公开(公告)号：US07276575B2

公开(公告)日：2007-10-02

申请号：US10544324

申请日：2004-01-29

申请人： Hideo Hada ,  Takeshi Iwai ,  Miwa Miyairi ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida

发明人： Hideo Hada ,  Takeshi Iwai ,  Miwa Miyairi ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida

IPC分类号： C08F6/00

CPC分类号： G03F7/0397 ,  C08F6/06 ,  C08F6/12

摘要： A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the resist resin (A) and an acid generator (B) dissolved in a first organic solvent (C1), such that if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution including the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.

摘要翻译： 用于精制抗蚀剂粗树脂的方法，其能够有效地除去粗树脂中所含的聚合物和低聚物等副产物。 用于光致抗蚀剂组合物中的抗蚀剂树脂（A）的粗树脂的精制方法至少包含溶解在第一有机溶剂（C 1）中的抗蚀剂树脂（A）和酸产生剂（B），使得如果浓度 在光致抗蚀剂组合物中的组分（A）的标记为X，并且包含溶解在第二有机溶剂（C 2）中的组分（A）的粗树脂的粗树脂溶液中的组分（A）的粗树脂浓度 被标记为Y，然后（i）制备粗制树脂溶液使得Y小于X，和（ii）随后过滤粗树脂溶液。

公开(公告)号：US20060135745A1

公开(公告)日：2006-06-22

申请号：US10544324

申请日：2004-01-29

申请人： Hideo Hada ,  Takeshi Iwai ,  Miwa Miyairi ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida

发明人： Hideo Hada ,  Takeshi Iwai ,  Miwa Miyairi ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida

IPC分类号： C08F6/00

CPC分类号： G03F7/0397 ,  C08F6/06 ,  C08F6/12

摘要： A process for refining a crude resin for a resist is provided, which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The process provides a refining process for the crude resin of a resist resin (A) used in a photoresist composition comprising at least the resist resin (A) and an acide generator (B) dissolved in a first organic solvent (C1), wherein if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution comprising the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.

摘要翻译： 提供了用于精制抗蚀剂粗树脂的方法，其能够有效地除去粗树脂中所含的聚合物和低聚物等副产物。 该方法为至少包含溶解在第一有机溶剂（C1）中的抗蚀剂树脂（A）和酰化发生剂（B））的光致抗蚀剂组合物中用于抗蚀剂树脂（A）的粗树脂提供精制方法，其中如果 将光致抗蚀剂组合物中组分（A）的浓度标记为X，将包含溶于第二有机溶剂（C2）中的组分（A）的粗树脂的粗树脂溶液中的组分（A）的粗树脂浓度 ）标记为Y，然后（i）制备粗树脂溶液使得Y小于X，和（ii）随后过滤粗树脂溶液。

公开(公告)号：US20060014098A1

公开(公告)日：2006-01-19

申请号：US10536047

申请日：2003-12-18

申请人： Hideo Hada ,  Takeshi Iwai ,  Masaaki Shimazaki ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida ,  Hirokazu Ozaki

发明人： Hideo Hada ,  Takeshi Iwai ,  Masaaki Shimazaki ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida ,  Hirokazu Ozaki

IPC分类号： G03C1/76

CPC分类号： B01D61/58 ,  B01D69/02 ,  B01D71/26 ,  B01D71/56 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/162

摘要： A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces the change of sensitivity and resist pattern size after treatment almost completely are provided. A photoresist composition containing a resin component (A), an acid-generating component (B) for generating an acid under exposure, and an organic solvent (C) is passed through a first filter 2a equipped with a first membrane having zeta potential of more than −20 mV but no more than 15 mV in distilled water of pH 7.0.

摘要翻译： 提供了获得能够减少显影后的抗蚀剂图案的缺陷发生的光致抗蚀剂组合物的技术。 此外，获得具有优异的储存稳定性特性的光致抗蚀剂组合物作为抗蚀剂溶液的技术（保存稳定性）; 并且提供了一种获得光刻胶组合物的技术，其提供了几乎完全降低了处理后的灵敏度变化和抗蚀剂图案尺寸的技术。 含有树脂组分（A），产生暴露酸的产酸组分（B）和有机溶剂（C）的光致抗蚀剂组合物通过第一过滤器2，第一过滤器2配备有具有ζ电位为 在pH 7.0的蒸馏水中大于-20mV，但不超过15mV。

公开(公告)号：US07927780B2

公开(公告)日：2011-04-19

申请号：US12208109

申请日：2008-09-10

申请人： Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

发明人： Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C07D407/02 ,  C07D409/02

CPC分类号： C07D493/18 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/124 ,  Y10S430/125

摘要： A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.

