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57 条记录 (耗时 0.025 秒)

    Pattern reversal employing thick residual layers
    51.
    发明申请
    Pattern reversal employing thick residual layers 有权

    公开(公告)号：US20060063112A1

    公开(公告)日：2006-03-23

    申请号：US10946566

    申请日：2004-09-21

    申请人： Sidlgata Sreenivasan

    发明人： Sidlgata Sreenivasan

    IPC分类号： G03C5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention features a method of patterning a substrate that includes forming, on the substrate, a first layer having a first pattern and selectively shifting in tone, as well as along a first direction, a subsequent pattern formed into the same layer that corresponds to the first pattern. To that end, one method of the present invention includes generating into the first layer, a second pattern having a shape inverse to the first pattern. A third pattern is then transferred into the first layer that has a shape inverse to the second pattern.

    Adaptive shape substrate support system
    53.
    发明申请
    Adaptive shape substrate support system 有权
    自适应形状衬底支撑系统

    公开(公告)号：US20050264134A1

    公开(公告)日：2005-12-01

    申请号：US11136891

    申请日：2005-05-25

    申请人： Mahadevan GanapathiSubramanian ,  Sidlgata Sreenivasan

    发明人： Mahadevan GanapathiSubramanian ,  Sidlgata Sreenivasan

    IPC分类号： G03F7/00 ,  G03F7/20 ,  H01L21/302 ,  H01L41/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707

    摘要： The present method and system features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the support system includes a chuck having a plurality of piezo pins and reference pins, with the piezo pins being coupled to piezo actuators to undergo relative movement with respect to said reference pins. These and other embodiments are discussed more fully below.

    摘要翻译： 本发明的方法和系统具有主动柔性销卡盘以保持具有相对的第一和第二表面的基板，并且补偿基板的一个表面中的非平面性。 为此，支撑系统包括具有多个压电销和参考销的卡盘，压电销耦合到压电致动器以相对于所述参考销进行相对运动。 以下将更全面地讨论这些和其它实施例。

    Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
    54.
    发明申请
    Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography 审中-公开
    全面或大面积印刷多个分离的子场，用于高通量光刻

    公开(公告)号：US20050189676A1

    公开(公告)日：2005-09-01

    申请号：US10788700

    申请日：2004-02-27

    申请人： Sidlgata Sreenivasan

    发明人： Sidlgata Sreenivasan

    IPC分类号： B29C33/40 ,  B29C67/00 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/76817

    摘要： The present invention is directed to a method of forming a layer on a substrate comprising forming a plurality of flowable regions on the substrate and contacting the flowable regions with a plurality of molds disposed on a template. Thereafter, the plurality of flowable regions is solidified. In a further embodiment, the method further includes spreading each of the plurality of flowable regions to an area.

    摘要翻译： 本发明涉及一种在基材上形成层的方法，包括在基材上形成多个可流动区域，并将可流动区域与设置在模板上的多个模具接触。 此后，多个可流动区域被固化。 在另一实施例中，该方法还包括将多个可流动区域中的每一个扩展到一个区域。

    Imprint lithography template having opaque alignment marks
    55.
    发明申请
    Imprint lithography template having opaque alignment marks 有权
    具有不透明对准标记的压印光刻模板

    公开(公告)号：US20050067379A1

    公开(公告)日：2005-03-31

    申请号：US10670980

    申请日：2003-09-25

    申请人： Sidlgata Sreenivasan ,  Philip Schumaker

    发明人： Sidlgata Sreenivasan ,  Philip Schumaker

    IPC分类号： C23F1/00 ,  G03F7/00 ,  G03F9/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00

    摘要： The present invention is directed to providing a template with alignment marks that are opaque to selective wavelength of light. In one embodiment, a template is provided having patterning areas and a template, with the template mark being formed from metal and disposed outside of the patterning areas. The alignment marks may be surrounded by a moat to prevent curable liquid from being in superimposition therewith during imprinting. In this manner, opaque alignment marks may be employed without degrading the quality of the pattern formed during imprinting.

    摘要翻译： 本发明旨在提供一种具有对选择性波长的光不透明的对准标记的模板。 在一个实施例中，提供具有图案化区域和模板的模板，其中模板标记由金属形成并且设置在图案化区域的外部。 对准标记可以由护城河包围，以防止可印刷过程中可固化液体与其重叠。 以这种方式，可以使用不透明的对准标记而不降低在压印期间形成的图案的质量。

    Conforming template for patterning liquids disposed on substrates
    56.
    发明申请
    Conforming template for patterning liquids disposed on substrates 有权
    符合设置在基板上的图案化液体的模板

    公开(公告)号：US20050051698A1

    公开(公告)日：2005-03-10

    申请号：US10614716

    申请日：2003-07-07

    申请人： Sidlgata Sreenivasan ,  Byung Choi ,  Ronald Voisin

    发明人： Sidlgata Sreenivasan ,  Byung Choi ,  Ronald Voisin

    IPC分类号： B29C33/42 ,  G03F7/00

    CPC分类号： B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

    摘要： The present invention includes a conforming template for patterning liquids disposed on substrates. The template includes a body having opposed first and second surfaces. The first surface includes a plurality of recessed regions with a patterning region being disposed between adjacent recessed regions. Specifically, the recessed regions define flexure regions about which each patterning region may move independent of the remaining patterning regions of the template. In one embodiment the template is mounted to a fluid chamber having an inlet and a throughway. The template is connected to the throughway and the inlet is connected to a fluid source to facilitate deformation of the template to conform to a profile of a surface adjacent thereto.

    摘要翻译： 本发明包括用于图案化液体配置在基板上的一致性模板。 模板包括具有相对的第一和第二表面的主体。 第一表面包括多个凹陷区域，其中图案化区域设置在相邻的凹陷区域之间。 具体地，凹陷区域限定挠曲区域，每个图案化区域围绕该弯曲区域可独立于模板的剩余图案形成区域移动。 在一个实施例中，模板安装到具有入口和通道的流体室。 模板连接到通道，并且入口连接到流体源以便于模板的变形以符合与其相邻的表面的轮廓。

    Systems for magnification and distortion correction for imprint lithography processes
    57.
    发明申请
    Systems for magnification and distortion correction for imprint lithography processes 有权
    用于压印光刻工艺的放大和失真校正系统

    公开(公告)号：US20050006343A1

    公开(公告)日：2005-01-13

    申请号：US10616294

    申请日：2003-07-09

    申请人： Byung Choi ,  Sidlgata Sreenivasan ,  Mario Meissl

    发明人： Byung Choi ,  Sidlgata Sreenivasan ,  Mario Meissl

    IPC分类号： G01L21/30 ,  G03F20060101 ,  G03F7/00

    CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.

    摘要翻译： 本发明涉及一种改变模板尺寸的系统，以便衰减如果不是防止由模板形成的底层图案的失真。 为此，该系统具有压缩装置，该压缩装置包括一对间隔开的接触构件，以在一对间隔开的接触构件之间压缩模板的周边表面。 压缩装置包括第一和第二主体，每个具有接触构件和致动器臂。 致动器臂中的一个联接到第一主体以响应于邻近致动器臂设置的气囊的体积的变化而围绕轴线往复运动。 以这种方式，可以改变两个接触构件之间的距离。