公开(公告)号：US20050217794A1

公开(公告)日：2005-10-06

申请号：US10875232

申请日：2004-06-25

申请人： Akira Kagoshima ,  Shoji Ikuhara ,  Daisuke Shiraishi

发明人： Akira Kagoshima ,  Shoji Ikuhara ,  Daisuke Shiraishi

IPC分类号： H01L21/3065 ,  C23F1/00 ,  H01J37/32 ,  H01L21/02

CPC分类号： H01J37/32935 ,  H01J37/32972

摘要： To provide a semiconductor manufacturing apparatus that can easily and quickly monitor and analyze the state of a semiconductor processing apparatus and a method for assisting the monitoring and analysis thereof. A semiconductor manufacturing apparatus includes: detecting means 7, 8 that detects, as a plurality of state signals, at least either of a plurality of spectra obtained by separating plasma light emission generated in a processing chamber 2 of a semiconductor processing apparatus 1 or a plurality of apparatus state signals that indicate states of the apparatus; apparatus event information output means 9 that outputs the state of the semiconductor processing apparatus in a current process step; conversion means 14, 17, 18 that converts a combination of the plurality of state signals detected by the detecting means 7, 8 into respective particular figures; and display position controlling means 20 that displays the figures generated by the conversion means 14, 17, 18 at predetermined display positions associated with the process step.

摘要翻译： 提供一种半导体制造装置，其可以容易且快速地监视和分析半导体处理装置的状态和辅助其监视和分析的方法。 半导体制造装置包括：检测装置7,8，其检测通过分离在半导体处理装置1的处理室2或多个处理室2中产生的等离子体发光而获得的多个光谱中的至少一个作为多个状态信号 指示装置的状态的装置状态信号; 装置事件信息输出装置9，其在当前处理步骤中输出半导体处理装置的状态; 转换装置14,17,18将由检测装置7,8检测的多个状态信号的组合转换成相应的特定图形; 以及显示位置控制装置20，其将由转换装置14,17,18生成的图形显示在与处理步骤相关联的预定显示位置处。

公开(公告)号：US20050090914A1

公开(公告)日：2005-04-28

申请号：US10987121

申请日：2004-11-15

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： H01L21/205 ,  G05B23/02 ,  H01L21/00 ,  H01L21/02 ,  G05B11/01 ,  G05B15/00 ,  G05B21/02

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

摘要翻译： 监视器数据获取部通过传感器获取与处理装置中的一个样本的处理状态有关的多个监视数据。 数据选择部从多个监视数据中选择属于包含在多个处理部中的任意处理分区的监视数据。 监视信号生成部基于属于由数据选择部选择的任意处理部的监视数据，生成监视信号。 显示设置控制器以时间序列方式在显示部分上显示关于在处理设备中处理的样本获得的多个监视信号。

公开(公告)号：US20050087298A1

公开(公告)日：2005-04-28

申请号：US10999006

申请日：2004-11-30

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Akira Kagoshima ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Akira Kagoshima ,  Daisuke Shiraishi ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Toshio Masuda

IPC分类号： G05B19/418 ,  H01L21/66 ,  C23F1/00

CPC分类号： H01L22/20 ,  G05B13/048 ,  G05B19/41865 ,  G05B23/024 ,  G05B2219/31357 ,  G05B2219/32058 ,  H01L21/67276 ,  H01L2924/0002 ,  Y02P90/12 ,  Y02P90/14 ,  Y02P90/18 ,  Y02P90/20 ,  H01L2924/00

摘要： A semiconductor processing apparatus for processing a semiconductor wafer includes a sensor for monitoring a processing state of the semiconductor processing apparatus, a processing result input unit which inputs measured values for processing results of a semiconductor wafer processed by the semiconductor processing apparatus, and a model equation generation unit relying on sensed data acquired by the sensor and the measured values to generate a model equation for predicting a processing result using the sensed data as an explanatory variable. The apparatus includes a processing result prediction unit which predicts a processing result based on the model equation and the sensed data, and a process recipe control unit which compares the predicted processing result with a previously set value to control a processing condition. The process recipe control unit includes a controller which controls at least one among a plurality of different processing performances for processing of the semiconductor wafer.

