Coordinate measuring machine for measuring structures on a substrate
    61.
    发明授权
    Coordinate measuring machine for measuring structures on a substrate 有权
    用于测量基板上的结构的坐标测量机

    公开(公告)号:US07961334B2

    公开(公告)日:2011-06-14

    申请号:US12220808

    申请日:2008-07-29

    IPC分类号: G01B11/02

    摘要: A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).

    摘要翻译: 一种用于在基板(2)上测量结构(3)的坐标测量机(1),包括:在X坐标方向和Y坐标方向上可移动的测量台(20),至少测量目标 一个用于确定测量表(20)和测量目标(9)的位置的激光干涉仪(24),其中测量表(20),测量目标(9)和至少一个激光干涉仪(24)被布置 在真空室(50)中。

    Method for determining positions of structures on a substrate
    62.
    发明授权
    Method for determining positions of structures on a substrate 有权
    确定衬底上结构位置的方法

    公开(公告)号:US07948635B2

    公开(公告)日:2011-05-24

    申请号:US12290051

    申请日:2008-10-27

    IPC分类号: G01B11/02

    CPC分类号: G03F1/84 G01B9/02052

    摘要: A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.

    摘要翻译: 公开了一种用于确定衬底上结构位置的系统。 该系统包括由壳体包围的多个站。 壳体内的至少一个站被设计为可移动的。 壳体设置有在壳体中产生空气流的过滤风扇单元。 空气引导元件设置在壳体中,使得可以实现不变的流动,而不管至少一个活动台。

    Coordinate measuring machine and a method for correcting non-linearities of the interferometers of a coordinate measuring machine
    63.
    发明授权
    Coordinate measuring machine and a method for correcting non-linearities of the interferometers of a coordinate measuring machine 有权
    坐标测量机和用于校正坐标测量机的干涉仪的非线性的方法

    公开(公告)号:US07929149B2

    公开(公告)日:2011-04-19

    申请号:US12176049

    申请日:2008-07-18

    申请人: Michael Heiden

    发明人: Michael Heiden

    IPC分类号: G01B11/02

    摘要: A method and a coordinate measuring machine (1) are provided, wherein the non-linearities of an interferometer (24) can be corrected. A measuring stage (20) traversable in a plane (25a) is provided for measurement. The substrate (2) is placed in a measuring stage (20); wherein the position of the measuring stage (20) along each of the motion axes is determined by at least one interferometer (24) in each case. A computer (16) is provided for compensating the non-linearity inherent in each of the interferometers (24), wherein the position of the measuring stage (20) to be determined by the interferometers (24) is arranged along a trajectory (52, 60, 67) of the measuring stage (20), which is composed at least partially of components of the axes.

    摘要翻译: 提供一种方法和坐标测量机(1),其中可以校正干涉仪(24)的非线性。 提供在平面(25a)中可移动的测量台(20)用于测量。 将基板(2)放置在测量台(20)中; 其中每个运动轴线上的测量台(20)的位置由至少一个干涉仪(24)确定。 提供了一种用于补偿每个干涉仪(24)中固有的非线性的计算机(16),其中要由干涉仪(24)确定的测量台(20)的位置沿轨迹(52, 所述测量台(20)的至少部分由所述轴的部件组成。

    Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device
    64.
    发明授权
    Device for determining the position of at least one structure on an object, use of an illumination apparatus with the device and use of protective gas with the device 有权
    用于确定物体上的至少一个结构的位置的装置,使用具有该装置的照明装置和使用该装置的保护气体

    公开(公告)号:US07903259B2

    公开(公告)日:2011-03-08

    申请号:US12015437

    申请日:2008-01-16

    申请人: Michael Heiden

    发明人: Michael Heiden

    IPC分类号: G01B11/02

    摘要: A device for determining the position of a structure (3) on an object (2) in relation to a coordinate system is disclosed. The object (2) is placed on a measuring table (20) which is movable in one plane (25a), wherein a block (25) defines the plane (25a). At least one optical arrangement (40, 50) is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement (40, 50) comprises an illumination apparatus (41, 51) for reflected light illumination and/or transmitted light illumination and at least one first or second optical element (9a, 9b), wherein at least part of the at least one optical element (9a, 9b) extends into the space (110) between the block (25) and an optical system support (100). The block (25) and/or the optical system support (100) separates the illumination apparatus (41, 51) spatially from the plane (25a) in which the measuring table (20) is movable.

