element. The scroll type compressor further having a mechanical reinforced rotation preventing unit for preventing rotation of the movable scroll element about its own axis, and the rotation preventing unit having first stationary pin fixed to an inner end face of the housing unit and second movable pin fixed to an end face of a base plate of the movable scroll element, and a ring engaged with the first and second rings. A thickness T1 between the outer circumference of the first pin and the inner edge of the inner end face of the housing unit is set to be equal to or larger than 2.4 mm. A thickness T2 between the outer circumference of the second pin and the outer circumference of the base plate of the movable scroll element is set to be equal to or larger than 2.7 mm. A radial wall thickness T3 of the ring between the outer and inner cylindrical surfaces thereof is set to be equal to or larger than 1.7 mm.
摘要:
A scroll type compressor includes a front housing, a fixed scroll, a movable scroll and a rear housing, and its lateral cross section has a substantially oval shape. The spiral element of the movable scroll is located in the space defined by the front housing and the fixed scroll in such a way as to engage with the spiral element of the fixed scroll. The space defined by the fixed scroll and the rear housing serves as a discharge chamber where compressed refrigerant gas is discharged. Since this compressor has the same compression displacement as that of a compressor having a circular cross section, this compressor can be placed in narrow space whose width is less than the width of the circular compressor, without any reduction in the cooling performance.