摘要:
A system, method and program storage device implementing a method for modeling a data generating process, wherein the modeling comprises observing a data sequence comprising irregularly sampled data, obtaining an observation sequence based on the observed data sequence, assigning a time index sequence to the data sequence, obtaining a hidden state sequence of the data sequence, and decoding the data sequence based on a combination of the time index sequence and the hidden state sequence to model the data sequence. The method further comprises assigning a probability distribution over time stamp values of the observation sequence, wherein the decoding comprises using a Hidden Markov Model. The method further comprises using an expectation maximization methodology to learn the Hidden Markov Model.
摘要:
A method and structure for clustering documents in datasets which include clustering first documents and a first dataset to produce first document classes, creating centroid seeds based on the first document classes, and clustering second documents in a second dataset using the centroid seeds, wherein the first dataset and the second dataset are related. The clustering of the first documents in the first dataset forms a first dictionary of most common words in the first dataset and generates a first vector space model by counting, for each word in the first dictionary, a number of the first documents in which the word occurs, and clusters the first documents in the first dataset based on the first vector space model, and further generates a second vector space model by counting, for each word in the first dictionary, a number of the second documents in which the word occurs. Creation of the centroid seeds includes classifying second vector space model using the first document classes to produce a classified second vector space model and determining a mean of vectors in each class in the classified second vector space model, the mean includes the centroid seeds.
摘要:
A method and service of balancing delay in a circuit design begins with nodes that are to be connected together by a wiring design, or by being supplied with an initial wiring design that is to be altered. The wiring design will have many wiring paths, such as a first wiring path, a second wiring path, etc. Two or more of the wiring paths are designed to have matching timing, such that the time needed for a signal to travel along the first wiring path is about the same time needed for a signal to travel along the second wiring path, the third path, etc. The method/service designs one or all of the wiring paths to make the paths traverse wire segments of about the same length and orientation, within each wiring level that the first wiring path and the second wiring path traverse. Also, this process makes the first wiring path and the second wiring path traverse the wire segments in the same order, within each wiring level that the first wiring path and the second wiring path traverse.
摘要:
Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed.
摘要:
Disclosed is an autonomic abnormality detection device having a plurality of agents, a server with a one or more processors, a data storage device and a corrective actions engine. The device is adapted to detect and diagnose abnormalities in system components. Particularly, the device uses agents to track performance/workload measurements of system components and dynamically compiles a history of those performance/workload measurements for each component. In order to detect abnormalities a processor compares current performance/workload measurements for a component to the compiled histories for that component and for other components. The processor can further be adapted to determine possible causes of a detected abnormality and to report the abnormality, including the possible causes, to a corrective actions engine.
摘要:
Disclosed are embodiments of a MOSFET with defined halos that are bound to defined source/drain extensions and a method of forming the MOSFET. A semiconductor layer is etched to form recesses that undercut a gate dielectric layer. A low energy implant forms halos. Then, a COR pre-clean is performed and the recesses are filled by epitaxial deposition. The epi can be in-situ doped or subsequently implanted to form source/drain extensions. Alternatively, the etch is immediately followed by the COR pre-clean, which is followed by epitaxial deposition to fill the recesses. During the epitaxial deposition process, the deposited material is doped to form in-situ doped halos and, then, the dopant is switched to form in-situ doped source/drain extensions adjacent to the halos. Alternatively, after the in-situ doped halos are formed the deposition process is performed without dopants and an implant is used to form source/drain extensions.
摘要:
The invention provides a system/method of processing client requests over a computer network of hosts, that includes creating persistent containers in the hosts, creating objects in the containers, grouping the containers into grid container arrays, grouping objects within containers that are within a single grid container array into grid object arrays, creating one micro scheduler for each grid container array, dividing each of the client requests into a plurality of tasks, and assigning groups of the tasks to the microschedulers, wherein the microschedulers assign individual tasks to the objects. The invention assigns the microschedulers additional groups of tasks as the microschedulers return groups of completed tasks. The method can also include passing the client requests through gateways to multiple grid services schedulers.
摘要:
The invention disclosed comprises a method for encouraging fair sharing of limited material inventory and capacity between multiple customers when creating a production plan. the invention allocates resources among competing demands in a linear programming production planning system by first classifying the demands into fair share sets, wherein all demands within each set have the same priority, calculating the cumulative demand for each resource within each set, and then allocating the resources to the demands in order of fair share set priority. If, during the allocating process, the supply of a given resource cannot satisfy a given cumulative demand of a given set, the given resource is allocated proportionally (e.g., evenly or according to usage proportions) among all demands that contribute to the given cumulative demand within the given set. This is an advanced planning system for optimizing established planning objectives (e.g., customer service, short lead times, low inventory, and prioritized allocation of supply and capacity) to compute a feasible production plan for the enterprise.
摘要:
An eFuse begins with a single crystal silicon-on-insulator (SOI) structure that has a single crystal silicon layer on a first insulator layer. The single crystal silicon layer is patterned into a strip. Before or after the patterning, the single crystal silicon layer is doped with one or more impurities. At least an upper portion of the single crystal silicon layer is then silicided to form a silicided strip. In one embodiment the entire single crystal silicon strip is silicided to create a silicide strip. Second insulator(s) is/are formed on the silicide strip, so as to isolate the silicided strip from surrounding structures. Before or after forming the second insulators, the method forms electrical contacts through the second insulators to ends of the silicided strip. By utilizing a single crystal silicon strip, any form of semiconductor, such as a diode, conductor, insulator, transistor, etc. can form the underlying portion of the fuse structure. The overlying silicide material allows the fuse to act as a conductor in its unprogrammed state. However, contrary to metal or polysilicon based eFuses which only comprise an insulator in the programmed state, when the inventive eFuse is programmed (and the silicide is moved or broken) the underlying semiconductor structure operates as an active semiconductor device.
摘要:
Disclosed herein is an imaging method for patterning component shapes (e.g., fins, gate electrodes, etc.) into a substrate. By conducting a trim step prior to performing either an additive or subtractive sidewall image transfer process, the method avoids the formation of a loop pattern in a hard mask and, thus, avoids a post-SIT process trim step requiring alignment of a trim mask to sub-lithographic features to form a hard mask pattern with the discrete segments. In one embodiment a hard mask is trimmed prior to conducting an additive SIT process so that a loop pattern is not formed. In another embodiment an oxide layer and memory layer that are used to form a mandrel are trimmed prior to the conducting a subtractive SIT process. A mask is then used to protect portions of the mandrel during etch back of the oxide layer so that a loop pattern is not formed.