公开(公告)号：US08139200B2

公开(公告)日：2012-03-20

申请号：US13028795

申请日：2011-02-16

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

摘要翻译： 一种光刻设备，包括被配置为支撑图案形成装置的支撑件; 被配置为保持基板的基板台; 投影系统，被配置为将通过图案形成装置赋予辐射束的图案投影到基板的目标部分上; 以及第一多层反射镜和第二多层反射镜，所述第一多层反射镜和所述第二多层次要沿着所述辐射束的路径布置，所述第一多层次要层和所述第二多层反射镜 每个反射镜在极紫外波长范围内具有至少约50％的反射率，并且第一多层反射镜被配置为减少具有第一波长范围波长的辐射，而第二多层次镜被配置为减少具有波长的辐射 与第一波长范围不同的第二波长范围，其中第一波长范围和第二波长范围在极紫外波长范围之外。

公开(公告)号：US20110317814A1

公开(公告)日：2011-12-29

申请号：US12823503

申请日：2010-06-25

申请人： BORIS VERMAN

发明人： BORIS VERMAN

IPC分类号： G21K1/06

CPC分类号： G21K1/062 ,  B82Y10/00 ,  G21K1/04 ,  G21K2201/064 ,  G21K2201/067

摘要： An x-ray optical system includes a multiple corner optic assembly including an adjustable aperture assembly located in close proximity to the optic assembly. The adjustable aperture assembly enables a user to easily and effectively adjust the convergence of an incident beam of x-rays or the optic focal spot size. The adjustable aperture assembly may further enable a user to condition x-rays of one wavelength and block x-rays of another wavelength and thereby reduce the amount of background radiation exhibited from x-rays of more than one wavelength.

摘要翻译： X射线光学系统包括多角度光学组件，其包括位于光学组件附近的可调节光圈组件。 可调孔径组件使得用户能够容易且有效地调整入射光束的X射线或光焦点尺寸的会聚。 可调整孔径组件还可以使用户能够调节一个波长的x射线并阻挡另一个波长的X射线，从而减少从多于一个波长的X射线显示的背景辐射的量。

公开(公告)号：US08009797B2

公开(公告)日：2011-08-30

申请号：US12842937

申请日：2010-07-23

申请人： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

发明人： Chidane Ouchi ,  Kentaro Nagai ,  Toru Den ,  Hidenosuke Itoh

IPC分类号： G03H5/00

CPC分类号： G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

摘要： An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.

摘要翻译： X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。 算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。 此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

公开(公告)号：US20110188636A1

公开(公告)日：2011-08-04

申请号：US12699493

申请日：2010-02-03

申请人： Boris Verman ,  Michael Young ,  Licai Jiang

发明人： Boris Verman ,  Michael Young ,  Licai Jiang

IPC分类号： H01J35/04 ,  G21K1/00 ,  H01J35/30 ,  G21K1/02

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

摘要翻译： 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US07986455B2

公开(公告)日：2011-07-26

申请号：US12188603

申请日：2008-08-08

申请人： Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

发明人： Torsten Feigl ,  Nicolas Benoit ,  Sergiy Yulin ,  Nobert Kaiser

IPC分类号： F21V9/04 ,  G02B1/10

CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

摘要： A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.

摘要翻译： 多层反射镜包括布置在基板和多个层对上的层序列。 每个层对包括由第一材料构成的第一层和由第二材料构成的第二层。 第一层和第二层各自具有大于2nm的厚度，并且第一材料或第二材料是硅化硼或氮化钼。

公开(公告)号：US07965456B2

公开(公告)日：2011-06-21

申请号：US12241640

申请日：2008-09-30

申请人： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

发明人： Wilhelm Egle ,  Wolfgang Hafner ,  Willi Anderl ,  Ulrich Bingel ,  Holger Muenz ,  Thomas Neidhardt

IPC分类号： G02B7/02

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70858 ,  G21K1/06 ,  G21K2201/065 ,  G21K2201/067

摘要： An optical component comprises at least one optically effective optical element which heats up when irradiated with light, and at least one holding element for the at least one optical element for holding the at least one optical element in a carrier structure, wherein the at least one optical element is connected to the at least one holding element in heat conducting fashion, and wherein the at least one holding element is at least partially provided with an active cooling system for carrying off heat from the at least one optical element. Additionally or alternatively, a temperature control device is provided which controls the temperature of at least a part of the mount of the optical element.

