摘要:
A nozzle for atomizing molten metal to provide a powder having improved yield of fine particles is disclosed. The nozzle is comprised of a gas plenum, a melt delivery tube, and an annular inner wall means within the gas plenum for delivering atomizing gas to the exit orifice of the melt delivery tube. The exit orifice of the melt delivery tube has a ratio of inside diameter to outside diameter that provides a reduced flow of liquid through the tube during atomization.
摘要:
An integral transfer tube is produced comprised of a hollow high density ceramic oxide tube having its outer surface wall surrounded by a low density multilayered ceramic oxide shell, and having a heating element comprised of a heating wound portion and two end portions wherein the wound portion is intermediate the tube and the shell, and wherein at least a sufficient amount of the end portions are exposed for electrical attachment.
摘要:
A transfer tube is produced comprised of a high density ceramic oxide tube having directly bonded to its outer surface wall a low density ceramic oxide shell.
摘要:
A transfer tube is produced comprised of a high density ceramic oxide tube having a low density multi-layered ceramic oxide shell directly bonded to its outer surface wall.
摘要:
A transfer tube is produced comprised of a high density ceramic oxide tube having a low density multi-layered ceramic oxide shell directly bonded to its outer surface wall.
摘要:
A method of atomization of metals which melt at high temperatures is provided. The atomization is carried out in an atomization zone at the lower end of a melt delivery tube. Melt is delivered to the zone through the tube. Atomizing gas is delivered to the melt emerging from the lower end of the melt delivery tube by impinging the gas inwardly against the outer tapered end of the melt delivery tube. The tube's outer surface is formed with a concavity so that the incident atomizing gas is deflected into contact with the emerging melt stream.
摘要:
A method for generating prime powder from a material having a high melting point and apparatus for generating the powder is taught. The apparatus includes a melt delivery tube. The melt of the high melting material is introduced into the tube and exits from the tube into an atomization zone. Gas is delivered to the zone at high pressure as a stream to atomize the melt. Pursuant to the present invention, the atomizing gas is directed against the lower end of the melt delivery tube and it is deflected from the melt delivery tube into contact with the descending high temperature melt. A concave surface is provided on the end of the melt delivery tube to deflect the gas along the tube surface to minimize Eddy currents and provide better control of the atomization process.
摘要:
In various embodiments, eroded sputtering targets are partially refurbished by spray-depositing particles of target material to at least partially fill certain regions (e.g., regions of deepest erosion) without spray-deposition within other eroded regions (e.g., regions of less erosion). The partially refurbished sputtering targets may be sputtered after the partial refurbishment without substantive changes in sputtering properties (e.g., sputtering rate) and/or properties of the sputtered films.
摘要:
In various embodiments, eroded sputtering targets are partially refurbished by spray-depositing particles of target material to at least partially fill certain regions (e.g., regions of deepest erosion) without spray-deposition within other eroded regions (e.g., regions of less erosion). The partially refurbished sputtering targets may be sputtered after the partial refurbishment without substantive changes in sputtering properties (e.g., sputtering rate) and/or properties of the sputtered films.
摘要:
In various embodiments, eroded sputtering targets are partially refurbished by spray-depositing particles of target material to at least partially fill certain regions (e.g., regions of deepest erosion) without spray-deposition within other eroded regions (e.g., regions of less erosion). The partially refurbished sputtering targets may be sputtered after the partial refurbishment without substantive changes in sputtering properties (e.g., sputtering rate) and/or properties of the sputtered films.