公开(公告)号：US20050147287A1

公开(公告)日：2005-07-07

申请号：US10992759

申请日：2004-11-22

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  G06K9/00 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： The present invention relates to a pattern defect inspection method and apparatus that reveal ultramicroscopic defects on an inspection target in which ultramicroscopic circuit patterns are formed, and inspect the defects with high sensitivity and at a high speed. The present invention provides a pattern inspection apparatus for comparing the images of corresponding areas of two formed patterns that should be identical with each other, and judging any mismatched image area as a defect. The pattern inspection apparatus includes means for performing an image comparison process on a plurality of areas in a parallel manner. Further, the pattern inspection apparatus also includes means for converting the gradation of the image signals of compared images in each of a plurality of different processes. Therefore, the present invention can properly detect defects even if the same patterns of compared images differ in brightness.

摘要翻译： 本发明涉及一种图案缺陷检查方法和装置，其在形成超微电路图案的检查对象上显露超显微缺陷，并以高灵敏度和高速检查缺陷。 本发明提供了一种图案检查装置，用于将两个形成的图案的相应区域的图像进行比较，该图形将彼此相同，并且将任何不匹配的图像区域判断为缺陷。 图案检查装置包括用于以并行方式对多个区域执行图像比较处理的装置。 此外，图案检查装置还包括用于在多个不同处理中的每一个中转换比较图像的图像信号的灰度的装置。 因此，即使相同的比较图像的图案的亮度不同，本发明也可以适当地检测缺陷。

公开(公告)号：US06799130B2

公开(公告)日：2004-09-28

申请号：US10241589

申请日：2002-09-12

申请人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

发明人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01N3700

CPC分类号： G01N21/95607

摘要： The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of work which constitutes an electronic device such as a semiconductor integrated circuit, and relates to a system therefor. On the basis of the result of comparison between defect information which is the result of inspection by an inspection tool and layout data stored in an auxiliary storage device, or on the basis of the result of reinspection by comparison between a defect and a wiring pattern as a background by an inspection processing operation unit, an object to be reviewed is selected using review conditions stored in the auxiliary storage device.

摘要翻译： 本发明涉及一种用于优先分析在检查构成诸如半导体集成电路之类的电子设备的工件中的颗粒和图案缺陷时引起电气故障的可能性高的缺陷的工具， 一个系统。 基于作为检查工具的检查结果的缺陷信息与存储在辅助存储装置中的布局数据之间的比较的结果，或者基于通过比较缺陷和布线图案之间的重新检查的结果， 通过检查处理操作单元的背景，使用存储在辅助存储装置中的检查条件来选择要检查的对象。

公开(公告)号：US08340395B2

公开(公告)日：2012-12-25

申请号：US12470507

申请日：2009-05-22

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/95607 ,  G06K9/2027 ,  G06K9/6284 ,  G06T7/001 ,  G06T2207/30148

摘要： The invention relates to a defect inspection apparatus in which images of mutually corresponding areas in identically formed patterns on a sample are compared to detect mismatched portions of the images as defects. The defect inspection apparatus includes an image comparator that creates a feature space with the use of feature quantities calculated from pixels of images acquired under different optical conditions and detects outlier values in the feature space as defects. Thus, the defect inspection apparatus can detect various defects with high sensitivity even if there are luminance differences between images of identical patterns which are attributable to the difference in wafer pattern thickness.

摘要翻译： 本发明涉及一种缺陷检查装置，其中比较了样本上相同形式的图案中相互对应区域的图像，以检测图像的不匹配部分作为缺陷。 缺陷检查装置包括使用从不同光学条件下获取的图像的像素计算的特征量来创建特征空间的图像比较器，并且检测特征空间中的异常值作为缺陷。 因此，缺陷检查装置即使在由于晶片图案厚度的差异导致的相同图案的图像之间存在亮度差异的情况下也能够高灵敏度地检测各种缺陷。

公开(公告)号：US08090187B2

公开(公告)日：2012-01-03

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US20110311126A1

公开(公告)日：2011-12-22

申请号：US13146033

申请日：2009-12-10

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/00

CPC分类号： G01N21/95607 ,  G01N21/47 ,  G01N2021/95615

摘要： A defect inspecting apparatus provide with an illumination optical system and a detection optical system is further provided with an image processing section, which has: a feature calculating section, which calculates a feature based on the inputted design data of the object to be inspected, and calculates a feature quantity based on a plurality of pieces of image data, which are acquired by the detection optical system and have different optical conditions or image data acquisition conditions; a defect candidate detecting section which integrates the feature obtained from the calculated design data and the feature quantity obtained from the plurality of pieces of image data and detects candidates; and a defect extracting section which extracts a highly critical defect from the detected defect candidates, based on the feature of the design data calculated by the feature calculating section.

