公开(公告)号：US06877367B2

公开(公告)日：2005-04-12

申请号：US10266533

申请日：2002-10-07

申请人： Tokihiro Tsukamoto ,  Koichi Matsumoto ,  Shigeo Nakamura ,  Nobutaka Kihara

发明人： Tokihiro Tsukamoto ,  Koichi Matsumoto ,  Shigeo Nakamura ,  Nobutaka Kihara

IPC分类号： G01L3/26 ,  G01M15/00

CPC分类号： G01L3/26

摘要： The present invention provides a method for easily measuring a brake mean effective pressure of a running vehicle. An air flow sensor, a λ sensor and a data collecting apparatus are mounted to the vehicle. A running speed and engine speed from the vehicle while actually running on a road surface, and output of the air flow sensor an the λ sensor are inputted to the data collecting apparatus. Specific fuel consumption is obtained from an intake air amount and ratio of excessive air in exhaust gas. Output of an engine is obtained from a relation between the specific fuel consumption and the engine speed.

摘要翻译： 本发明提供一种容易测量行驶车辆的制动平均有效压力的方法。 空气流量传感器，λ传感器和数据采集装置安装在车辆上。 实际在路面上行驶时，来自车辆的运行速度和发动机转速以及将λ传感器输出的空气流量传感器输入到数据采集装置。 从进气量和排气中的过量空气的比例求出具体的燃料消耗量。 发动机的输出从特定燃料消耗和发动机转速之间的关系获得。

公开(公告)号：US06510307B2

公开(公告)日：2003-01-21

申请号：US09944100

申请日：2001-09-04

申请人： Masahiro Sato ,  Toshihiko Mitsuhashi ,  Yusuke Kitagawa ,  Kazuya Yamanoi ,  Ryuichi Yamamoto ,  Hiroyuki Okawa ,  Koji Miyake ,  Koichi Matsumoto ,  Takeshi Kawai ,  Shoichi Morita ,  Toshio Masubuchi

发明人： Masahiro Sato ,  Toshihiko Mitsuhashi ,  Yusuke Kitagawa ,  Kazuya Yamanoi ,  Ryuichi Yamamoto ,  Hiroyuki Okawa ,  Koji Miyake ,  Koichi Matsumoto ,  Takeshi Kawai ,  Shoichi Morita ,  Toshio Masubuchi

IPC分类号： G03G1516

CPC分类号： G03G15/1685 ,  G03G2215/0119 ,  G03G2215/0177 ,  G03G2215/1652

摘要： A transfer device for transferring an image on an image carrier 1 to a recording material 2, the transfer device includes a transferring member 4 adapted to nip and convey the recording material 2 between the transferring member 4 and the image carrier 1, a guard resin layer 5 having a surface microhardness not smaller than surface microhardness corresponding to polyimide, the guard resin layer 5 provided on a surface of the transferring member 4, and an adjustment resistance layer 6 provided as a ground layer of the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit an accumulation of charge in the guard resin layer 5. Or, the guard resin layer 5 made of an epoxy resin is provided on the surface of the transferring member 4, the adjustment resistance layer 6 having a smooth interface with the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit accumulation of charge in the guard resin layer. Furthermore, a scraper 8 for cleaning is provided on the surface of the transferring member 4 so as to contact with the surface of the transferring member. An image-forming apparatus is constructed by using the transferring device.

摘要翻译： 一种用于将图像载体1上的图像转印到记录材料2上的转印装置，该转印装置包括一个转印部件4，用于将记录材料2夹在和传送在转印部件4和图像载体1之间，保护树脂层 5，其表面显微硬度不小于对应于聚酰亚胺的表面显微硬度，设置在转印部件4的表面上的防护树脂层5和设置为防护树脂层5的接地层的调整电阻层6，调节电阻 层6适于抑制保护树脂层5中的电荷积累。或者，由转印构件4的表面上设置由环氧树脂制成的防护树脂层5，调节电阻层6与 保护树脂层5，调节电阻层6适于抑制电荷在保护树脂层中的积累。 此外，用于清洁的刮刀8设置在转印构件4的表面上以与转印构件的表面接触。 通过使用转印装置构成图像形成装置。