摘要翻译： 由式（I）表示的化合物; 和由式（b1-1）表示的化合物：其中X表示-O - ， - S - ， - O-R 3 - 或-S-R 4 - ，其中R 3和R 4各自独立地表示1至5的亚烷基 碳原子 R2表示碳原子数为1〜6的烷基，碳原子数为1〜6的烷氧基，碳原子数为1〜6的卤代烷基，碳原子数为1〜6的卤原子，羟基烷基，羟基 或氰基; a表示0〜2的整数， Q1表示1〜12个碳原子的亚烷基或单键; Y1表示1〜4个碳原子的亚烷基或氟化亚烷基; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US07745097B2

公开(公告)日：2010-06-29

申请号：US12174293

申请日：2008-07-16

申请人： Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

发明人： Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： C07D335/02 ,  C07C309/04 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

摘要： There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).

摘要翻译： 提供了由下述通式（b1-1）表示的新化合物，其可用作抗蚀剂组合物的酸产生剂及其制备方法，可用作新化合物的前体的化合物和制备方法 酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 （其中，R1表示可以含有取代基的芳基或烷基，R3表示氢原子或烷基，n1表示0或1的整数，在n1为1的情况下，R 1和R 3可以 相互键合形成具有3〜7元环结构的环以及与R 1键合的碳原子和与R3结合的碳原子; A表示与3-至 7元环结构与A键合的硫原子一起形成，环可含有取代基; R2表示可含有取代基的芳香族基团，碳原子数1〜10的直链或支链烷基， 可以含有取代基，或可以含有取代基的2〜10个碳原子的直链或支链烯基; n表示0或1的整数; Y1表示碳原子数为1〜4的亚烷基，其中氢 原子可以被氟取代 oms）。

公开(公告)号：US20100015548A1

公开(公告)日：2010-01-21

申请号：US11993005

申请日：2006-06-16

申请人： Masaru Takeshita ,  Hideo Hada ,  Takeshi Iwai

发明人： Masaru Takeshita ,  Hideo Hada ,  Takeshi Iwai

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0397 ,  C08F220/28 ,  G03F7/0045 ,  Y10S430/111

摘要： A positive resist composition including a resin component (A) and an acid generator component (B), the resin component (A) including a copolymer (A1) having a structural unit (a1) derived from an acrylate ester having a monocyclic or polycyclic group-containing acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing cyclic group, a structural unit (a3) derived from an acrylate ester having a hydroxyl group and/or cyano group-containing polycyclic group, and a structural unit (a4) represented by general formula (a4-1) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and f represents 0 or 1.

摘要翻译： 包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，所述树脂组分（A）包含具有衍生自具有单环或多环基团的丙烯酸酯的结构单元（a1）的共聚物（A1） 含有可离解的溶解抑制基团，衍生自具有含内酯环状基团的丙烯酸酯的结构单元（a2），衍生自具有羟基和/或含氰基的丙烯酸酯的结构单元（a3） 多环基和由以下通式（a4-1）表示的结构单元（a4）：其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R'表示氢原子，低级烷基或碳原子数1〜5的烷氧基。 f表示0或1。

公开(公告)号：US20090068591A1

公开(公告)日：2009-03-12

申请号：US12208109

申请日：2008-09-10

申请人： Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

发明人： Akiya Kawaue ,  Takeshi Iwai ,  Hideo Hada ,  Shinichi Hidesaka ,  Tsuyoshi Kurosawa ,  Natsuko Maruyama ,  Kensuke Matsuzawa ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07D493/18

CPC分类号： C07D493/18 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/124 ,  Y10S430/125

摘要： A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M+ represents an alkali metal ion; and A+ represents an organic cation.

摘要翻译： 由式（I）表示的化合物; 和由式（b1-1）表示的化合物：其中X表示-O - ， - S - ， - O-R 3 - 或-S-R 4 - ，其中R 3和R 4各自独立地表示1至5的亚烷基 碳原子 R2表示碳原子数为1〜6的烷基，碳原子数为1〜6的烷氧基，碳原子数为1〜6的卤代烷基，碳原子数为1〜6的卤原子，羟基烷基，羟基 或氰基; a表示0〜2的整数， Q1表示1〜12个碳原子的亚烷基或单键; Y1表示1〜4个碳原子的亚烷基或氟化亚烷基; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US20080311522A1

公开(公告)日：2008-12-18

申请号：US12135680

申请日：2008-06-09

申请人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

发明人： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC分类号： G03F7/004 ,  C07C309/04 ,  C07C69/74

