公开(公告)号：US3402120A

公开(公告)日：1968-09-17

申请号：US37163964

申请日：1964-06-01

Applicant: GEN ELECTRIC

Inventor： MERTON ALLEN ,  SCHROM EDWARD C

IPC: A23L3/00 ,  A23L3/015 ,  A23L3/26 ,  A23L3/32 ,  A61L2/02 ,  B01J3/08 ,  B01J19/08 ,  C02F1/46 ,  C02F1/48

CPC classification number: C02F1/4608 ,  A23L3/00 ,  A23L3/015 ,  A23L3/26 ,  A23L3/266 ,  A23L3/32 ,  A61L2/02 ,  B01J3/08 ,  B01J19/088 ,  C02F2201/46175 ,  C02F2303/04

公开(公告)号：US3336220A

公开(公告)日：1967-08-15

申请号：US38368764

申请日：1964-07-20

Applicant: GEORG NEIDL

Inventor： GEORG NEIDL

IPC: C02F1/48 ,  C02F3/34

CPC classification number: C02F3/005 ,  C02F3/34 ,  C02F2001/46123 ,  C02F2201/46175

公开(公告)号：US20240317614A1

公开(公告)日：2024-09-26

申请号：US18368974

申请日：2023-09-15

Applicant: Clear World Corporation

Inventor： Boris Davidoff ,  Johannes Verwater

IPC: C02F1/467 ,  C02F1/461

CPC classification number: C02F1/4674 ,  C02F1/46109 ,  C02F2001/46133 ,  C02F2001/46171 ,  C02F2201/4612 ,  C02F2201/46175 ,  C02F2201/46185 ,  C02F2209/29 ,  C02F2301/024 ,  C02F2303/04

Abstract: A chemical reactor unit is provided that includes first and second circulation loops and an anode arranged between the first and second circulation loops. A first cathode is located at a beginning of the first circulation loop and a second cathode is located at an end of the second circulation loop. The chemical reactor unit can be used to generate a chlorine dioxide solution. A method for generating a chlorine dioxide solution includes applying a voltage differential between first and second cathodes and an anode arranged therebetween and pumping a fluid mixture comprising sodium chlorite and oxalic acid to sequentially pass the first cathode, the anode, and the second cathode. An apparatus is additional provided that includes a tank configured to hold a fluid mixture, a chemical reactor unit, and a pump configured to circulate the fluid mixture between the tank and the chemical reactor unit.

公开(公告)号：US20230212041A1

公开(公告)日：2023-07-06

申请号：US18068895

申请日：2022-12-20

Applicant: Faraday Technology, Inc.

Inventor： Timothy D. Hall ,  Maria E. Inman ,  Stephen T. Synder ,  Santosh H. Vijapur ,  E. Jennings Taylor ,  Thi Xuan Huong Le

IPC: C02F1/461 ,  D21C9/18 ,  D21C9/00 ,  C02F1/469

CPC classification number: C02F1/46109 ,  D21C9/18 ,  D21C9/007 ,  C02F1/469 ,  C02F2201/46175 ,  C02F2001/46157 ,  C02F2201/46115 ,  C02F2201/46

Abstract: A dewatering apparatus for cellulosic materials includes a chamber for an aqueous solution of a cellulosic material, an inner electrode in the chamber, an outer electrode in the chamber about the inner electrode, and a power supply connected to the inner electrode and the outer electrode applying a voltage potential across the electrodes to remove water associated with the aqueous solution and to dewater the cellulosic materials.

公开(公告)号：US11666863B2

公开(公告)日：2023-06-06

申请号：US16632166

申请日：2017-07-18

Applicant: INVESTIGACIONES FORESTALES BIOFOREST S.A.

Inventor： Álvaro Mauricio González Vogel ,  Olli Pekka Joutsimo ,  Klaus Erwin Bornhardt Brachmann

IPC: B01D61/52 ,  B01D61/44 ,  B01D61/54

CPC classification number: B01D61/52 ,  B01D61/445 ,  B01D61/54 ,  B01D2321/223 ,  C02F2201/4613 ,  C02F2201/46175

Abstract: Methods and circuits for a device for interrupting concentration-related polarisation phenomenon and for self-cleaning of electromembrane processes by application of asymmetric inverse-polarity pulses with high intensity and variable frequency are described. The device, a bipolar switch, is based on the use of solid-state electronics to carry out polarity inversion in a range of frequencies, intensities and pulse widths to prevent or reduce formation of precipitates on the surfaces of the membranes. The inversion protocol, with a frequency that varies as a function of the appearance of dirt on the membranes, as measured by the decrease in voltage or electrical resistance of the membrane cell during electromembrane processes, is also provided. This device and configuration provides application of modulated and stable high-intensity pulses using a second power source. Electromembrane processes can be updated by replacing electrodes, suitable for polarity inversion, and adding a second power source and the bipolar switch described.

公开(公告)号：US20180155220A1

公开(公告)日：2018-06-07

申请号：US15883762

申请日：2018-01-30

Applicant: NCH Corporation

Inventor： Adrian J. Denvir ,  David F. Vela ,  Matthew C. Holloway ,  William Boesch ,  Jose E. Evaro

IPC: C02F1/467 ,  B01F3/04 ,  C02F103/02

CPC classification number: C02F1/4672 ,  B01F3/04241 ,  B01F2003/04886 ,  B01F2003/04943 ,  B01F2215/0052 ,  C02F1/4608 ,  C02F1/78 ,  C02F2103/02 ,  C02F2201/46105 ,  C02F2201/46135 ,  C02F2201/4615 ,  C02F2201/46175 ,  C02F2201/784 ,  C02F2303/04 ,  C02F2303/26

Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.