公开(公告)号：US06477865B1

公开(公告)日：2002-11-12

申请号：US09913660

申请日：2001-10-09

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： D04B2110

CPC分类号： D04B21/10 ,  D10B2403/0114 ,  D10B2403/0213 ,  D10B2403/0223 ,  D10B2505/04 ,  D10B2505/08

摘要： The invention is aimed to provide a three-dimensional marquisette-like knitted fabric, that is good in air retainability, air and water conductibility, light transmittance, as well as dimensional stability and shape retainability in the knitting and knitting-width directions, and in linearity; and has unevenness and slippage preventing property on its surface, thus being suitable in various uses. To this end, a three-dimensional marquisette-like structure is made as follows. A double-web knitted fabric is made by warp knitting, and is preferably comprised of the front and back mesh webs (1, 2) and connecting yarns (3) passed between the mesh webs alternately. At least one of the mesh webs (1, 2) has a marquisette-like construction formed by the rows of chain stitches (11, 21) and inlay yarn (5). In addition, connecting yarns (3) for connecting the mesh webs (1, 2) is shifted knitting-width-wise by at least one wale to be passed as slanted at every required course position corresponding to the marquisette-like construction of at least one of the mesh webs.

摘要翻译： 本发明的目的在于提供一种三维花纹状针织物，其具有良好的空气保持性，空气和水导电性，透光性以及针织和编织宽度方向上的尺寸稳定性和形状保持性， 线性度 并且在其表面上具有不均匀性和防滑性，因此适用于各种用途。 为此，如下制作三维花键状结构。 双网针织物通过经编制成，优选地由前后网状网（1,2）和连接纱线（3）之间交替布置在网状网之间。 网状网（1,2）中的至少一个具有由排列的线迹（11,21）和嵌入纱线（5）形成的马赛克式结构。 此外，用于连接网状网（1,2）的连接纱线（3）横向逐渐移动至少一个纵行，以便在对应于至少具有类似marquisette的结构的每个所需的路线位置倾斜通过 网格之一。

公开(公告)号：US06301016B1

公开(公告)日：2001-10-09

申请号：US08352883

申请日：1994-12-09

申请人： Kazutaka Matsueda ,  Koichi Matsumoto ,  Soichi Yamamuro ,  Masaya Kondo ,  Fumio Shoji

发明人： Kazutaka Matsueda ,  Koichi Matsumoto ,  Soichi Yamamuro ,  Masaya Kondo ,  Fumio Shoji

IPC分类号： H04N100

CPC分类号： H04N1/32635 ,  H04N1/00209 ,  H04N1/00214 ,  H04N1/00217 ,  H04N1/00347 ,  H04N1/32609 ,  H04N1/32614 ,  H04N1/32678 ,  H04N2201/001 ,  H04N2201/0039 ,  H04N2201/0086 ,  H04N2201/0093

摘要： A data processing apparatus, such as a facsimile apparatus, connected to a LAN, that transmits and/or receives data to or from another apparatus, wherein even if an error or failure such as a printer error or an insufficiency of available space in image memory for storing image data occurs, the required process is continued by transferring the image data from the data processing apparatus to another apparatus also connected to the LAN. The data processing apparatus has the capability of detecting an error in the LAN when the apparatus is connected to the LAN. This allows the data processing apparatus to operate correctly without problems that might otherwise occur due to the error in the LAN. The data processing apparatus also has the capability of operating in an adequate process mode corresponding to a process command contained in a received packet. This allows effective use of the data processing apparatus.

公开(公告)号：US6121985A

公开(公告)日：2000-09-19

申请号：US997591

申请日：1997-12-23

申请人： Ichiro Terada ,  Yoshiaki Masuda ,  Koichi Matsumoto ,  Tadasu Taniguchi

发明人： Ichiro Terada ,  Yoshiaki Masuda ,  Koichi Matsumoto ,  Tadasu Taniguchi

IPC分类号： G03G15/00 ,  B41J2/47 ,  G03G21/16 ,  H04N1/00 ,  H04N1/113 ,  H04N1/12 ,  G03G15/04

CPC分类号： B41J2/471 ,  G03G21/1628 ,  H04N1/00543 ,  G03G2221/1636 ,  G03G2221/1687 ,  H04N1/1135 ,  H04N1/12

摘要： It is an object of the present invention to provide a laser recording apparatus wherein problems such as difficulty in maintenance and effects of shock owing to the laser recording unit of a vertically divided type laser recording apparatus being provided as a single unit, are solved. This laser recording apparatus comprises: a first main unit; a second main unit rotatably supported to the first main unit by a predetermined fulcrum, so as to enable opening and closing; wherein the first main unit is provided with a first unit having optical means, laser beam emitting means, and laser beam detecting means, and wherein the second main unit is provided with a second unit having laser scanning means.