摘要翻译： 用于处理半导体晶片的半导体处理装置包括：用于监视半导体处理装置的处理状态的传感器;输入由半导体处理装置处理的半导体晶片的处理结果的测量值的处理结果输入单元;以及模型方程 依赖于由传感器获取的感测数据和测量值，以产生用于使用感测数据作为解释变量来预测处理结果的模型方程。 该装置包括：处理结果预测单元，其基于模型方程和感测数据预测处理结果;以及处理配方控制单元，其将预测处理结果与预先设定的值进行比较，以控制处理条件。 处理配方控制单元包括控制用于处理半导体晶片的多个不同处理性能中的至少一个的控制器。

公开(公告)号：US06879867B2

公开(公告)日：2005-04-12

申请号：US09945691

申请日：2001-09-05

申请人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

发明人： Junichi Tanaka ,  Hiroyuki Kitsunai ,  Hideyuki Yamamoto ,  Shoji Ikuhara ,  Kazue Takahashi

IPC分类号： H01L21/205 ,  G05B23/02 ,  H01L21/00 ,  H01L21/02 ,  G06F19/00

CPC分类号： G05B21/02 ,  G05B19/41875 ,  G05B23/0221 ,  G05B2219/32053 ,  G05B2219/32182 ,  Y02P90/22

摘要： A monitor data acquisition section acquires a plurality of monitor data relating to a processing state of one sample in a processing apparatus, via sensors. A data selection section selects monitor data belonging to an arbitrary processing division included in a plurality of processing divisions for the sample, from among the plurality of monitor data. A monitoring signal generation section generates monitoring signals based on the monitor data belonging to the arbitrary processing division selected by the data selection section. A display setting controller displays a plurality of monitoring signals obtained with respect to samples processed in the processing apparatus, on a display section in a time series manner.

公开(公告)号：US06853872B2

公开(公告)日：2005-02-08

申请号：US10140182

申请日：2002-05-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A vacuum processing method and apparatus processing units for conducting processing, a transfer processing unit connected with the plurality of processing units for carrying wafers, and a control unit for controlling the processing units. A processing order information storing device stores a processing order of the wafers for the processing units, an operational information signal generating device generates an operational information signal indicating an operable or inoperable state of each of the processing units, an operational information signal storing device stores the operational information signal indicating the state of each of the processing units, and a control device matches and processes the processing order information and the operational information signal, and continues operation without using an inoperable processing unit while using other operable processing units.

摘要翻译： 用于进行处理的真空处理方法和装置处理单元，与多个用于承载晶片的处理单元连接的转移处理单元，以及用于控制处理单元的控制单元。 处理订单信息存储装置存储用于处理单元的晶片的处理顺序，操作信息信号生成装置生成指示每个处理单元的可操作或不可操作状态的操作信息信号，操作信息信号存储装置将 指示每个处理单元的状态的操作信息信号，并且控制设备匹配并处理处理顺序信息和操作信息信号，并且在使用其他可操作的处理单元的同时不使用不可操作的处理单元继续操作。

公开(公告)号：US06776872B2

公开(公告)日：2004-08-17

申请号：US10087982

申请日：2002-03-05

申请人： Junichi Tanaka ,  Toshio Masuda ,  Akira Kagoshima ,  Shoji Ikuhara ,  Hideyuki Yamamoto

发明人： Junichi Tanaka ,  Toshio Masuda ,  Akira Kagoshima ,  Shoji Ikuhara ,  Hideyuki Yamamoto

IPC分类号： H05H100

CPC分类号： H01L21/67276 ,  H01L22/20 ,  H01L22/34

摘要： A data processing apparatus for a semiconductor manufacturing apparatus includes a semiconductor manufacturing apparatus for executing processing for a wafer, a data collecting semiconductor device for collecting processing data generated in association with the processing, and a data copying semiconductor device for extracting the processing data collected in the data collecting semiconductor device and for producing a copy of the processing data. The apparatus may include a data analyzer for analyzing the data copy produced by the data copying semiconductor device and for diagnosing a processing state of the processing apparatus.

