公开(公告)号：US06623895B2

公开(公告)日：2003-09-23

申请号：US09840291

申请日：2001-04-24

申请人： Jang Fung Chen ,  Roger Caldwell ,  Thomas Laidig ,  Kurt E. Wampler

发明人： Jang Fung Chen ,  Roger Caldwell ,  Thomas Laidig ,  Kurt E. Wampler

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/26 ,  G03F1/30 ,  G03F1/34

摘要： A method of forming a hybrid mask for optically transferring a lithographic pattern corresponding to an integrated circuit from the mask onto a semiconductor substrate by use of an optical exposure tool. The method includes the steps of forming at least one non-critical feature on the mask utilizing one of a low-transmission phase-shift mask (pattern) and a non-phase shifting mask (pattern), and forming at least one critical feature on the mask utilizing a high-transmission phase-shift mask (pattern).

公开(公告)号：US09025136B2

公开(公告)日：2015-05-05

申请号：US13225404

申请日：2011-09-02

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/44 ,  G03F7/20

CPC分类号： G03B27/42 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70433 ,  G03F7/70475 ,  G03F7/70491 ,  G03F7/70508

摘要： System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.

摘要翻译： 公开了用于制造三维集成电路的系统和方法。 在一个实施例中，该方法包括提供一种成像写入器系统，该系统包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入三维集成的一个或多个层的掩模数据 处理掩模数据以形成与三维集成电路的一层或多层相对应的多个划分的掩模数据模式，分配一个或多个SLM成像单元以处理每个分割的掩模数据模式，并且控制 多个SLM成像单元将多个划分的掩模数据图案并行地写入三维集成电路的一个或多个层。 分配方法执行缩放，对准，眼内位移，旋转因子或基底变形校正中的至少一个。

公开(公告)号：US07549140B2

公开(公告)日：2009-06-16

申请号：US11035737

申请日：2005-01-18

申请人： Doug Van Den Broeke ,  Jang Fung Chen ,  Thomas Laidig ,  Kurt E. Wampler ,  Stephen Hsu

发明人： Doug Van Den Broeke ,  Jang Fung Chen ,  Thomas Laidig ,  Kurt E. Wampler ,  Stephen Hsu

IPC分类号： G06F17/50 ,  G06F19/00 ,  G21K5/00 ,  G03F1/00

CPC分类号： G03F1/34 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70466 ,  G03F7/70941

摘要： A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).

摘要翻译： 一种生成用于在基板上印刷目标图案的掩模的方法。 该方法包括以下步骤：（a）使用形成在掩模中的相位结构来确定要在基板上成像的特征的最大宽度; （b）识别具有等于或小于最大宽度的宽度的目标图案中包含的所有特征; （c）从目标图案提取具有等于或小于最大宽度的宽度的所有特征; （d）在对应于在步骤（b）中识别的所有特征的掩模中形成相位结构; 和（e）在执行步骤（c）之后，在掩模中形成不透明结构以保持目标图案中的所有特征。

公开(公告)号：US06851103B2

公开(公告)日：2005-02-01

申请号：US10395903

申请日：2003-03-25

申请人： Doug Van Den Broeke ,  Jang Fung Chen ,  Thomas Laidig ,  Kurt E. Wampler ,  Stephen Hsu

发明人： Doug Van Den Broeke ,  Jang Fung Chen ,  Thomas Laidig ,  Kurt E. Wampler ,  Stephen Hsu

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/027 ,  G06F17/50 ,  G03F9/00 ,  G06F19/00 ,  G21K5/00

CPC分类号： G03F1/34 ,  G03F1/36 ,  G03F7/70125 ,  G03F7/70425 ,  G03F7/70466 ,  G03F7/70941

摘要： A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).

公开(公告)号：US09507271B1

公开(公告)日：2016-11-29

申请号：US13225405

申请日：2011-09-03

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/44 ,  G03F7/20

CPC分类号： G03F7/70433 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70475 ,  G03F7/70508 ,  G03F7/70791

摘要： System and method for manufacturing multiple light emitting diodes in parallel are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, providing one or more substrates corresponding to multiple LEDs to be manufactured, receiving mask data to be written to the one or more substrates corresponding to the multiple LEDs, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the plurality substrates of the multiple LEDs, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the plurality substrates of the multiple LEDs in parallel.

摘要翻译： 公开了并联制造多个发光二极管的系统和方法。 在一个实施例中，该方法包括提供一种成像写入器系统，其包括布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，提供对应于待制造的多个LED的一个或多个基板， 写入到与多个LED对应的一个或多个基板，处理掩模数据以形成与多个LED的多个基板相对应的多个分割的掩模数据图案，分配一个或多个SLM成像单元以处理每个分割的 掩模数据图案，并且控制多个SLM成像单元将多个分割的掩模数据图案并行写入多个LED的多个基板。

公开(公告)号：US08670106B2

公开(公告)日：2014-03-11

申请号：US12475114

申请日：2009-05-29

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/44 ,  G03B27/34

CPC分类号： G03F7/70383 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70508 ,  G03F7/70791

