摘要:
In an exposure head of the invention, plural first micro-focusing elements are arranged in a first microlens array so as to correspond to plural micromirrors in a DMD. An aperture array that includes plural apertures arranged so as to respectively correspond to the plural first micro-focusing elements is disposed. The apertures allow only main portions of Fraunhofer diffraction images to be transmitted therethrough. The main portions of the Fraunhofer diffraction images transmitted through the apertures are imaged on an exposure plane by second micro-focusing elements of a second microlens array. According to the exposure head of the invention, cross-talk light and scattered light can be effectively reduced, and beam diameters of beam spots projected on the exposure plane through the apertures can be adjusted to a required size.
摘要:
An imaging head faces an imaging surface and is relatively moved along the scanning surface in a predetermined scanning direction. The imaging head includes an imaging element group and an alteration section. The imaging element group is structured by a plurality of imaging elements, which are arranged two-dimensionally in a plane substantially parallel to the imaging surface. The imaging element group generates a group of image pixels at the imaging surface in a two-dimensional arrangement which is inclined, as a whole, at a predetermined inclination angle with respect to the scanning direction. The alteration section alters a number of image pixels in a direction which is inclined from the scanning direction by the inclination angle, on the basis of a difference between the predetermined inclination angle of the imaging element group and an actual inclination angle of the image pixel group.
摘要:
In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S1=S2) is 1.5 mm or less.
摘要翻译:在通过使用光学积分器使照明光的强度分布均匀化的照明光学系统中,其总长度被缩短。 照明光学系统包括:光源,其包括在诸如二维SLM的照明体上的激光照射照明光和光学积分器; 光学积分器被放置在该光源和被照射体之间,并且通过使光通过微细胞而使照明光的强度分布均匀化。 在该系统中,光积分器的微小电极的尺寸(S 1 = S 2)为1.5mm以下。
摘要:
In an image forming apparatus: pixel portions of a spatial light-modulation element are two-dimensionally arranged, and individually modulate portions of light applied to the spatial light-modulation element, according to control signals; a first image-forming optical system is arranged in optical paths of the portions of the light modulated by the pixel portions; a microlens array is arranged in a vicinity of an image-forming plane of the first image-forming optical system, and has microlenses arranged in correspondence with the pixel portions, respectively; and a second image-forming optical system is arranged in optical paths of the portions of the light which have passed through the microlenses, and forms on a predetermined surface an image represented by the portions of the light-modulated by the spatial light-modulation element. Each of the first and second image-forming optical systems forms an image with a magnification power greater than one.
摘要:
A base plate and load beam for an HG assembly are formed in series, stacked, and transferred by a transfer system in the form of the stacked-layer series to undergo the necessary assembly processes such as layer joining, slider attachment, and electrical connections between the terminals thereon. When uncompleted HG assemblies are transferred for each of the manufacturing processes, the uncompleted HG assembly is mounted on the assembly jig such as a tray or a block for transference. For this reason, assembling jigs, the number of which is at least equal to the number of the uncompleted HG assemblies remaining at the respective assembly processes would be needed. Accordingly, the efficiency of work space is reduced, and a rise in manufacturing cost is brought about by the need for the assembling jigs.
摘要:
A base plate and load beam for an HG assembly are formed in series, stacked, and transferred by a transfer system in the form of the stacked-layer series to undergo the necessary assembly processes such as layer joining, slider attachment, and electrical connections between the terminals thereon. When uncompleted HG assemblies are transferred for each of the manufacturing processes, the uncompleted HG assembly is mounted on the assembly jig such as a tray or a block for transference. For this reason, assembling jigs, the number of which is at least equal to the number of the uncompleted HG assemblies remaining at the respective assembly processes would be needed. Accordingly, the efficiency of work space is reduced, and a rise in manufacturing cost is brought about by the need for the assembling jigs.
摘要:
In a light beam scanning system, a beam shaper shapes light beam emitted from a light source. The shaped light beam is deflected by a deflector to scan a surface in a main scanning direction. A scanning/imaging optical system causes the light beam deflected by the deflector to form an image on the surface and scan the same. The beam shaper includes a diverging optical system which converts the light beam into divergent light. The scanning/imaging optical system consists of first and second lens elements arranged in this order from the light source side and having first to fourth surfaces as numbered from the light source side and satisfies formulae, −1.42 0, fGR2>0 (3) wherein fall, fGF, r1GR, r2GR, r4GR, fGR1 and fGR2 respectively represent the composite focal length of the beam shaper and the scanning/imaging optical system, the focal length of the beam shaper, the radius of curvature of the first surface of the scanning/imaging optical system, the radius of curvature of the second surface of the scanning/imaging optical system, the radius of curvature of the fourth surface of the scanning/imaging optical system, the focal length of the first lens element and the focal length of the second lens element.
摘要:
A light beam scanning apparatus comprises a plurality of semiconductor lasers, collimator lenses for converting a plurality of laser beams emitted by the semiconductor lasers into parallel rays, a common converging optical system for converging the laser beams to a common spot, and a common light deflector for deflecting and scanning the laser beams. Or, a light beam scanning apparatus comprises a plurality of semiconductor lasers positioned so that laser beams emitted by the semiconductor lasers focus on a common spot, a plurality of converging optical systems respectively positioned so as to correspond to the semiconductor lasers for converging the laser beams to the spot, and a common light deflector for deflecting and scanning the laser beams.
摘要:
At least one plane diffraction grating is formed on a rotatable plate, and a light beam is made to impinge upon the plane diffraction grating. The first-order diffracted light component and the minus first-order diffracted light component of the light beam diffracted by the plane diffraction grating are reflected by use of many plane reflection surfaces and guided again to the plane diffraction grating so that, after the reflected light beams are diffracted again by the plane diffraction grating, the light beams diffracted again become parallel with the original light beam incident on the plane diffraction grating. The parallel light beams diffracted again are focused by a focusing lens onto a scanning surface, so that the scanning surface is scanned with the focused light spot along a bow-free straight scan line as the rotatable plate is rotated.
摘要:
In an image exposing apparatus that includes: a spatial optical modulation device having multitudes of pixel sections arranged two-dimensionally, each for modulating irradiated light; a light source for irradiating light on the spatial optical modulation device; and an image focusing optical system for focusing an image represented by the light modulated by the spatial optical modulation device on a photosensitive material, which includes image focusing lenses, and a microlens array disposed such that a plurality of microlenses are positioned at the image location of each of the pixel sections focused by the image focusing lenses, degradation in the image quality of an exposed image due to dust adhered to the microlens array is prevented by accommodating the microlens array in a housing having two transparent sections for transmitting the light to be passed through the microlens array and the light passed through the array.