摘要翻译： 缺陷检查装置提供照明光学系统，并且检测光学系统还具有图像处理部分，该图像处理部分具有：特征计算部分，其基于输入的待检查对象的设计数据计算特征;以及 基于由检测光学系统获取并具有不同的光学条件或图像数据获取条件的多个图像数据来计算特征量; 缺陷候选检测部分，其将从所计算的设计数据获得的特征与从多个图像数据获得的特征量进行积分并检测候选; 以及缺陷提取部，其基于由特征计算部计算出的设计数据的特征，从检测出的缺陷候选中提取高度关键的缺陷。

公开(公告)号：US07869966B2

公开(公告)日：2011-01-11

申请号：US10936501

申请日：2004-09-09

申请人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

发明人： Takafumi Okabe ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01N37/00

CPC分类号： G01N21/95607

摘要： The present invention relates to a tool for analyzing by priority a defect having a high possibility of causing an electrical failure when inspecting a particle and a pattern defect in a piece of work which constitutes an electronic device such as a semiconductor integrated circuit, and relates to a system therefor. On the basis of the result of comparison between defect information which is the result of inspection by an inspection tool and layout data stored in an auxiliary storage device, or on the basis of the result of reinspection by comparison between a defect and a wiring pattern as a background by an inspection processing operation unit, an object to be reviewed is selected using review conditions stored in the auxiliary storage device.

摘要翻译： 本发明涉及一种用于优先分析在检查构成诸如半导体集成电路之类的电子设备的工件中的颗粒和图案缺陷时引起电气故障的可能性高的缺陷的工具， 一个系统。 基于作为检查工具的检查结果的缺陷信息与存储在辅助存储装置中的布局数据之间的比较的结果，或者基于通过比较缺陷和布线图案之间的重新检查的结果， 通过检查处理操作单元的背景，使用存储在辅助存储装置中的检查条件来选择要检查的对象。

公开(公告)号：US07664608B2

公开(公告)日：2010-02-16

申请号：US11776572

申请日：2007-07-12

申请人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

发明人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G01B9/00 ,  G06F19/00

CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956

摘要： A pattern inspection apparatus which compares images of regions, corresponding to each other, of patterns that are formed so as to be identical and judges that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

摘要翻译： 一种模式检查装置，其将彼此对应的区域的图像进行比较，形成为相同的图案，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确检测缺陷。

公开(公告)号：US07646477B2

公开(公告)日：2010-01-12

申请号：US11131379

申请日：2005-05-18

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

公开(公告)号：US20090226076A1

公开(公告)日：2009-09-10

申请号：US12393859

申请日：2009-02-26

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.

摘要翻译： 在用于比较形成为相同的两个图案的相应区域的图像的图形检查装置中，以判断图像的不重合的部分是缺陷，导致图案的亮度不均匀性的影响 通过减小厚度差等，从而实现高灵敏度图案检查。 此外，可以进行高速图案检查，而不改变图像比较算法。 为此，图案检查装置在多个区域中并行地执行图像的比较处理。 此外，图案检查装置进行操作以使用不同的多个处理单元来转换比较图像中的图像信号的灰度，使得即使在图像中以相同图案发生亮度差异的情况下，也可以正确检测缺陷。

公开(公告)号：US07388979B2

公开(公告)日：2008-06-17

申请号：US10992759

申请日：2004-11-22

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： The present invention relates to a pattern defect inspection method and apparatus that reveal ultramicroscopic defects on an inspection target in which ultramicroscopic circuit patterns are formed, and inspect the defects with high sensitivity and at a high speed. The present invention provides a pattern inspection apparatus for comparing the images of corresponding areas of two formed patterns that should be identical with each other, and judging any mismatched image area as a defect. The pattern inspection apparatus includes means for performing an image comparison process on a plurality of areas in a parallel manner. Further, the pattern inspection apparatus also includes means for converting the gradation of the image signals of compared images in each of a plurality of different processes. Therefore, the present invention can properly detect defects even if the same patterns of compared images differ in brightness.

摘要翻译： 本发明涉及一种图案缺陷检查方法和装置，其在形成超微电路图案的检查对象上显露超显微缺陷，并以高灵敏度和高速检查缺陷。 本发明提供了一种图案检查装置，用于将两个形成的图案的相应区域的图像进行比较，该图形将彼此相同，并且将任何不匹配的图像区域判断为缺陷。 图案检查装置包括用于以并行方式对多个区域执行图像比较处理的装置。 此外，图案检查装置还包括用于在多个不同处理中的每一个中转换比较图像的图像信号的灰度的装置。 因此，即使相同的比较图像的图案的亮度不同，本发明也可以适当地检测缺陷。