CPC分类号： C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

摘要： A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

摘要翻译： 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 发生器（B1）由通式（b1-14）表示的化合物组成：其中R7“至R9”各自独立地表示芳基或烷基，其中R7“至R9”中的两个可以键合 彼此形成具有硫原子的环，并且R 7“至R 9”中的至少一个表示取代的芳基，其中部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代; X-表示阴离子。

公开(公告)号：US20070231708A1

公开(公告)日：2007-10-04

申请号：US11572990

申请日：2005-07-01

申请人： Shogo Matsumaru ,  Masaru Takeshita ,  Takeshi Iwai ,  Hideo Hada

发明人： Shogo Matsumaru ,  Masaru Takeshita ,  Takeshi Iwai ,  Hideo Hada

IPC分类号： C08F220/38 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114

摘要： The invention provides a polymer compound capable of forming a positive resist composition that can form a high-resolution pattern with a reduced level of LER, an acid generator formed from such a polymer compound, a positive resist composition that includes such a polymer compound, and a method for forming a resist pattern that uses such a positive resist composition. The polymer compound includes a structural unit (a1) derived from an (α-lower alkyl) acrylate ester having an acid-dissociable, dissolution-inhibiting group, a structural unit (a2) represented by a general formula (a2-1) shown below [wherein, R represents a hydrogen atom or a lower alkyl group; A represents a divalent organic group; B represents a monovalent organic group; X represents a sulfur atom or iodine atom; n represents either 1 or 2; and Y represents a straight-chain, branched or cyclic alkyl group in which at least one hydrogen atom may be substituted with a fluorine atom], and a structural unit (a3) derived from an (α-lower alkyl) acrylate ester that contains a polar group-containing aliphatic polycyclic group.

摘要翻译： 本发明提供一种能够形成正性抗蚀剂组合物的高分子化合物，其可以形成具有降低的LER水平的高分辨率图案，由这种高分子化合物形成的酸发生剂，包含这种高分子化合物的正性抗蚀剂组合物和 形成使用这种正性抗蚀剂组合物的抗蚀剂图案的方法。 高分子化合物包括衍生自具有酸解离性，溶解抑制基团的（α-低级烷基）丙烯酸酯的结构单元（a1），由以下所示的通式（a2-1）表示的结构单元（a2） [式中，R表示氢原子或低级烷基; A表示二价有机基团; B表示一价有机基团; X表示硫原子或碘原子; n表示1或2; 和Y表示其中至少一个氢原子可被氟原子取代的直链，支链或环状烷基]和衍生自（α-低级烷基）丙烯酸酯的结构单元（a3），其包含 含极性基团的脂族多环基团。

公开(公告)号：US20060183876A1

公开(公告)日：2006-08-17

申请号：US10565696

申请日：2004-08-10

申请人： Ryotaro Hayashi ,  Hideo Hada ,  Takeshi Iwai

发明人： Ryotaro Hayashi ,  Hideo Hada ,  Takeshi Iwai

IPC分类号： C08F118/02

CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28

摘要： A positive resist composition that exhibits excellent resolution and depth of focus, a resin for resists which is used in the positive resist composition, and a method of forming a resist pattern that uses the positive resist composition. The resin for resists includes structural units (a) derived from an (α-lower alkyl)acrylate ester as a principal component, wherein these structural units (a) include structural units (a1) derived from an (α-lower alkyl)acrylate ester containing an acid dissociable, dissolution inhibiting group, and lactone-containing monocyclic groups, and the structural units (a1) include structural units represented by the general formula (a1-1) shown below [wherein, R represents a hydrogen atom or a lower alkyl group, and R11 represents an acid dissociable, dissolution inhibiting group that contains a monocyclic aliphatic hydrocarbon group and contains no polycyclic aliphatic hydrocarbon groups].

摘要翻译： 表现出优异的分辨率和深度聚焦的正性抗蚀剂组合物，用于正性抗蚀剂组合物中的抗蚀剂树脂以及形成使用正性抗蚀剂组合物的抗蚀剂图案的方法。 用于抗蚀剂的树脂包括衍生自（α-低级烷基）丙烯酸酯作为主要成分的结构单元（a），其中这些结构单元（a）包括衍生自（α-低级烷基）丙烯酸酯的结构单元（a1） 含有酸解离性溶解抑制基团和含内酯单环基团，结构单元（a1）包括由下述通式（a1-1）表示的结构单元[其中，R表示氢原子或低级烷基 基团，R 11表示含有单环脂族烃基且不含多环脂族烃基的酸解离性溶解抑制基团]。