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    OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM
    6.
    发明申请
    OPTICAL ILLUMINATION SYSTEM FOR CREATING A LINE BEAM 有权
    用于创建线束的光学照明系统

    公开(公告)号：US20090231718A1

    公开(公告)日：2009-09-17

    申请号：US12414303

    申请日：2009-03-30

    申请人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

    发明人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

    IPC分类号： G02B27/12 ,  G02B13/08 ,  G02B13/10

    CPC分类号： G02B27/0927 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/066 ,  B23K26/067 ,  B23K26/0732 ,  B23K26/0738 ,  G02B27/0966

    摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

    摘要翻译： 在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束 在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

    Optical illumination system for creating a line beam
    7.
    发明授权
    Optical illumination system for creating a line beam 失效
    用于创建线束的光学照明系统

    公开(公告)号：US07538948B2

    公开(公告)日：2009-05-26

    申请号：US11318127

    申请日：2005-12-22

    申请人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

    发明人： Holger Muenz ,  Alois Herkommer ,  Rafael Egger

    IPC分类号： G02B27/10

    CPC分类号： G02B27/0927 ,  B23K26/0604 ,  B23K26/0608 ,  B23K26/066 ,  B23K26/067 ,  B23K26/0732 ,  B23K26/0738 ,  G02B27/0966

    摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

    摘要翻译： 在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束 在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

    Optical delay module for lenghtening the propagation path of a light beam and pulse multiplication or elongation module
    8.
    发明授权
    Optical delay module for lenghtening the propagation path of a light beam and pulse multiplication or elongation module 有权
    光延迟模块，用于延长光束的传播路径和脉冲倍增或延伸模块

    公开(公告)号：US07486707B2

    公开(公告)日：2009-02-03

    申请号：US11013189

    申请日：2004-12-15

    申请人： Alois Herkommer ,  Holger Muenz

    发明人： Alois Herkommer ,  Holger Muenz

    IPC分类号： H01S3/10

    CPC分类号： G03F7/70075 ,  G02B27/126 ,  G02B27/143 ,  G02B27/144 ,  G02B27/145 ,  G03F7/7055

    摘要： The invention relates to an optical delay module for lengthening the propagation path of a light beam comprises a first spherical mirror and a second spherical mirror, the first spherical mirror and the second spherical mirror having equal radii of curvature, the first and the second mirror being arranged on a common axis of symmetry with concave sides of the first and second mirrors being situated opposite one another at a distance from one another which corresponds to the radii of curvature of the first and second mirrors. The module also includes a coupling-in area for coupling the light beam into a space between the first and second mirrors and a coupling-out area for coupling the light beam out of the space between the first and second mirrors. The propagation path of the light beam between the coupling-in area and the coupling-out area corresponding at least approximately to quadruple the mirror distance, at least one optical arrangement arranged between the first and second mirrors, the optical arrangement being arranged to transfer the light beam between the first and second mirrors in such a way that the propagation path of the light beam without masking out of beam parts between the coupling-in area and the coupling-out area corresponds approximately to 2N times the mirror distance, where N is an integer >2.

    摘要翻译： 本发明涉及一种用于延长光束传播路径的光学延迟模块，包括第一球面镜和第二球面镜，第一球面镜和第二球面镜具有相等的曲率半径，第一和第二镜是 布置在共同的对称轴上，第一和第二反射镜的凹面彼此相对设置，彼此相距一定距离，对应于第一和第二反射镜的曲率半径。 该模块还包括用于将光束耦合到第一和第二反射镜之间的空间的耦合入区域和用于将光束耦合到第一和第二反射镜之间的空间的耦合输出区域。 在耦合入区域和耦合输出区域之间的光束的传播路径至少对应于反射镜距离的四倍，布置在第一和第二反射镜之间的至少一个光学布置，光学布置被布置成将 在第一和第二反射镜之间的光束，使得光束的传播路径在耦合入射区域和耦合输出区域之间的光束部分之外不被掩蔽，对应于反射镜距离的2N倍，其中N是 一个整数> 2。

    Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement
    9.
    发明授权
    Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement 有权
    用于测量窄带光源的光谱的方法和光谱仪布置

    公开(公告)号：US08289520B2

    公开(公告)日：2012-10-16

    申请号：US12558874

    申请日：2009-09-14

    申请人： Johannes Kraus ,  Alois Herkommer ,  Bernhard Weigl ,  Michel Le Maire ,  Holger Muenz

    发明人： Johannes Kraus ,  Alois Herkommer ,  Bernhard Weigl ,  Michel Le Maire ,  Holger Muenz

    IPC分类号： G01J3/45

    CPC分类号： G01J3/26 ,  G01J3/36

    摘要： A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.

    摘要翻译： 用于测量由窄带光源（例如带宽变窄的激光器）发射的光束的光谱的光谱仪装置包括至少一个标准具，用于将光束分成第一部分光束的分束器和第二部分光束 一个或多个用于通过至少一个标准具指导第一部分光束n次和第二部分光束（n + k）的光学引导元件，其中n和k是整数≥1。 光谱仪布置还具有至少一个光敏检测器和评估装置，用于评估已经通过至少一个标准具的第一部分光束的至少一个检测器记录的光谱n次和第二部分光束 已经通过至少一个标准具（n + k）次的光束，以便确定校正了至少一个标准具的装置功能的光谱。

    Optical devices and related systems and methods
    10.
    发明授权
    Optical devices and related systems and methods 有权
    光器件及相关系统及方法

    公开(公告)号：US07629572B2

    公开(公告)日：2009-12-08

    申请号：US11418872

    申请日：2006-05-05

    申请人： Vitaliy Shklover ,  Holger Kierey ,  Holger Muenz ,  Michel Le Maire ,  Bernhard Weigl

    发明人： Vitaliy Shklover ,  Holger Kierey ,  Holger Muenz ,  Michel Le Maire ,  Bernhard Weigl

    IPC分类号： G01J1/32 ,  G02B13/08

    CPC分类号： G02B27/0988 ,  G02B1/115 ,  G02B5/22 ,  G02B13/08 ,  G02B27/0966 ,  G03F7/70591 ,  G03F7/70958 ,  G03F7/70975

    摘要： The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

    摘要翻译： 本发明涉及一种光束强度不均匀性校正装置，其包括具有防反射性的光入射面的光学元件。 根据本发明，为了增强光束强度的均匀性，局部地修改了防反射特性。 本发明还涉及一种用于修正具有一个或多个光学元件的光学系统中的光束的强度分布的方法，其中所述方法包括：a）将光学系统与布置在预定位置的一个或多个光学元件组合，b ）测量强度分布，c）计算局部所需的光学元件之一的吸收和/或反射的增加或减少以将测量的强度分布修改为预定的强度分布，d）从光学系统中去除光学元件，e）局部地 根据计算修正光学元件之一的吸收和/或反射，f）将光学元件安装在光学系统中的预定位置。