Abstract:
The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
Abstract:
Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.
Abstract:
Disclosed are a photosensitive resin composition for a color filter that includes (A) a binder resin including phenol-based resin represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
Abstract:
A photocurable composition, a composition for encapsulation of an organic light emitting device, an encapsulated device, and an encapsulated apparatus, the photocurable composition including a photocurable monomer; a silicon-containing monomer; and a photopolymerization initiator, wherein the silicon-containing monomer has a structure represented Formula 1:
Abstract:
A photocurable composition includes (A) a photocurable monomer and (B) a silicon-containing monomer or oligomer thereof, the silicon-containing monomer being represented by Formula 1
Abstract:
Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.
Abstract:
Disclosed are a photosensitive resin composition for a color filter that includes a colorant including a phthalocyanine-based compound represented by the following Chemical Formula 1 and a triarylmethane-based compound represented by the following Chemical Formula 2, wherein the substituents of Chemical Formulas 1 and 2 are the same as same as defined in the detailed description, and a color filter prepared using the same.
Abstract:
Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
Abstract:
Provided are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter may include (A) a copolymer including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent: In Chemical Formula 1, each substituent is the same as defined in the detailed description.
Abstract:
Disclosed is an image sensor including a photo-sensing device, a color filter positioned on the photo-sensing device, a microlens positioned on the color filter, and an insulation layer positioned between the photo-sensing device and the color filter, and including a trench exposing the photo-sensing device and a filler filled in the trench. The filler has light transmittance of about 85% or more at a visible ray region, and a higher refractive index than the insulation layer. A method of manufacturing the image sensor is also provided.