摘要翻译： 光学部件包括至少一个在用光照射时加热的光学有效光学元件，以及至少一个用于至少一个光学元件的保持元件，用于将至少一个光学元件保持在载体结构中，其中至少一个 光学元件以热传导方式连接到所述至少一个保持元件，并且其中所述至少一个保持元件至少部分地设置有用于从所述至少一个光学元件传递热量的主动冷却系统。 附加地或替代地，提供了一种控制光学元件的至少一部分的温度的温度控制装置。

公开(公告)号：US20110134410A1

公开(公告)日：2011-06-09

申请号：US13028795

申请日：2011-02-16

申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/72

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

摘要翻译： 一种光刻设备，包括被配置为支撑图案形成装置的支撑件; 被配置为保持基板的基板台; 投影系统，被配置为将通过图案形成装置赋予辐射束的图案投影到基板的目标部分上; 以及第一多层反射镜和第二多层反射镜，所述第一多层反射镜和所述第二多层次要沿着所述辐射束的路径布置，所述第一多层次要层和所述第二多层反射镜 每个反射镜在极紫外波长范围内具有至少约50％的反射率，并且第一多层反射镜被配置为减少具有第一波长范围波长的辐射，而第二多层次镜被配置为减少具有波长的辐射 与第一波长范围不同的第二波长范围，其中第一波长范围和第二波长范围在极紫外波长范围之外。

公开(公告)号：US07875863B2

公开(公告)日：2011-01-25

申请号：US11643951

申请日：2006-12-22

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Mandeep Singh ,  Harm-Jan Voorma ,  Derk Jan Wilfred Klunder

IPC分类号： G21G5/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/067

摘要： An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or silicide compound or mixture thereof may be used for example.

摘要翻译： 例如，用于光刻设备的EUV照明系统被配置为调节辐射束。 氢自由基源，被配置为将含有氢或氢自由基的气体供应到照明系统中。 氢气有效地从照明系统中的反射镜表面除去碳质污染物或形成缓冲液以防止不需要的气体。 为了防止穿透反射镜的氢的破坏，反射镜包括与反射镜的反射面相邻的金属非金属化合物制成的层。 可以使用过渡金属碳化物，氮化物，硼化物或硅化物或其混合物。

公开(公告)号：US07869138B2

公开(公告)日：2011-01-11

申请号：US11689672

申请日：2007-03-22

申请人： Hans-Juergen Mann ,  Wolfgang Singer

发明人： Hans-Juergen Mann ,  Wolfgang Singer

IPC分类号： G02B17/00

CPC分类号： G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

摘要： The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

摘要翻译： 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

公开(公告)号：US20110001065A1

公开(公告)日：2011-01-06

申请号：US12157827

申请日：2008-06-13

申请人： Liviu Popa-Simil ,  Claudiu Iulian Muntele

发明人： Liviu Popa-Simil ,  Claudiu Iulian Muntele

IPC分类号： G21K1/00

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G21F1/02 ,  G21F3/00 ,  G21F3/025 ,  G21F3/035 ,  G21K1/062 ,  G21K1/10 ,  G21K2201/067 ,  Y10S977/902 ,  Y10S977/948 ,  Y10S977/961

摘要： The nuclear shielding is bulky and difficult to handle due to the reduced stopping power between the neutral radiations (X, gamma, n) and materials. It is proven that these radiations reflect at grazing angles on special substrates called super-mirrors that contain nano-layers of various materials. The usage of nano-structures in ordered manner or nano-tubes may create the super-mirror like wave-guide for this neutral radiation driving it and turning at angles greater than 90 degrees in few microns only. The usage of ferro or piezo electric nano-structures generates a shield that has the wave-guides path dependent on a control voltage. The resultant device is a shield for nuclear reactor criticality control, minimizing the nuclear reactor shielding and making an electric control of the power level by adjusting the shielding transmission. Other devices as X, n imaging device, or radiation funneling to increase the efficiency of using thin absorbents are some of the potential applications.

摘要翻译： 由于中性辐射（X，γ，n）和材料之间的停止功率降低，核屏蔽体积大而难以处理。 已经证明，这些辐射在特殊基板上以掠角反射，称为包含各种材料的纳米层的超级反射镜。 以有序的方式或纳米管的纳米结构的使用可以产生超级镜像波导，用于驱动它的中性辐射，并以几微米仅大于90度的角度转动。 铁电或压电纳米结构的使用产生了具有取决于控制电压的波导路径的屏蔽。 所得到的装置是用于核反应堆关键性控制的屏蔽，通过调节屏蔽传输来最小化核反应堆屏蔽并对功率电平进行电力控制。 其他设备如X，n成像设备或辐射漏斗，以提高使用薄吸收剂的效率是一些潜在的应用。