    摘要翻译: 公开了一种用于相对于坐标系确定物体(2)上的结构(3)的位置的装置。 物体(2)被放置在可在一个平面(25a)中移动的测量台(20)上,其中块(25)限定平面(25a)。 为透射光照射和/或反射光照明提供至少一个光学装置(40,50)。 光学装置(40,50)包括用于反射光照射和/或透射光照明的照明装置(41,41)和至少一个第一或第二光学元件(9a,9b),其中至少部分至少 一个光学元件(9a,9b)延伸到块(25)和光学系统支撑件(100)之间的空间(110)中。 块体(25)和/或光学系统支撑体(100)将空间上的照明装置(41,51)从测量台(20)可移动的平面(25a)分离。

    Method for acquiring high-resolution images of defects on the upper surface of the wafer edge
    65.
    发明授权
    Method for acquiring high-resolution images of defects on the upper surface of the wafer edge 有权
    用于在晶片边缘的上表面上获取缺陷的高分辨率图像的方法

    公开(公告)号:US07768637B2

    公开(公告)日:2010-08-03

    申请号:US12072156

    申请日:2008-02-25

    IPC分类号: G01N21/00

    CPC分类号: G01N21/9503 H01L21/67288

    摘要: A method for acquiring high-resolution images of defects on the upper surface of the wafer edge is disclosed. For this purpose, first the position of at least one defect on the upper surface of the wafer edge is determined. The thus determined position of the defect is stored. Then the wafer is transferred into device for micro-inspection, in which the defect is examined more closely and imaged. The images acquired in the device for micro-inspection are deposited in a directory.

    摘要翻译: 公开了一种用于在晶片边缘的上表面上获取缺陷的高分辨率图像的方法。 为此,首先确定晶片边缘的上表面上的至少一个缺陷的位置。 存储这样确定的缺陷位置。 然后将晶片转移到用于微观检查的装置中,其中更仔细地检查缺陷并成像。 在微检查装置中获取的图像存放在目录中。

    Device for Determining the Position of at Least One Structure on an Object, Use of an Illumination Apparatus with the Device and Use of Protective Gas with the Device
    66.
    发明申请
    Device for Determining the Position of at Least One Structure on an Object, Use of an Illumination Apparatus with the Device and Use of Protective Gas with the Device 有权
    用于确定物体上的至少一个结构的位置的装置,使用装置的照明装置和使用装置的保护气体

    公开(公告)号:US20100110449A2

    公开(公告)日:2010-05-06

    申请号:US12015437

    申请日:2008-01-16

    申请人: Michael Heiden

    发明人: Michael Heiden

    IPC分类号: G01B11/14

    摘要: A device for determining the position of a structure (3) on an object (2) in relation to a coordinate system is disclosed. The object (2) is placed on a measuring table (20) which is movable in one plane (25a), wherein a block (25) defines the plane (25a). At least one optical arrangement (40, 50) is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement (40, 50) comprises an illumination apparatus (41, 51) for reflected light illumination and/or transmitted light illumination and at least one first or second optical element (9a, 9b), wherein at least part of the at least one optical element (9a, 9b) extends into the space (110) between the block (25) and an optical system support (100). The block (25) and/or the optical system support (100) separates the illumination apparatus (41, 51) spatially from the plane (25a) in which the measuring table (20) is movable.

    摘要翻译: 公开了一种用于相对于坐标系确定物体(2)上的结构(3)的位置的装置。 物体(2)被放置在可在一个平面(25a)中移动的测量台(20)上,其中块(25)限定平面(25a)。 为透射光照射和/或反射光照明提供至少一个光学装置(40,50)。 光学装置(40,50)包括用于反射光照射和/或透射光照明的照明装置(41,41)和至少一个第一或第二光学元件(9a,9b),其中至少部分至少 一个光学元件(9a,9b)延伸到块(25)和光学系统支撑件(100)之间的空间(110)中。 块体(25)和/或光学系统支撑体(100)将空间上的照明装置(41,51)从测量台(20)可移动的平面(25a)分离。

    Method for correcting an error of the imaging system of a coordinate measuring machine
    67.
    发明授权
    Method for correcting an error of the imaging system of a coordinate measuring machine 有权
    用于校正坐标测量机的成像系统的误差的方法

    公开(公告)号:US07680616B2

    公开(公告)日:2010-03-16

    申请号:US12218387

    申请日:2008-07-15

    IPC分类号: G01C17/38

    CPC分类号: G01B21/045 G03F1/84

    摘要: A method for correcting an error of the imaging system of a coordinate measuring machine is disclosed. The position of at least two different edges of at least one structure on a substrate is measured. The substrate may be automatically rotated into another orientation. Then the position of the at least two different edges of the at least one structure is measured on the rotated substrate. Based on the measurement data, a systematic error of the imaging system is eliminated.

