公开(公告)号：US06620993B2

公开(公告)日：2003-09-16

申请号：US09726715

申请日：2000-11-30

申请人： Yasuhiko Okamura ,  Gary Gregson ,  Kenichiro Saito

发明人： Yasuhiko Okamura ,  Gary Gregson ,  Kenichiro Saito

IPC分类号： A63H500

CPC分类号： G10H1/0066 ,  G10H2240/021

摘要： In an automatic play apparatus for electronic music system, it is often desired to expand its function in universal and easy way. In this invention, at steps 100-140, the sequencer module records music performance data provided from an external device or it reproduces them. Sometimes it does both at the same time. In a series of processing at steps 100-140, the queue processing 200, 300 and 400 are introduced. In each queue processing, a part of the music performance data is memorized temporarily in Temporary Memory Area 200a, 300a and 400a, and the pointer, as an argument, corresponding to the memorized part of the music performance data is transferred to various plug-in programs which work as function expansion modules. The plug-in programs are thus enabled to read out the music performance data and write them, respectively from and in Temporary Memory Area 200a, 300a and 400a.

公开(公告)号：US06354922B1

公开(公告)日：2002-03-12

申请号：US09476905

申请日：2000-01-03

申请人： Kunihiko Sakurai ,  Tetsuji Togawa ,  Nobuyuki Takada ,  Satoshi Wakabayashi ,  Kenichiro Saito ,  Masahiko Sekimoto ,  Takuji Hayama ,  Daisuke Koga

发明人： Kunihiko Sakurai ,  Tetsuji Togawa ,  Nobuyuki Takada ,  Satoshi Wakabayashi ,  Kenichiro Saito ,  Masahiko Sekimoto ,  Takuji Hayama ,  Daisuke Koga

IPC分类号： B24B722

CPC分类号： B24B37/345 ,  B24B37/042 ,  H01L21/30625

摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The transfer structure comprises a plurality of robots and is capable of changing transfer routes between the three cleaning apparatuses.

摘要翻译： 抛光装置用于将诸如半导体晶片的工件抛光到平面镜面。 抛光装置包括具有抛光表面的转台，用于保持工件的顶环，并将工件压靠抛光表面抛光工件，用于清洁抛光工件的至少三个清洁装置和用于传送抛光工件的转印结构 在至少三个清洁装置之间。 传送结构包括多个机器人，并且能够改变三个清洁设备之间的传送路线。

公开(公告)号：US4590190A

公开(公告)日：1986-05-20

申请号：US510133

申请日：1983-07-01

申请人： Kenichiro Saito ,  Jorge Heller ,  Wilfred A. Skinner

发明人： Kenichiro Saito ,  Jorge Heller ,  Wilfred A. Skinner

IPC分类号： A61K9/06 ,  A61K9/70 ,  A61K47/10 ,  A61K47/12 ,  A61K47/14 ,  A61K47/16 ,  A61K47/18 ,  A61K47/20 ,  A61K47/22 ,  A61K31/55

CPC分类号： A61K47/14 ,  A61K47/10 ,  A61K47/12 ,  A61K47/18 ,  A61K47/20 ,  A61K47/22 ,  A61K9/0014

摘要： A method of percutaneously administering a physiologically active agent which comprises applying to the skin of a mammal a physiologically active agent in a carrier system which comprises at least one adjuvant and at least one solvent. The adjuvant can be selected from higher monoalcohols or mixtures thereof. The solvent can be selected from thioglycerols, lactic acid and esters thereof, cyclic ureas, compounds represented by the general formula R.sub.1 R.sub.2 NCONR.sub.3 R.sub.4, pyrrolidone-type compounds, amides, lactones or mixtures thereof.

摘要翻译： 一种经皮给药生理活性剂的方法，其包括向包含至少一种佐剂和至少一种溶剂的载体体系中的哺乳动物的皮肤施用生理活性剂。 佐剂可以选自更高级的一元醇或其混合物。 溶剂可以选自硫代甘油，乳酸及其酯，环脲，由通式R 1 R 2 NCONR 3 R 4表示的化合物，吡咯烷酮型化合物，酰胺，内酯或其混合物。