公开(公告)号：US09957170B2

公开(公告)日：2018-05-01

申请号：US14438805

申请日：2013-11-07

Applicant: MITSUBISHI ELECTRIC CORPORATION

Inventor： Yasuhiro Nakamura ,  Yasutaka Inanaga ,  Akira Morikawa ,  Tokiko Yamauchi ,  Takao Tsurimoto ,  Hirotaka Muto ,  Gaku Oinuma ,  Masakazu Taki

IPC: C02F1/46 ,  C02F1/74 ,  C02F101/30 ,  C02F1/461

CPC classification number: C02F1/4608 ,  C02F1/74 ,  C02F2001/46171 ,  C02F2101/30 ,  C02F2201/003 ,  C02F2201/46175 ,  C02F2201/4619 ,  C02F2201/48 ,  C02F2305/023

Abstract: A water treatment device generates a bubble in water to be treated inside a treatment tank, and treats the water to be treated through use of radicals that are generated by bubble electric discharge caused via the bubble. The water treatment device includes main electrodes for forming a main discharge area between a first main electrode and a second main electrode, auxiliary electrodes for forming a preliminary discharge area between a first auxiliary electrode and a second auxiliary electrode, and a bubble generator generating a bubble in water to be treated through use of an externally supplied gas. When a bubble generated by the bubble generator passes through the preliminary discharge area, discharge is caused via the bubble, and, when the bubble in an excited state subsequently passes through the main discharge area, the bubble causes discharge again to generate radicals.

公开(公告)号：US09932252B2

公开(公告)日：2018-04-03

申请号：US14695519

申请日：2015-04-24

Applicant: NCH Corporation

Inventor： Adrian J. Denvir ,  David F. Vela ,  Matthew C. Holloway ,  William P. Boesch ,  Jose E. Evaro

IPC: C02F1/36 ,  C02F1/467 ,  B01F3/04 ,  C02F103/02

CPC classification number: C02F1/4672 ,  B01F3/04241 ,  B01F2003/04886 ,  B01F2003/04943 ,  B01F2215/0052 ,  C02F1/4608 ,  C02F1/78 ,  C02F2103/02 ,  C02F2201/46105 ,  C02F2201/46135 ,  C02F2201/4615 ,  C02F2201/46175 ,  C02F2201/784 ,  C02F2303/04 ,  C02F2303/26

Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. Components of the water system are protected from being damaged by excess energy from the electrohydraulic treatment. Ozone gas generated by a high voltage generator that powers the plasma discharge is recycled to further treat the water. A gas infusion system may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, particularly when the conductivity of the water is high. An electrode mounting assembly maintains a high voltage electrode and ground electrode at a fixed distance from each other to optimize plasma generation. An open support structure for the high voltage generator circuit physically separates spark gap electrodes and resists metal deposits that may disrupt discharge of a high voltage pulse to create the plasma.

公开(公告)号：US20180086651A1

公开(公告)日：2018-03-29

申请号：US15274860

申请日：2016-09-23

Applicant: Jason D. Lalli

Inventor： Jason D. Lalli

IPC: C02F1/463 ,  C02F1/46

CPC classification number: C02F1/463 ,  C02F1/4608 ,  C02F1/46109 ,  C02F2001/46152 ,  C02F2201/4611 ,  C02F2201/46135 ,  C02F2201/4614 ,  C02F2201/46145 ,  C02F2201/46175 ,  C02F2201/4618 ,  C02F2301/046

Abstract: An apparatus, system and method for clarifying wastewater using electrocoagulation with plasma discharge is provided. The apparatus includes a reactor with a hollow interior accommodating a volume of wastewater for treatment, and electrodes contacting or at least partially submerged in the wastewater. Electrical energy is supplied to the electrodes, such as three-phase AC power, of sufficient levels to generate plasma discharge from the electrodes and within the wastewater. Electrocoagulation occurs concurrent with the plasma discharge. A system including at least one reactor is a flow-through system, and may have a recirculation loop for recirculating wastewater for additional passes of treatment. A pump(s) and series of valves control the movement of wastewater through the system, and a control panel may be included to direct the operation of various components of the system. The control panel may also include a user interface for information display, input by an operator, and automation.

公开(公告)号：US20180016163A1

公开(公告)日：2018-01-18

申请号：US15713199

申请日：2017-09-22

Applicant: NCH Corporation

Inventor： Adrian J. Denvir ,  David F. Vela ,  Matt C. Holloway

IPC: C02F1/46 ,  C02F1/78 ,  C02F1/32 ,  C02F1/36 ,  C02F1/34 ,  C02F103/02 ,  C02F1/48

CPC classification number: C02F1/4608 ,  C02F1/32 ,  C02F1/34 ,  C02F1/36 ,  C02F1/487 ,  C02F1/78 ,  C02F2103/023 ,  C02F2201/46135 ,  C02F2201/4615 ,  C02F2201/46175 ,  C02F2201/483 ,  C02F2303/04 ,  C02F2303/10 ,  C02F2303/26 ,  C02F2305/023 ,  Y02W10/30

Abstract: A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.