    摘要翻译: 公开了一种用于校正坐标测量机的成像系统的误差的方法。 测量衬底上至少一个结构的至少两个不同边缘的位置。 衬底可以自动旋转到另一取向。 然后在旋转的基板上测量至少一个结构的至少两个不同边缘的位置。 基于测量数据,消除了成像系统的系统误差。

    Method and apparatus for inspecting a surface
    68.
    发明授权
    Method and apparatus for inspecting a surface 有权
    检查表面的方法和装置

    公开(公告)号:US07602481B2

    公开(公告)日:2009-10-13

    申请号:US12002718

    申请日:2007-12-18

    申请人: Albert Kreh

    发明人: Albert Kreh

    IPC分类号: G01N21/88

    摘要: A method and an apparatus for inspecting a surface of a wafer disclosed. At least one incident-light illuminator is provided to illuminate an area of the surface of the wafer in a first and a second illumination mode, in particular a bright-field and a dark-field illumination. At least one image detector is provided to detect an image of the illuminated area. A storage device is used for storing values on the intensity and the color of an optimized illumination of each incident-light illumination mode.

    摘要翻译: 一种用于检查公开的晶片的表面的方法和装置。 提供至少一个入射光照明器以在第一和第二照明模式,特别是亮场和暗场照明中照亮晶片表面的区域。 提供至少一个图像检测器以检测照明区域的图像。 存储装置用于存储每个入射光照射模式的优化照明的强度和颜色的值。

    MEANS AND METHOD FOR DETERMINING THE SPATIAL POSITION OF MOVING ELEMENTS OF A COORDINATE MEASURING MACHINE
    69.
    发明申请
    MEANS AND METHOD FOR DETERMINING THE SPATIAL POSITION OF MOVING ELEMENTS OF A COORDINATE MEASURING MACHINE 审中-公开
    用于确定坐标测量机移动元件空间位置的方法和方法

    公开(公告)号:US20090073458A1

    公开(公告)日:2009-03-19

    申请号:US12193229

    申请日:2008-08-18

    IPC分类号: G01B11/02 G01P21/00

    CPC分类号: G01B11/005

    摘要: A means and a method for determining the spatial position of at least one moving element (9, 20) of a coordinate measuring machine (1) are disclosed. At least one laser interferometer (24) directs a measurement beam (23) to the moving element (9, 20). At least one laser interferometer directs a further measurement beam to the moving element to determine a rotation of the moving element (9, 20) around an X-coordinate direction or around a Y-coordinate direction or around a Z-coordinate direction.

    摘要翻译: 公开了一种用于确定坐标测量机(1)的至少一个运动元件(9,20)的空间位置的装置和方法。 至少一个激光干涉仪(24)将测量光束(23)引导到移动元件(9,20)。 至少一个激光干涉仪将另外的测量光束引导到移动元件以确定围绕X坐标方向或围绕Y坐标方向或围绕Z坐标方向的移动元件(9,20)的旋转。

    Method for correcting measuring errors caused by the lens distortion of an objective
    70.
    发明申请
    Method for correcting measuring errors caused by the lens distortion of an objective 有权
    用于校正由物镜的镜头失真引起的测量误差的方法

    公开(公告)号:US20090070059A1

    公开(公告)日:2009-03-12

    申请号:US12231481

    申请日:2008-09-03

    IPC分类号: G01P21/00 G01N21/00

    CPC分类号: G01M11/0271 G01M11/0257

    摘要: A method for correcting the measuring errors caused by the lens distortion of an objective in a coordinate measuring machine is disclosed. For a plurality of different types of structures, the lens distortion caused by an objective is determined in an image field of the objective. The position of a type of structure is determined in the image field of the objective by a measuring window. The correction of the lens distortion required for the type of structure to be measured is retrieved from the database as a function of the type of structure to be measured.

    摘要翻译: 公开了一种用于校正由坐标测量机中的物镜的镜头变形引起的测量误差的方法。 对于多种不同类型的结构,在目标的图像场中确定由物镜引起的透镜失真。 通过测量窗在物镜的图像场中确定一种结构的位置。 根据要测量的结构类型,从数据库中检索要测量的结构类型所需的透镜畸变的校正。