公开(公告)号：US07965386B2

公开(公告)日：2011-06-21

申请号：US12964249

申请日：2010-12-09

Applicant: Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima

Inventor： Yuta Urano ,  Toshiyuki Nakao ,  Yoshimasa Oshima

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/9503

Abstract: A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.

Abstract translation: 缺陷检查装置能够以高灵敏度和高速检查诸如半导体衬底或薄膜衬底的样品的顶部和边缘表面上存在的极小缺陷。 缺陷检查装置具有照明光学系统，多个检测光学单元和信号处理器。 一个或多个检测光学单元接收从样品的边缘部分衍射的光或从夹持样品的边缘把手衍射的光。 一个或多个检测光学单元基于通过监视由检测光学单元接收的衍射光的强度而获得的信号来屏蔽由检测光学单元接收的衍射光，以便检查位于边缘部分附近的样本部分 以及位于边缘把手附近的样品部分。

公开(公告)号：US20100265496A1

公开(公告)日：2010-10-21

申请号：US12827470

申请日：2010-06-30

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/00 ,  G06K9/00

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US20100149528A1

公开(公告)日：2010-06-17

申请号：US12713500

申请日：2010-02-26

Applicant: Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method for inspecting a defect of a surface of a sample, includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiation, correcting errors of detection timings for the plurality of scattered light rays detected in the detection step, and determining a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting errors of detection timings.

Abstract translation: 用于检查样品表面的缺陷的方法包括将多个激光束照射在样品表面上多次，使得样品表面上的激光束的照明场的至少一部分照射样品的第一区域 在多次照射中检测来自第一区域的多个散射光，校正检测步骤中检测到的多个散射光的检测定时的误差，并且确定缺陷 根据检测定时的校正误差，基于多个散射光线在样品表面上。

公开(公告)号：US07719673B2

公开(公告)日：2010-05-18

申请号：US11940483

申请日：2007-11-15

Applicant: Yoshimasa Oshima ,  Toshiyuki Nakao

Inventor： Yoshimasa Oshima ,  Toshiyuki Nakao

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N2021/8864

Abstract: In a defect inspection for a semiconductor substrate, inspection objects include, in addition to a bare Si wafer, a wafer with various films formed on the surface thereof. For a sample formed with a metal film in particular, scattering light generated by surface roughness thereof is large, thus making it difficult to detect a minute defect and a minute foreign substance. It is desirable that a minute defect and a minute foreign substance be detected regardless of scattering light generated by the roughness of the sample surface. Insertion of an analyzer in an optical path of a detection optical system at such an angle that the scattering light generated by the roughness becomes minimum permits suppressing the scattering light generated by the roughness.

Abstract translation: 在半导体衬底的缺陷检查中，检查对象除了裸硅片外还包括在其表面上形成有各种膜的晶片。 对于特别是金属膜形成的样品，由于其表面粗糙度而产生的散射光大，因此难以检测到微小的缺陷和微小的异物。 不管由样品表面的粗糙度产生的散射光如何，都希望检测到微小的缺陷和微小的异物。 以使得由粗糙度产生的散射光变得最小的角度插入检测光学系统的光路中的分析器，可以抑制由粗糙度产生的散射光。

公开(公告)号：US20100060895A1

公开(公告)日：2010-03-11

申请号：US12506421

申请日：2009-07-21

Applicant: Yoshimasa OSHIMA ,  Yuta URANO ,  Toshiyuki NAKAO

Inventor： Yoshimasa OSHIMA ,  Yuta URANO ,  Toshiyuki NAKAO

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N2021/4707 ,  G01N2021/4709 ,  G01N2021/8864

Abstract: Scattered light that originates from the surface roughness of silicon or other metallic films is distributed more strongly at positions closer to the starting position of the scattering. Of all scattered-light detection signals obtained during multi-directional detection, therefore, only a detection signal of forward scattered light can be used to detect micro-defects, and only a detection signal of backward scattered light can be used to detect the surface roughness very accurately.

Abstract translation: 源于硅或其他金属膜的表面粗糙度的散射光在更靠近散射开始位置的位置分布得更强。 因此，在多方向检测中获得的所有散射光检测信号中，只能使用前向散射光的检测信号来检测微缺陷，只能使用后向散射光的检测信号来检测表面粗糙度 非常准确。

公开(公告)号：US20090290168A1

公开(公告)日：2009-11-26

申请号：US12470505

申请日：2009-05-22

Applicant: Akira HAMAMATSU ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiuki Nakao ,  Shigenobu Maruyama

Inventor： Akira HAMAMATSU ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30 ,  G01B11/06

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: To inspect a substrate such as a semiconductor substrate for surface roughness at high precision.The surface roughness of the substrate is measured in each frequency band of the surface roughness by applying a light to the substrate surface and detecting a scattered light or reflected light at a plurality of azimuth or elevation angles.

Abstract translation: 以高精度检查用于表面粗糙度的半导体基板等基板。 通过向基板表面施加光并以多个方位角或仰角检测散射光或反射光，测量表面粗糙度的每个频带中的基板的表面粗糙度。

公开(公告)号：US20090195775A1

公开(公告)日：2009-08-06

申请号：US12362950

申请日：2009-01-30

Applicant: Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

Inventor： Toshiyuki Nakao ,  Yoshimasa Oshima ,  Yuta Urano

IPC: G01N21/88 ,  G06F19/00

CPC classification number: G01N21/9501 ,  G01N2021/887

Abstract: A method for inspecting a defect of a surface of a sample includes irradiating a laser beam on the sample surface a plurality of times so that at least part of an illumination field of the laser beam on the sample surface illuminates a first area of the sample surface each of the plurality of times, detecting a plurality of scattered light rays from the first area caused by the plurality of times of irradiations, correcting errors of detection timings for the plurality of detected scattered light rays, correcting at least one of adding and averaging the plurality of scattered light rays, determining a defect on the sample surface based on a calculation result in accordance with the at least one of the adding and averaging.

Abstract translation: 用于检查样品表面的缺陷的方法包括：将激光束多次照射在样品表面上，使得样品表面上的激光束的照明场的至少一部分照射样品表面的第一区域 多次检测由多次照射引起的来自第一区域的多个散射光线，校正多个检测到的散射光线的检测定时的误差，校正至少一个加法和平均化 多个散射光线，根据加法和平均中的至少一个，基于计算结果确定样品表面上的缺陷。

公开(公告)号：US20080144024A1

公开(公告)日：2008-06-19

申请号：US12029660

申请日：2008-02-12

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.

Abstract translation: 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已经被定向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。