摘要： System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

摘要翻译： 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元; 接收要写入衬底的掩模数据图案，处理掩模数据图案以形成对应于衬底的不同区域的多个分割掩模数据模式，分配一个或多个SLM成像单元以处理每个分区掩模数据模式 控制所述多个SLM成像单元并行地将多个分割的掩模数据图案写入到所述基板，控制所述多个SLM成像单元的移动以覆盖所述基板的不同区域，并且控制所述基板的移动 与多个分割的掩模数据模式的连续写入同步。

公开(公告)号：US20080206656A1

公开(公告)日：2008-08-28

申请号：US12071439

申请日：2008-02-21

申请人： Thomas Laidig ,  Kurt E. Wampler ,  Donglas Van Den Broeke ,  Jang Fung Chen

发明人： Thomas Laidig ,  Kurt E. Wampler ,  Donglas Van Den Broeke ,  Jang Fung Chen

IPC分类号： G03F1/00 ,  G06F17/50

CPC分类号： G03F1/36

摘要： A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.

公开(公告)号：US07820341B2

公开(公告)日：2010-10-26

申请号：US11655868

申请日：2007-01-22

申请人： Thomas Laidig ,  Jang Fung Chen ,  Xuelong Shi ,  Ralph Schlief ,  Uwe Hollerbach ,  Kurt E. Wampler

发明人： Thomas Laidig ,  Jang Fung Chen ,  Xuelong Shi ,  Ralph Schlief ,  Uwe Hollerbach ,  Kurt E. Wampler

IPC分类号： G03F1/00 ,  G06F17/50

CPC分类号： G03F1/36 ,  G03F1/68

摘要： A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. The method includes the steps of: (a) defining a set of calibration patterns, which are represented in a data format; (b) printing the calibration patterns on a substrate utilizing the given imaging system; (c) determining a first set of contour patterns corresponding to the calibration patterns imaged on the substrate; (d) generating a system pseudo-intensity function, which approximates the imaging performance of the imaging system; (e) determining a second set of contour patterns by utilizing the system pseudo-intensity function to define how the calibration patterns will be imaged in the substrate; (f) comparing the first set of contour patterns and the second set of contour patterns to determine the difference therebetween; (g) adjusting the system pseudo-intensity function until the difference between the first set of contour patterns and the second set of contour patterns is below a predefined criteria; and (h) utilizing the adjusted system pseudo-intensity function to modify the mask so as to provide for optical proximity correction.

摘要翻译： 一种用于产生用于使用成像系统将形成在掩模中的图案光学转印到基板上的光刻掩模的方法。 该方法包括以下步骤：（a）定义以数据格式表示的一组校准图案; （b）使用给定的成像系统在校准图案上印刷校准图案; （c）确定与在所述基板上成像的所述校准图案相对应的第一组轮廓图案; （d）产生近似成像系统的成像性能的系统伪强度函数; （e）通过利用所述系统伪强度函数来确定所述校准图案将如何在所述衬底中成像而确定第二组轮廓图案; （f）比较第一组轮廓图案和第二组轮廓图案以确定它们之间的差异; （g）调整所述系统伪强度函数，直到所述第一组轮廓图案与所述第二组轮廓图案之间的差低于预定标准; 和（h）利用调整后的系统伪强度函数来修改掩模，以提供光学邻近校正。

公开(公告)号：US20090233186A1

公开(公告)日：2009-09-17

申请号：US12350919

申请日：2009-01-08

申请人： Thomas Laidig ,  Kurt E. Wampler ,  Donglas Van Den Broeke ,  Jang Fung Chen

发明人： Thomas Laidig ,  Kurt E. Wampler ,  Donglas Van Den Broeke ,  Jang Fung Chen

IPC分类号： G03F1/00 ,  G06F17/50

CPC分类号： G03F1/36

摘要： A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding—the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.

摘要翻译： 一种形成具有光学邻近校正特征的掩模的方法，其包括以下步骤：获得待成像的特征的目标图案，扩大要成像的特征的宽度，修改掩模以包括邻近放置的辅助特征 要成像的特征的边缘，其中辅助特征具有对应于要成像的特征的扩展宽度的长度，以及将要成像的特征从扩展宽度返回到对应于目标图案的宽度。

公开(公告)号：US09158190B2

公开(公告)日：2015-10-13

申请号：US13587773

申请日：2012-08-16

申请人： Jang Fung Chen ,  Thomas Laidig

发明人： Jang Fung Chen ,  Thomas Laidig

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/62 ,  G03F7/20

CPC分类号： G03B27/62 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/703 ,  G03F7/70508

摘要： System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The parallel imaging writer system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate.

摘要翻译： 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，并行成像写入器系统包括多个空间光调制器（SLM）成像单元，其中多个SLM成像单元中的每一个包括一个或多个照明源，一个或多个对准源，一个或多个投影透镜， 以及多个微反射镜，其配置成将来自所述一个或多个照明源的光投射到相应的一个或多个投影透镜。 并行成像写入器系统还包括被配置为控制多个SLM成像单元的控制器，其中控制器将掩模数据写入衬底中来分别调整每个SLM成像单元。