摘要翻译： 本发明的目的是提供一种激光记录装置，其解决了诸如难以维护的问题和由垂直分割型激光记录装置的激光记录单元作为单个单元提供的冲击的影响。 该激光记录装置包括：第一主单元; 第二主单元，其通过预定的支点可旋转地支撑在所述第一主单元上，以便能够打开和关闭; 其中所述第一主单元设置有具有光学装置，激光束发射装置和激光束检测装置的第一单元，并且其中所述第二主单元设置有具有激光扫描装置的第二单元。

公开(公告)号：US5837601A

公开(公告)日：1998-11-17

申请号：US788191

申请日：1997-01-24

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： H01L29/78 ,  H01L21/28 ,  H01L21/336 ,  H01L21/8238 ,  H01L27/092 ,  H01L21/3205 ,  H01L21/4763

CPC分类号： H01L29/665 ,  H01L21/28052 ,  H01L21/28061 ,  H01L21/823842

摘要： A semiconductor device in which mutual diffusion of doped impurities occurring through an upper silicide electrode layer is prevented. A silicide electrode layer is doped with both the same degree of p-type impurities as the concentration of p-type impurities of the lower gate electrode layer and the same degree of n-type impurities as the concentration of n-type impurities. As a result, the concentration of doped impurities of the gate electrode layer is balanced at the two sides of the interface of the pMOS side and nMOS side. Therefore, heat diffusion caused by subsequent heat treatment is prevented and the problem of mutual diffusion can be solved. The present invention is also suitable for the SALICIDE process. Even when the silicide electrode layer is formed simultaneously on an extremely shallow source or drain regions since the concentration of the impurities of the silicide electrode layer was initially high, the lower impurities will not be drained so the contact resistance will not be made to deteriorate. As a result, it becomes easy for the SALICIDE process to be applied to submicron devices. In the method of production of the present invention, the silicide electrode layer is formed by the CVD method or the sputtering method and the impurities doped during this process, so no special step has to be provided for introducing the impurities.

摘要翻译： 其中防止了通过上硅化物电极层发生的掺杂杂质的相互扩散的半导体器件。 掺杂了与下部栅电极层的p型杂质浓度相同程度的p型杂质和与n型杂质浓度相同程度的n型杂质的硅化物电极层。 结果，在pMOS侧和nMOS侧的界面的两侧平衡了栅电极层的掺杂杂质的浓度。 因此，防止了后续热处理引起的热扩散，可以解决相互扩散的问题。 本发明也适用于SALICIDE方法。 即使硅化物电极层由于硅化物电极层的杂质的浓度初始高而在极浅的源极或漏极区域同时形成，因此不会排出较低的杂质，因此不会使接触电阻劣化。 因此，将SALICIDE工艺应用于亚微米器件变得容易。 在本发明的制造方法中，通过CVD法或溅射法形成硅化物电极层以及在该工序中掺杂的杂质，因此不得不提供引入杂质的特殊工序。

公开(公告)号：US5779952A

公开(公告)日：1998-07-14

申请号：US741387

申请日：1996-10-29

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： B29C45/77 ,  B29C44/04 ,  B29C45/00 ,  B29C45/50 ,  B29D99/00 ,  B29K105/04 ,  B29L31/58 ,  B60R16/02 ,  B60R16/023 ,  H02G3/04 ,  B29C44/02

CPC分类号： B60R16/0239 ,  B29C44/0415 ,  B60R16/0215 ,  H02G3/04 ,  H02G3/0462

摘要： There is disclosed a molded part made of thermoplastic resin to which a foaming agent is added and including a protector body (51) having lock portions (56) serving as a strength required area, a lid element (52), and a hinge (54) between the protector body (51) and the lid element (52) and having a wall thickness less than that of the protector body (51) and the lid element (52), wherein the thermoplastic resin forming the protector body (51) including the lock portions (56) contains no foams but the thermoplastic resin forming the lid element (52) contains foams on opposite side of the hinge (54) from the protector body (51), thereby accomplishing a reduced weight and an ensured strength of the strength required area.

摘要翻译： 公开了一种由热塑性树脂制成的成型部件，其中添加有发泡剂，并且包括具有作为强度要求区域的锁定部分（56）的保护体（51），盖元件（52）和铰链（54） ）保护体（51）和盖元件（52）之间，其壁厚小于保护体（51）和盖元件（52）的壁厚，其中形成保护体（51）的热塑性树脂包括 锁定部分（56）不含泡沫体，而形成盖元件（52）的热塑性树脂在与保护体（51）相对的铰链（54）的相对侧上包含泡沫，从而实现了减轻重量和确保强度 强度要求面积。

公开(公告)号：US5754340A

公开(公告)日：1998-05-19

申请号：US496551

申请日：1995-06-29

申请人： Kazuo Ushida ,  Koichi Matsumoto

发明人： Kazuo Ushida ,  Koichi Matsumoto

IPC分类号： G02B5/18 ,  G02B27/00 ,  G03F7/20 ,  G02B27/44 ,  G02B13/14

CPC分类号： G02B27/0056 ,  G02B27/0043 ,  G02B27/4211 ,  G02B27/4222 ,  G02B5/1814 ,  G03F7/70308

摘要： The projection optical system of the present invention decreases particularly the secondary spectrum of chromatic aberration and minimizes restrictions on lens design. The projection optical system of a projection exposure apparatus which irradiates a light beam from a light source on a mask to expose a pattern of the mask onto a photosensitive substrate through the projection optical system has at least one diffraction optical element, at least one quartz lens, and at least one fluorite lens. The diffraction optical element has a positive power, the quartz lens has a negative power, and the fluorite lens has a positive power. An Ar--F laser is preferably used as a light source.

