公开(公告)号：US20060030059A1

公开(公告)日：2006-02-09

申请号：US11244078

申请日：2005-10-06

申请人： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

发明人： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC分类号： H01L21/66

CPC分类号： B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

公开(公告)号：US20050243684A1

公开(公告)日：2005-11-03

申请号：US11176339

申请日：2005-07-08

申请人： Hideaki Sasazawa ,  Tohishiko Nakata ,  Masahiro Watanabe ,  Shunichi Matsumoto

发明人： Hideaki Sasazawa ,  Tohishiko Nakata ,  Masahiro Watanabe ,  Shunichi Matsumoto

IPC分类号： G11B7/00 ,  G11B7/0045 ,  G11B7/006 ,  G11B7/007 ,  G11B7/013 ,  G11B20/10 ,  G11B20/12

CPC分类号： G11B20/1217 ,  G11B7/0045 ,  G11B7/00454 ,  G11B7/006 ,  G11B7/00718 ,  G11B7/00745 ,  G11B7/013 ,  G11B20/10009 ,  G11B20/12 ,  G11B2020/10898 ,  G11B2020/1285 ,  G11B2020/1287 ,  G11B2020/1288 ,  G11B2220/216 ,  G11B2220/2537

摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.

摘要翻译： 一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中， 每次记录信息时，反转标记和标记之间的空格。 介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。 在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于 同步信号部分。

公开(公告)号：US06841321B2

公开(公告)日：2005-01-11

申请号：US10052513

申请日：2002-01-23

申请人： Shunichi Matsumoto ,  Yasuhiro Yoshitake ,  Yoshiyuki Miyamoto

发明人： Shunichi Matsumoto ,  Yasuhiro Yoshitake ,  Yoshiyuki Miyamoto

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03C5/00 ,  G03F9/00

CPC分类号： G03F7/70525 ,  G03F7/70458 ,  G03F7/70533 ,  G03F7/70591 ,  G03F7/70633

摘要： A method and a system for processing a semiconductor device intended to improve the overlay accuracy of a semiconductor device product, particularly in its device area, in carrying out the mix-and-match exposure process are designed to calculate the difference of exposure distortions between two layers in the device area and the difference of exposure distortions between the two layers at the overlay measurement mark position from data of exposure field distortions of two exposure tools used for the mix-and-match exposure process and data of device area and overlay measurement mark position of the product, calculate a modification value which relates both differences to each other, calculate a first exposure condition correction value from the measurement result of overlay, and carry out the exposure process based on a second exposure condition correction value which is evaluated by modifying the first exposure condition correction value with the modification value.

摘要翻译： 设计了一种用于处理半导体器件的方法和系统，旨在提高半导体器件产品的覆盖精度，特别是在其器件区域中进行混合匹配曝光过程，以计算两者之间的曝光失真的差异 设备区域中的层和来自覆盖测量标记位置处的两层之间的曝光失真的差异与用于混合和匹配曝光处理的两个曝光工具的曝光场失真数据以及设备区域和覆盖测量标记的数据 计算产品的位置，计算相互之间的差异的修正值，根据覆盖的测量结果计算第一曝光条件校正值，并且基于通过修改来评估的第二曝光条件校正值来执行曝光处理 具有修改值的第一曝光条件校正值。

公开(公告)号：US06801827B2

公开(公告)日：2004-10-05

申请号：US10268716

申请日：2002-10-09

申请人： Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Toshiharu Miwa

发明人： Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Toshiharu Miwa

IPC分类号： G06F1900

CPC分类号： H01L21/67253 ,  G03F7/70125 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/706 ,  G03F7/70633

摘要： A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions and the wave aberration of an exposure lens, feeds a correction value based on the predicted difference back to an exposure device and modifies an overlay inspection data control limit.

