公开(公告)号：US07397533B2

公开(公告)日：2008-07-08

申请号：US11005221

申请日：2004-12-07

申请人： Martinus Cornelis Maria Verhagen ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

发明人： Martinus Cornelis Maria Verhagen ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70808

摘要： A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.

摘要翻译： 公开了一种光刻设备，其中液体供应系统被配置为至少部分地用液体填充光刻设备的基板和投影系统之间的区域，并且具有固定在基本垂直于光轴的光轴的平面中的液体限制结构 所述投影系统被配置为与被配置为保持所述衬底的衬底台配合，以便将所述液体限制在所述衬底台的上表面上方的区域上，使得待暴露的所述衬底的一侧基本上被覆盖在所述液体中 曝光。

公开(公告)号：US09025127B2

公开(公告)日：2015-05-05

申请号：US13242221

申请日：2011-09-23

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US08953144B2

公开(公告)日：2015-02-10

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： G03B27/52 ,  G03B27/42 ,  B01D61/02 ,  B01D61/24 ,  G03F7/20 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US08817231B2

公开(公告)日：2014-08-26

申请号：US12725883

申请日：2010-03-17

申请人： Jacobus Johannus Leonardus Hendricus Verspay ,  Hans Jansen ,  Marco Koert Stavenga

发明人： Jacobus Johannus Leonardus Hendricus Verspay ,  Hans Jansen ,  Marco Koert Stavenga

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

摘要： In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

摘要翻译： 在浸没式光刻装置中，其中浸没液体被供应到局部空间，该空间基本上平行于基底平面呈多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。

公开(公告)号：US08638419B2

公开(公告)日：2014-01-28

申请号：US12986576

申请日：2011-01-07

申请人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

发明人： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70925

摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US08629971B2

公开(公告)日：2014-01-14

申请号：US12766609

申请日：2010-04-23

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US08246838B2

公开(公告)日：2012-08-21

申请号：US13029828

申请日：2011-02-17

申请人： Martinus Cornelis Maria Verhagen ,  Roelof Frederik De Graaf ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

发明人： Martinus Cornelis Maria Verhagen ,  Roelof Frederik De Graaf ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay

IPC分类号： G03F7/20 ,  B01D37/00

CPC分类号： B01D37/04 ,  Y10S210/90

摘要： A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.

摘要翻译： 描述了用于过滤流体以获得具有已知纯度的流体的方法。 流体用过滤系统过滤，并且在过滤系统的最终过滤阶段的上游，测量流体的纯度。 通过过滤系统过滤的流体的纯度通过用最终过滤阶段的过滤行为校正测量的纯度来确定。 在一个实施例中，流体包括用作光刻设备中的浸没液体的超纯水。

公开(公告)号：US20110292358A1

公开(公告)日：2011-12-01

申请号：US13198379

申请日：2011-08-04

申请人： Marco Koert STAVENGA ,  Martinus Cornelis Maria Verhagen ,  Johannes Hericus Wilhlemus Jacobs ,  Hans Jansen

发明人： Marco Koert STAVENGA ,  Martinus Cornelis Maria Verhagen ,  Johannes Hericus Wilhlemus Jacobs ,  Hans Jansen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/709

摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.

摘要翻译： 公开了各种类型的压力调节装置，以减少光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地限制液体在投影系统和基板台之间的液体 光刻设备 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 用于防止冲击波的压力调节器或限流器，以及用于补偿压力波动的缓冲体积/阻尼器。

公开(公告)号：US20100265476A1

公开(公告)日：2010-10-21

申请号：US12766609

申请日：2010-04-23

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Martinus Cornelis Maria Verhagen ,  Lejla Seuntiens-Gruda

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。

公开(公告)号：US20100177292A1

公开(公告)日：2010-07-15

申请号：US12725883

申请日：2010-03-17

申请人： Jacobus Johannus Leonardus Hendricus VERSPAY ,  Hans Jansen ,  Marco Koert Stavenga

发明人： Jacobus Johannus Leonardus Hendricus VERSPAY ,  Hans Jansen ,  Marco Koert Stavenga

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

摘要： In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

摘要翻译： 在浸没式光刻装置中，其中浸没液体被供应到局部空间，该空间基本上平行于基底平面呈多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。