Semiconductor manufacturing equipment
    1.
    发明授权
    Semiconductor manufacturing equipment 有权
    半导体制造设备

    公开(公告)号:US09110461B2

    公开(公告)日:2015-08-18

    申请号:US13612937

    申请日:2012-09-13

    IPC分类号: G05B19/18 G05B19/418

    摘要: Semiconductor manufacturing equipment includes: a controller controlling driving and processes of various parts of the semiconductor manufacturing equipment, and a sensor monitoring each physical amount in the semiconductor manufacturing equipment or a status of each chemical response amount; a database; and an arithmetic section executing: processing of reading out equipment data, calculating a correlation matrix between time points based on a plurality of pieces of signal data to be compared, calculating eigen values and eigen vectors from the correlation matrix, and calculating principal component scores by principal component analysis; processing of comparing magnitudes of the eigen values of the principal components, arranging the eigen values in descending order to display a list thereof; and processing of displaying a scatter diagram where the principal component scores of the respective signals are plotted in a feature space selecting the principal component corresponding to the eigen value having a contribution ratio.

    摘要翻译: 半导体制造设备包括:控制半导体制造设备的各个部分的驱动和处理的控制器,以及监测半导体制造设备中的每个物理量的传感器或每个化学响应量的状态; 数据库 以及算术部,其执行:读出设备数据,基于要比较的多条信号数据计算时间点之间的相关矩阵,从所述相关矩阵计算特征值和特征向量,以及通过 主成分分析; 对主成分的特征值的大小进行比较处理,按照降序排列本征值,显示其列表; 以及处理显示散射图,其中各个信号的主分量分数被绘制在选择与具有贡献率的本征值相对应的主分量的特征空间中。

    Communication apparatus, control method for communication apparatus, and computer program
    2.
    发明授权
    Communication apparatus, control method for communication apparatus, and computer program 有权
    通信装置,通信装置的控制方法以及计算机程序

    公开(公告)号:US08737393B2

    公开(公告)日:2014-05-27

    申请号:US12771993

    申请日:2010-04-30

    申请人: Daisuke Shiraishi

    发明人: Daisuke Shiraishi

    IPC分类号: H04L12/28 G06F7/00 G06F17/00

    摘要: A communication apparatus for performing connection type communication includes a first memory configured to store pieces of communication endpoint information relating to communication endpoints of connection, and a moving device configured to move, among the pieces of communication endpoint information stored in the first memory, communication endpoint information of connection set in a disconnection wait state, from the first memory to a second memory.

    摘要翻译: 用于执行连接型通信的通信装置包括:第一存储器,被配置为存储与连接的通信端点相关的通信端点信息;以及移动设备,被配置为在存储在第一存储器中的通信端点信息之间移动通信端点 在断开等待状态下设置的从第一存储器到第二存储器的连接信息。

    DIGITAL CAMERA
    3.
    发明申请

    公开(公告)号:US20120081562A1

    公开(公告)日:2012-04-05

    申请号:US13315898

    申请日:2011-12-09

    IPC分类号: H04N5/228

    CPC分类号: G03B17/02

    摘要: A digital camera of the present invention has: an optical housing having a bending optical system for reflecting photographic object light entering along a first optical axis to a second optical axis direction perpendicular to the first optical axis to form an image on an image pickup device; a camera main body having a containing portion for containing the optical housing slidably only in the second optical axis direction and having support portions for supporting the optical housing provided on each of both sides surfaces of the containing portion across the second optical axis of the bending optical system; and a shock absorbing unit provided between an inner surface of the containing portion of the camera main body in which the support portions are not provided and an outer surface of the optical housing facing thereto.

    DIGITAL CAMERA
    4.
    发明申请

    公开(公告)号:US20120081561A1

    公开(公告)日:2012-04-05

    申请号:US13315835

    申请日:2011-12-09

    IPC分类号: H04N5/228

    CPC分类号: G03B17/02

    摘要: A digital camera of the present invention has: an optical housing having a bending optical system for reflecting photographic object light entering along a first optical axis to a second optical axis direction perpendicular to the first optical axis to form an image on an image pickup device; a camera main body having a containing portion for containing the optical housing slidably only in the second optical axis direction and having support portions for supporting the optical housing provided on each of both sides surfaces of the containing portion across the second optical axis of the bending optical system; and a shock absorbing unit provided between an inner surface of the containing portion of the camera main body in which the support portions are not provided and an outer surface of the optical housing facing thereto.

    Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus
    7.
    发明授权
    Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus 失效
    蚀刻装置,自偏压测定方法以及蚀刻装置的监视方法

    公开(公告)号:US07330346B2

    公开(公告)日:2008-02-12

    申请号:US11506791

    申请日:2006-08-21

    IPC分类号: H02N13/00

    CPC分类号: H01L21/6833 H02N13/00

    摘要: The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage of an etching apparatus comprising an electrostatic chuck mechanism 1 and 10 for chucking a sample 2, a mechanism 13 and 14 for supplying cooling gas 12 to a rear surface of the sample 2 and controlling the pressure thereof, and a means for measuring the relative force of electrostatic chuck of the sample based on the rear surface pressure control status of the sample 2 being processed, wherein the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control of the sample 2 when high-frequency bias power is applied to the sample 2 being processed, and the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control status of the sample when high-frequency bias power is not applied to the sample being processed, and the self-bias voltage is estimated using the acquired forces of electrostatic chuck and the electrostatic chuck voltages corresponding to the two statuses.