摘要翻译： 用于制造半导体器件的系统，其根据图案尺寸，照射条件和曝光透镜的波像差来预测电路图案和覆盖标记之间的配准误差的差异，将基于预测差异的校正值反馈给 曝光装置和修改覆盖检查数据控制限制。

公开(公告)号：US06064477A

公开(公告)日：2000-05-16

申请号：US644740

申请日：1996-05-10

申请人： Shunichi Matsumoto ,  Hiroaki Shishido

发明人： Shunichi Matsumoto ,  Hiroaki Shishido

IPC分类号： G01N21/88 ,  G01N21/93 ,  G01N21/94 ,  G01N21/956 ,  G03F1/32 ,  G03F1/84 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

CPC分类号： G01N21/94 ,  G01N21/956 ,  G01N21/95607 ,  G01N21/95623 ,  G03F1/84

摘要： A reticle inspecting apparatus for inspecting a reticle for defects has a transparent of translucent substrate, a circuit pattern formed on the front surface of the substrate, and a phase shifter formed of a light-transmissive film on the front surface of the substrate. In the apparatus, a detection optical system is disposed so as not to gather directly reflected light and directly transmitted light and so as to gather scattered light and diffracted light which has been scattered and diffracted, respectively, by the reticle. This detection optical system enables separation of the gathered light by direction of illumination using detectors and spatial filters disposed respectively on Fourier transform planes to intercept light diffracted by straight edges of the circuit pattern, so as to form images of gathered light on the detectors. A signal processing system having a signal processing unit calculates defects on the basis of the output signals of the detectors and displays the calculated data on a display.

摘要翻译： 用于检查掩模版用于缺陷的掩模版检查装置具有透光性的基板，形成在基板的前表面的电路图案，以及在基板的前表面上由透光膜形成的移相器。 在该装置中，检测光学系统被设置成不会直接聚集反射光并直接透射光，以分散散射光和被散射和衍射的衍射光。 该检测光学系统能够使用分别设置在傅立叶变换平面上的检测器和空间滤光器的照明方向来分离收集的光以截取由电路图案的直边衍射的光，从而在检测器上形成聚光的图像。 具有信号处理单元的信号处理系统基于检测器的输出信号计算缺陷，并将计算出的数据显示在显示器上。

公开(公告)号：US5208383A

公开(公告)日：1993-05-04

申请号：US825275

申请日：1992-01-24

申请人： Tadayoshi Takefumi ,  Yoshihiro Shiokawa ,  Shunichi Matsumoto ,  Nobuyuki Tokura

发明人： Tadayoshi Takefumi ,  Yoshihiro Shiokawa ,  Shunichi Matsumoto ,  Nobuyuki Tokura

IPC分类号： C07C45/46

CPC分类号： C07C45/46

摘要： A process for producing an aromatic acylation product from an aromatic compound, an olefin and carbon monoxide, which comprises the steps of:(a) reacting an olefin with carbon monoxide in the presence of hydrogen fluoride and boron trifluoride at a pressure of not more than 100 kg/cm.sup.2 G to prepare an acyl fluoride synthesis solution,(b) allowing the acyl fluoride synthesis solution to absorb boron trifluoride to form a complex of acyl fluoride and boron trifluoride,(c) subjecting an aromatic compound to an acylation reaction with a reaction mixture containing the complex of acyl fluoride and boron trifluoride, obtained in the step (b), to form a complex of boron trifluoride, hydrogen fluoride and an aromatic acylation compound, provided that the amount of the acyl fluoride in the complex of acyl fluoride and boron trifluoride is less than 1 mole per mole of the aromatic compound, and(d) separating the aromatic acylation compound from the complex formed in the step (c) by heating a reaction mixture obtained in the step (c).

摘要翻译： 一种由芳族化合物，烯烃和一氧化碳生产芳族酰化产物的方法，包括以下步骤：（a）在氟化氢和三氟化硼的存在下，使烯烃与一氧化碳在不大于 100kg / cm2G以制备酰基氟合成溶液，（b）使酰基氟合成溶液吸收三氟化硼以形成酰氟和三氟化硼的络合物，（c）使芳族化合物与反应进行酰化反应 含有步骤（b）中得到的酰氟和三氟化硼的络合物的混合物，形成三氟化硼，氟化氢和芳族酰化化合物的络合物，条件是酰基氟络合物中的酰基氟和 三氟化硼每摩尔芳族化合物少于1摩尔，和（d）通过加热芳族酰化化合物与步骤（c）中形成的络合物分离芳族酰化化合物 在步骤（c）中获得的载体混合物。

公开(公告)号：US11828522B2

公开(公告)日：2023-11-28

申请号：US17207967

申请日：2021-03-22

申请人： Jun Kondo ,  Kunio Kazami ,  Hiroshi Kubota ,  Shunichi Matsumoto ,  Takahiro Umeno ,  Syoji Takami ,  Takuji Ito

