摘要:
A volume holographic imaging system, apparatus, and/or method enables the projection of a two-dimensional (2D) slice of a four-dimensional (4D) probing object. A 4D probing source object is illuminated to emit or scatter an optical field. A holographic element having one or more recorded holograms receives and diffracts the optical field into a diffracted plane beam having spectral information. A 4-f telecentric relay system includes a pupil filter on the relayed conjugate plane of the volume hologram and images the pupil of the volume hologram onto the front focal plane of the collector lens. A collector lens focuses the diffracted plane beam to a 2D slice of the 4D probing source object. The focused 2D slice is projected onto a 2D imaging plane. The holographic element may have multiple multiplexed holograms that are arranged to diffract light from the corresponding slice of the 4D probing source object.
摘要:
An optical structure is provided. The optical structure includes a substrate structure. A photosensitive material layer is positioned on said substrate structure. The photosensitive material layer having uniform periodic geometry and a period length throughout associated with a 2D periodic pattern. The 2D periodic pattern includes a period length greater than the exposing light wavelength and spatial variation in the duty cycle of the features of a mask layer used in the formation of said 2D periodic pattern.
摘要:
A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.
摘要:
A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.
摘要:
A photonic bandgap microcavity is provided. The microcavity includes a membrane structure that can experience strain. A photonic bandgap waveguide element is formed on the membrane structure having a defect so that when the membrane structure is strained, the photonic bandgap waveguide element is tuned to a selective amount.
摘要:
A switching system is disclosed for an optical signal. The switching system includes a first optical waveguide coupled to a first electrode, a second electrode, and a second optical waveguide. The second optical waveguide is coupled to a movable electrode. The movable electrode is supported by a support structure and is positioned with respect to the first and second electrodes so that the position of the movable electrode may be selectively placed in either a first closed state or a second open state defined by the first and second electrodes under application of a voltage with respect to one of the first and second electrodes. The first closed state provides that the first and second optical waveguides are sufficiently close to each other to provide optical coupling therebetween while the second open state provides that the first and second optical communication channels are not sufficiently close to each other to provide optical coupling therebetween, or provide some different amount of optical coupling than in the first closed state.
摘要:
A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.
摘要:
A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).
摘要:
An adjustable lens is disclosed for use in an optical profilometer system. The adjustable lens includes a plurality of elements that are mutually spaced from another in a first position and provides a first focal point for an incident electromagnetic field having a first frequency incident at a first angle with respect to the plurality of elements. The adjustable lens also includes an actuation unit for changing the focal point of the plurality of elements to provide a second focal point for the incident electromagnetic field having the first frequency incident at the first angle with respect to the plurality of elements.
摘要:
An optical manipulation system is disclosed that includes an array of focusing elements, which focuses the energy beamlets from an array of beamlet sources into an array of focal spots in order to individually manipulate a plurality of samples on an adjacent substrate.