摘要翻译： 本发明的投影光学系统特别地降低了色差的二次光谱，并且对透镜设计的限制最小化。 投影曝光装置的投影光学系统具有：至少一个衍射光学元件，至少一个石英透镜;投影光学系统，其将来自光源的光束照射在掩模上，通过投影光学系统将掩模的图案曝光到感光基板上， ，和至少一个萤石透镜。 衍射光学元件具有正功率，石英透镜具有负功率，萤石透镜具有正功率。 优选使用Ar-F激光作为光源。

公开(公告)号：US5601907A

公开(公告)日：1997-02-11

申请号：US278666

申请日：1994-07-21

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： E02B11/00 ,  D03D3/00 ,  D04B21/10 ,  D04B21/14 ,  D04B21/20 ,  D06N7/04

CPC分类号： D03D3/00 ,  D03D11/02 ,  D04B21/10 ,  D10B2403/0213 ,  D10B2403/024 ,  D10B2403/02411 ,  D10B2403/0243 ,  D10B2505/204 ,  Y10T428/24273 ,  Y10T428/24298 ,  Y10T442/10

摘要： This invention relates to a three-dimensionally constructed net A for use in various applications including a water collecting and discharging net or a protection net in the faces of slopes in created land or residential sites, a plant protection net, such as a spray sowing net and so on, a building protecting net, an agricultural light-shielding net and a medical net. The net may be conveniently formed by knitting or weaving, so that cord portions which define the meshes are made in hollow three-dimensional construction capable of ventilation and water passage. Thereby, despite the fact that the net is a thick, three-dimensional body, the possession of a void content by the cord portions improves the ventilating and water collecting and discharging effects and saves weight, facilitating the handling and installing of the net, so that the net can be easily handled and well suited for the above-mentioned applications.

摘要翻译： 本发明涉及一种用于各种应用的三维构造网A，包括在创建的土地或住宅地点的斜坡面上的集水排放网或保护网，植物保护网如喷播网 建筑保护网，农用遮阳网和医疗网等。 网可以通过针织或编织方便地形成，使得限定网格的帘线部分制成能够通风和通水的中空三维结构。 因此，尽管网是厚实的三维体，但是由于帘线部分的空隙内容物的占有，提高了通风和集水排放的效果，节省了重量，便于网的处理和安装，所以 网可以容易地处理并且非常适合于上述应用。

公开(公告)号：US5541026A

公开(公告)日：1996-07-30

申请号：US480360

申请日：1995-06-07

申请人： Koichi Matsumoto

发明人： Koichi Matsumoto

IPC分类号： G03F1/00 ,  G03F1/30 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F1/30 ,  G03F1/50 ,  G03F7/70566 ,  G03F7/70583

摘要： In the lithographic operation for the manufacture of semiconductor devices, polarization of an exposure light is utilized as third information other than the amplitude and phase of the exposure light so as to obtain a high-resolution or high-contrast imaging performance. An exposure apparatus includes polarizing means arranged at the position of an incidence pupil of its projection optical system. Also, in a photo mask containing a pattern formed on a transparent substrate, a polarizing member is added to each of light transmitting portions in the pattern. With the diffracted beams from the photo mask contribution toward imaging, the directions of vibration of the electric vectors are arranged regularly to enhance interference performance and thereby to improve the contrast of an image. Also, the fundamental period of the pattern on the mask is substantially increased to improve the resolving power.

摘要翻译： 在用于制造半导体器件的光刻操作中，利用曝光光的偏振作为曝光光的振幅和相位以外的第三信息，以获得高分辨率或高对比度的成像性能。 曝光装置包括设置在其投影光学系统的入射光瞳位置处的偏振装置。 此外，在包含形成在透明基板上的图案的光掩模中，在图案中的每个光透射部分中添加偏振构件。 利用来自光掩模的衍射光束对成像的贡献，电矢量的振动方向被规则地布置以增强干涉性能，从而提高图像的对比度。 此外，掩模上的图案的基本周期显着增加以提高分辨率。