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公开(公告)号：US2876085A
公开(公告)日：1959-03-03
申请号：US65112557
申请日：1957-03-20
申请人： TOMOHIRO HORIE
发明人： TOMOHIRO HORIE
IPC分类号： B24D3/32
CPC分类号： B24D3/32
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公开(公告)号：US2268403A
公开(公告)日：1941-12-30
申请号：US41017941
申请日：1941-09-09
申请人： KINGMAN RUSSELL B
发明人： KINGMAN RUSSELL B
IPC分类号： B24D3/32
CPC分类号： B24D3/32
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公开(公告)号：US20240293915A1
公开(公告)日：2024-09-05
申请号：US18592822
申请日：2024-03-01
摘要： A polishing pad (1) is provided with higher polishing efficiency for polishing an outer circumferential edge part (3d, 3e) of a disc-shaped wafer (3). An unpolished part is less likely to occur during a polishing process with the polishing pad (1), and the polished wafer (3) is cleanable easily. In the polishing pad (1), a polishing surface is formed of a polishing body, and the polishing body includes a base material and polishing particles. The base material is composed of a binder resin and fibers and has a plurality of pores formed therein. The polishing particles are retained in the base material or in the pores and are diamond particles. The polishing pad (1) has a durometer hardness in a range from 16 to 27, a density in a range from 0.58 to 0.81 g/cm3, and an elastic modulus in a range from 21.5 to 37.5 N/mm2.
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公开(公告)号：US20240091901A1
公开(公告)日：2024-03-21
申请号：US18503445
申请日：2023-11-07
摘要： A polishing pad has a polishing layer comprising a polymer matrix comprising the reaction product of an isocyanate terminated urethane prepolymer and a chlorine-free aromatic polyamine cure agent and chlorine-free microelements. The microelements can be expanded, hollow microelements. The microelements can have a specific gravity measured of 0.01 to 0.2. The microelements can have a volume averaged particle size of 1 to 120 or 15 to 30 micrometers. The polishing layer is chlorine free.
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45.发明申请公开(公告)号：US20220241925A1
公开(公告)日：2022-08-04
申请号：US17724721
申请日：2022-04-20
申请人： OLYMPUS CORPORATION
发明人： Kenichi SAKAMOTO
摘要： A tool for polishing glass is formed by integrating multiple polishing elements in which polishing grains have been covered with a resin, and includes air cavities. The polishing grain volume S ratio is 50-85%, the resin volume ratio is 15-50%, the air cavity volume ratio is 20% or less, and the average grain size of the polishing elements is 10 μm or less.
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公开(公告)号：US11078345B2
公开(公告)日：2021-08-03
申请号：US16099728
申请日：2017-05-11
摘要： Various embodiments disclosed relate to pore inducers and porous abrasive forms made using the same. In various embodiments, the present invention provides a method of forming a porous abrasive form including heating an abrasive composition including pore inducers to form the porous abrasive form. During the heating the pore inducers in the porous abrasive form reduce in volume to form induced pores in the porous abrasive form.
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公开(公告)号：US10919125B2
公开(公告)日：2021-02-16
申请号：US16342886
申请日：2016-10-19
申请人： NANO TEM CO., LTD.
摘要： A grindstone that enables grinding, polishing, super-finish polishing by using the same grindstone, without clogging even if the grindstone is being used continuously, in which a grinding/polishing section for processing a workpiece has a honeycomb structure formed by arranging polygonal prisms with no clearance therebetween. The grindstone includes the grindstone columns consisting of abrasive grains and binder and having an axis in depth direction of grinding/polishing surface, which are disposed on intersections or wall portions of the honeycomb structure. Porous elastomer is disposed inside the honeycomb structure, thus making it possible to perform a super-finish polishing.
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公开(公告)号：US10350732B2
公开(公告)日：2019-07-16
申请号：US15525457
申请日：2015-11-13
发明人： Mark A. Lukowski
摘要： Methods for manufacturing bonded abrasive articles, for example vitrified bonded grinding wheels. A bondable abrasive composition is prepared including abrasive particles, a binder medium and a gamma-pyrone pore inducing material, such as ethyl maltol. A precursor abrasive structure is formed from the composition. The gamma-pyrone pore inducing material is removed from the precursor abrasive structure to provide a porous precursor abrasive structure that is further processed to provide a bonded abrasive article. In some embodiments, the binder medium includes a vitreous bonding material, and the bonded abrasive article is a porous vitrified bonded grinding wheel.
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公开(公告)号：US20190047121A1
公开(公告)日：2019-02-14
申请号：US16079332
申请日：2016-02-29
发明人： Norimasa FUJIWARA , Keiichi MURAI
摘要： An object of the present invention is to provide a porous material for polishing in which, during a polishing operation, it is possible to keep a proportion between abrasive grains in contact with an object to be polished and a resin portion in contact with the object to be polished within a certain range, even if an unskilled person attaches a polishing tool to an automated device and uses it, there is no need for complicated adjustment to stabilize the device, whereby it is possible to obtain precise surface accuracy. The above object is achieved by a porous material for polishing including an elastic foam having anisotropy, a polymer, and abrasive grains.
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公开(公告)号：US10195713B2
公开(公告)日：2019-02-05
申请号：US15234720
申请日：2016-08-11
发明人： Masahi Norimoto
IPC分类号： B24B37/24 , B24D3/32 , B24B37/22 , B24B37/015 , B24B37/26
摘要： The present disclosure relates to lapping pads which include an abrading layer, wherein the abrading layer includes a working surface and a second surface opposite the working surface having a projected area Ap, and at least one cavity having a cavity opening located at the second surface, the at least one cavity being defined by at least one rib, each rib having a distal end at the second surface; and a phase transition material having a thermally reversible phase transition, wherein the phase transition material is disposed in the at least one cavity. The present disclosure further relates to a lapping system, the lapping system includes a lapping pad of the present disclosure and a working fluid; a method of making a lapping pad; and a method of lapping using a lapping pad of the present disclosure.
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