    摘要翻译: 本发明提供了一种用于通过简单的过程在任意蚀刻条件下估计自偏压的装置。 本发明提供了一种用于测量蚀刻装置的自偏压的方法,该蚀刻装置包括用于夹持样品2的静电卡盘机构1和10,用于将冷却气体12供应到样品2的后表面的机构13和14,并且控制 其压力,以及用于根据正在处理的样品2的背面压力控制状态来测量样品的静电卡盘的相对力的装置,其中样品的静电卡盘的相对力和对应于 当对待处理的样品2施加高频偏置功率时,基于样品2的背面压力控制获取静电卡盘的力,并且将样品的静电卡盘与静电卡盘电压的相对力对应于 当高频时,基于样品的背面压力控制状态获取静电卡盘的力 cy偏压功率不会被施加到正在处理的样品,并且使用所获取的静电卡盘的力和对应于两种状态的静电卡盘电压来估计自偏压。

    Lens barrel and lens barrel system
    8.
    发明申请
    Lens barrel and lens barrel system 失效
    镜筒和镜筒系统

    公开(公告)号:US20070115566A1

    公开(公告)日:2007-05-24

    申请号:US11598762

    申请日:2006-11-14

    IPC分类号: G02B7/02

    CPC分类号: G02B7/02

    摘要: A lens barrel comprises a first frame member having a plurality of cam grooves, a second frame member having a first cam follower and a second cam follower fitted to the plurality of cam grooves, respectively, and an external contact member projecting externally from the end surface of the second frame member, having a center axis along a direction which the second frame member extends, in the direction of the center axis in a region sandwiched between a first plane including the center axis and the first cam follower and a second plane including the center axis and the second cam follower adjacent to the first cam follower.

    摘要翻译: 镜筒包括具有多个凸轮槽的第一框架构件,分别具有第一凸轮从动件和第二凸轮从动件的第二框架构件,以及分别从所述端面向外突出的外部接触构件 所述第二框架构件具有沿着所述第二框架构件的方向延伸的中心轴线,在夹在包括所述中心轴线的第一平面和所述第一凸轮从动件之间的区域中的所述中心轴线方向上, 中心轴线和与第一凸轮从动件相邻的第二凸轮从动件。

    Plasma processing apparatus and plasma processing method
    9.
    发明授权
    Plasma processing apparatus and plasma processing method 有权
    等离子体处理装置和等离子体处理方法

    公开(公告)号:US08828184B2

    公开(公告)日:2014-09-09

    申请号:US13356676

    申请日:2012-01-24

    摘要: A plasma processing apparatus includes a plasma processing chamber, a process monitor which monitors a condition in the plasma processing chamber, an actuator which controls a parameter constituting a plasma processing condition, N+1 correction amount calculating units which calculate a correction amount of a manipulated variable on the basis of a difference between a process monitor value monitored by the process monitor and a desired value of the process monitor and a correlation between the process monitor value and a manipulated variable, which is the parameter, the correlation having been acquired in advance, and N manipulated variable adding units that add a manipulated variable having a priority level next to an N-th manipulated variable. The N-th manipulated variable adding unit defines a correction amount calculated by the N+1-th correction amount calculating unit as the correction amount of an N+1-th manipulated variable.

    摘要翻译: 等离子体处理装置包括等离子体处理室,监视等离子体处理室中的状态的处理监视器,控制构成等离子体处理条件的参数的致动器,N + 1校正量计算单元,其计算被操纵的校正量 基于由过程监视器监视的过程监视值和过程监视器的期望值之间的差异以及过程监视值与作为参数的操作变量之间的相关性的变量,预先获取了相关性 ,以及N个操纵变量添加单元,其添加具有与第N个操作变量相邻的优先级的操作变量。 第N操作量增加单元将由第N + 1次校正量计算单元计算的校正量定义为第N + 1个操作变量的校正量。

    Data transfer apparatus and data transfer method
    10.
    发明授权
    Data transfer apparatus and data transfer method 有权
    数据传输装置和数据传输方法

    公开(公告)号:US08769166B2

    公开(公告)日:2014-07-01

    申请号:US13465712

    申请日:2012-05-07

    IPC分类号: G06F13/00

    CPC分类号: G06F13/4027

    摘要: A packet accompanying data valid information is transferred at high efficiency within an integrated circuit or between integrated circuits. A character indicating data enable information is provided and an identifier indicating a data enable character is assigned onto the packet. When the data enable information is valid in series, the data enable characters are eliminated from the packet to be transferred.

    摘要翻译: 伴随数据有效信息的包在集成电路内或集成电路之间以高效率传送。 提供指示数据使能信息的字符,并且将指示数据使能字符的标识符分配给分组。 当数据使能信息串联有效时,数据使能字符从要传输的数据包中消除。