摘要翻译： 一种半导体制造装置的数据处理装置包括：用于执行晶片处理的半导体制造装置，用于收集与该处理相关联地生成的处理数据的数据收集半导体装置;以及数据复制半导体装置，用于提取收集的处理数据 数据采集​​半导体器件和用于产生处理数据的副本。 该装置可以包括用于分析由数据复制半导体器件产生的数据副本并用于诊断处理装置的处理状态的数据分析器。

公开(公告)号：US06714832B1

公开(公告)日：2004-03-30

申请号：US09535753

申请日：2000-03-27

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： G06F1900

CPC分类号： H01L21/67745 ,  H01L21/67167 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14 ,  Y10S438/905 ,  Y10T29/41

摘要： A method of operating a vacuum processing system including a plurality of processing units for processing wafers, a transferring unit for carrying the wafers and a control unit for controlling the processing units and the transferring unit. At least two of the plurality of processing units are connected to the transferring unit and wafers are processed using the processing units. The method includes the steps of judging whether each of the processing units is operable or inoperable, isolating inoperable ones of the processing units judged in the judging step from wafer processing, carrying wafers to operable ones of the processing units using the transferring unit and processing the wafers using only the operable processing units.

摘要翻译： 一种操作真空处理系统的方法，该真空处理系统包括用于处理晶片的多个处理单元，用于承载晶片的转印单元和用于控制处理单元和转印单元的控制单元。 多个处理单元中的至少两个连接到传送单元，并且使用处理单元处理晶片。 该方法包括以下步骤：判断每个处理单元是否可操作或不可操作，将在判断步骤中判断的不可操作的处理单元与晶片处理隔离，使用转移单元将晶片运送到可操作的处理单元，并处理 晶片仅使用可操作的处理单元。

公开(公告)号：US6069096A

公开(公告)日：2000-05-30

申请号：US925190

申请日：1997-09-08

申请人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

发明人： Kouji Nishihata ,  Kazuhiro Joo ,  Shoji Ikuhara ,  Tetsuya Tahara ,  Shoji Okiguchi

IPC分类号： H01L21/68 ,  H01L21/00 ,  H01L21/677 ,  H01L21/50

CPC分类号： H01L21/67167 ,  H01L21/67745 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T29/41

摘要： A vacuum processing system including two or more processing units for processing wafers and a transferring unit for carrying the wafers. In this system, even when any one of the processing units becomes inoperable because of a failure, the operation of the system can be continued, and even when a processing unit in the system requires repair or maintenance at the time of the start of operation, the system can be operated using other operable processing units without subjecting the operator to danger due to improper operation. As a result, the working efficiency of the system can be increased and the safety of the operator can be secured. In this system, the cleaning of the interior of each processing unit is performed by carrying a cleaning dummy wafer into each processing unit using the transferring unit, followed by recovery of the dummy wafer after cleaning, so that processing of wafers in the processing unit can be carried out once again.

摘要翻译： 包括用于处理晶片的两个或多个处理单元和用于承载晶片的转印单元的真空处理系统。 在该系统中，即使任何一个处理单元由于故障而变得不可操作，系统的操作可以继续，并且即使当系统中的处理单元在开始操作时需要修理或维护时， 该系统可以使用其他可操作的处理单元操作，而不会由于操作不当而导致操作者的危险。 结果，可以提高系统的工作效率，并确保操作者的安全。 在该系统中，通过使用转印单元将清洁虚设晶片装载到各个处理单元中，然后在清洁之后恢复虚设晶片来进行每个处理单元的内部的清洁，从而处理单元中的晶片的处理可以 再次进行。