Abstract:
A method for forming a capacitor of a semiconductor device includes forming a first insulation layer having a storage node plug on a semiconductor substrate; forming an etch stop layer and a second insulation layer sequentially on the substrate having the first insulation layer; forming a hole exposing a portion of the storage node plug by selectively etching the second insulation layer by using the etch stop layer; recessing a portion of the storage node plug exposed by the hole; forming a barrier metal layer on a surface of the recessed storage node plug; forming a storage node electrode connected to the storage node plug through the barrier metal layer in the hole; and forming a dielectric layer and a metal layer for a plate electrode sequentially on the storage node electrode.
Abstract:
A semiconductor device is manufactured by forming a low dielectric constant layer on a semiconductor substrate which is formed with metal lines; implementing primary ultraviolet treatment of the low dielectric constant layer; forming a capping layer on the low dielectric constant layer having undergone the primary ultraviolet treatment; and implementing secondary ultraviolet treatment of the low dielectric constant layer including the capping layer.
Abstract:
The present invention relates to a method for measuring human intelligence using a neurobiogical model. The invention provides a method which enables neurometric IQ to be measured by processing the MRI and fMRI images of subjects to determine cortical thicknesses and brain activation levels, determining structural IQ (sIQ) and functional IQ (fIQ) from the cortical thicknesses and the brain activation levels, and using the structural IQ (sIQ) and the functional IQ (fIQ) as predictors to measure the neurometric IQ of the subject. According to the present invention, the concept of a neurometric IQ (nIQ) model is established and can assist in easily assessing individual differences in general cognitive ability. These results suggest that general cognitive ability can be explained by two different neural bases or traits: facilitation of neural circuits and accumulation of crystallized knowledge.
Abstract:
Provided are a heterojunction bipolar transistor and a method of forming the same. The method includes forming an emitter electrode on an emitter capping pattern, a base electrode on a base pattern, and a collector electrode on a subcollector pattern, the subcollector pattern, the base pattern, an emitter pattern, and the emitter capping pattern being provided to a substrate; patterning a protection insulation layer and a first dummy pattern covering the emitter electrode, the base electrode, and the collector electrode, to expose the emitter electrode, the base electrode, and the collector electrode; forming a second dummy pattern to electrically separate the emitter electrode, the base electrode, and the collector electrode; forming, on the substrate provided with the second dummy pattern, an emitter electrode interconnection connected to the emitter electrode, a base electrode interconnection connected to the base electrode, and a collector electrode interconnection connected to the collector electrode; and removing the first and second dummy patterns.
Abstract:
The present invention relates to a method for fabricating a capacitor of a semiconductor device. The method includes the steps of: forming a first amorphous silicon layer doped with an impurity in a predetermined first doping concentration suppressing dopants from locally agglomerating; forming an impurity undoped second amorphous silicon layer on the first amorphous silicon layer in an in-situ condition; forming a storage node by patterning the first amorphous silicon layer and the second amorphous silicon layer; forming silicon grains on a surface of the storage node; and doping the impurity to the storage node and the silicon grains until reaching a second predetermined concentration for providing conductivity required by the storage node.
Abstract:
A semiconductor device may include plugs disposed in a zigzag pattern, interconnections electrically connected to the plugs and a protection pattern which is interposed between the plugs and the interconnections to selectively expose the plugs. The interconnections may include a connection portion which is in contact with plugs selectively exposed by the protection pattern. A method of manufacturing a semiconductor device includes, after forming a molding pattern and a mask pattern, selectively etching a protection layer using the mask pattern to form a protection pattern exposing a plug.
Abstract:
A washing machine according to an exemplary embodiment of the invention includes a body having a washing tub; a detergent bottle seating part provided over the body and having a detergent inlet through which a liquid detergent is entered, a detachable detergent bottle containing the liquid detergent being seated on the detergent bottle seating part; and a detergent storing part provided under the detergent bottle seating part, the liquid detergent contained in the detergent bottle being entered and stored in the detergent storing part by its weight.
Abstract:
A washing machine may include a cabinet; a washing tub which is disposed in the cabinet and in which a washing operation is performed; a liquid detergent supplier which contains and supplies a liquid detergent; a drawer-type container to which the liquid detergent supplier is coupled so as to be easily attachable and detachable and in which the liquid detergent supplier is contained; and a liquid detergent storage unit which is coupled to the drawer-type container, uniformly supplies the liquid detergent supplied by the liquid detergent supplier into the washing tub and detects whether the liquid detergent supplied by the liquid detergent supplier is stored therein.
Abstract:
An apparatus and method of controlling emission of a laser beam in an image forming apparatus. The method includes generating a first reference voltage and a second reference voltage corresponding to a normal mode and a toner save mode, supplying one of the first reference voltage and the second reference voltage corresponding to a mode selection signal in a switching manner, generating a first control voltage and second control voltage to control emission of the laser beam, and supplying a drive current corresponding to one of the generated first and second control voltages to a laser diode to control intensity of the laser beam according to the selection mode.
Abstract:
The present invention relates to a monitoring device for a rotating body, which can accurately measure signals from a fiber Bragg grating sensor provided on the rotating body by compensating a transmission loss variation and a distortion of the sensor signals. A rotation-side optical fiber has at least one deformation sensor at a portion thereof and a reference sensor at one end thereof. The sensors are made by forming a Bragg grating in the rotation-side optical fiber. A fixed-side optical fiber is mounted to the fixed body so as to be opposed to the one end of the rotation-side optical fiber. A signal processing unit detects a deformation of the rotating body by subtracting a signal corresponding to the light reflected from the reference sensor from a signal corresponding to the light reflected from the deformation sensor.