发明人： Jun Kondo ,  Kunio Kazami ,  Hiroshi Kubota ,  Shunichi Matsumoto ,  Takahiro Umeno ,  Syoji Takami ,  Takuji Ito

IPC分类号： F25D19/00 ,  H01F6/04

CPC分类号： F25D19/006 ,  H01F6/04

摘要： A cryogenic refrigerator includes a cooling unit and a magnetic shielding unit. The cooling unit is configured to cool a refrigerant. The magnetic shielding unit covers around the cooling unit.

公开(公告)号：US09535013B2

公开(公告)日：2017-01-03

申请号：US13702696

申请日：2011-05-27

申请人： Shunichi Matsumoto ,  Taketo Ueno ,  Atsushi Taniguchi

发明人： Shunichi Matsumoto ,  Taketo Ueno ,  Atsushi Taniguchi

IPC分类号： G01N21/95 ,  G01B11/30 ,  G01N21/21 ,  G01N21/94 ,  G01N21/956

CPC分类号： G01N21/9501 ,  G01B11/303 ,  G01N21/21 ,  G01N21/94 ,  G01N21/956

摘要： In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer.

摘要翻译： 在通过使用安装激光源的暗场型检查装置来检查其表面上具有透明氧化物膜或金属膜的基板时，具有高相干性的照明光束会引起由于内部的多个干涉引起的反射强度的变化 发生透明氧化膜或由于金属膜的表面粗糙度而引起的散射光的干扰，并且导致缺陷检测的灵敏度的劣化。 本发明通过使用高度指示性的宽带光源提供低相干但高亮度照明来解决该问题，并且其中同时采用常规激光光源来选择性地使用光源的系统，从而使得能够高度敏感 根据晶片的状况进行检查。

公开(公告)号：US20130242294A1

公开(公告)日：2013-09-19

申请号：US13989835

申请日：2011-11-10

申请人： Atsushi Taniguchi ,  Taketo Ueno ,  Shunichi Matsumoto ,  Toshifumi Honda

发明人： Atsushi Taniguchi ,  Taketo Ueno ,  Shunichi Matsumoto ,  Toshifumi Honda

IPC分类号： G01N21/956

CPC分类号： G01N21/95623 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8477

摘要： To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).

摘要翻译： 为了防止由于缺陷信号的减少而忽视缺陷，缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射，衍射和散射光，使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收，由此 获得第一幅图像; 从物体产生的反射，衍射和散射光被收集，使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收，由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。

公开(公告)号：US20130114880A1

公开(公告)日：2013-05-09

申请号：US13702696

申请日：2011-05-27

申请人： Shunichi Matsumoto ,  Taketo Ueno ,  Atsushi Taniguchi

发明人： Shunichi Matsumoto ,  Taketo Ueno ,  Atsushi Taniguchi

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G01B11/303 ,  G01N21/21 ,  G01N21/94 ,  G01N21/956

摘要： In inspecting a substrate having a transparent oxide film or a metal film formed on a surface thereof by using a dark field type inspection apparatus installing a laser light source, an illuminating beam having a high coherence causes variations in reflection strength due to multiple interferences within the transparent oxide film or an interference of scattered beams due to the surface roughness of the metal film occurs and which leads to degradation in the sensitivity of defect detection. The present invention solves the problem by providing a low-coherence but high-brightness illumination using a highly directive broadband light source, and a system in which the conventional laser light source is simultaneously employed to selectively use the light sources, thereby enabling a highly sensitive inspection according to the condition of a wafer.

摘要翻译： 在通过使用安装激光源的暗场型检查装置来检查其表面上具有透明氧化物膜或金属膜的基板时，具有高相干性的照明光束会引起由于内部的多个干涉引起的反射强度的变化 发生透明氧化膜或由于金属膜的表面粗糙度而引起的散射光的干扰，并且导致缺陷检测的灵敏度的劣化。 本发明通过使用高度指示性的宽带光源提供低相干但高亮度照明来解决该问题，并且其中同时采用常规激光光源来选择性地使用光源的系统，从而使得能够高度敏感 根据晶片的状况进行检查。