摘要:
A back contact configuration for a CIGS-type photovoltaic device is provided. According to certain examples, the back contact configuration includes an optical matching layer and/or portion of or including MoSe2 having a thickness substantially corresponding to maxima of absorption of reflected light in CIGS-type absorbers used in certain photovoltaic devices. Certain example methods for making the back contact configuration wherein a thickness of the MoSe2 layer and/or portion can be controlled to be within thickness ranges that correspond to maxima of CIGS light absorption for reflected solar light are also provided.
摘要:
Certain example embodiments of this invention relate to photovoltaic modules that include high contact angle coatings on one or more outermost major surfaces thereof, and/or associated methods. In certain example embodiments, the high contact angle coatings advantageously reduce the likelihood of electrical losses through parasitic leakage of the electrical current caused by moisture on surfaces of the photovoltaic modules, thereby potentially improving the efficiency of the photovoltaic devices. In certain example embodiments, the high contact angle coatings may be nitrides and/or oxides of or including Si, Ti, Ta, TaCr, NiCr, and/or Cr; hydrophobic DLC; and/or polymer-based coatings. The photovoltaic modules may be substrate-type modules or superstrate-type modules in different example embodiments.
摘要:
Certain example embodiments of this invention relate to techniques for making a coated article including a transparent conductive indium-tin-oxide (ITO) film supported by a heat treated glass substrate. A substantially sub-oxidized ITO or metallic indium-tin (InSn) film is sputter-deposited onto a glass substrate at room temperature. The glass substrate with the as-deposited film thereon is subjected to elevated temperatures. Thermal tempering or heat strengthening causes the as-deposited film to be transformed into a crystalline transparent conductive ITO film. Advantageously, this may reduce the cost of touch panel assemblies, e.g., because of the higher rates of the ITO deposition in the metallic mode. The cost of touch-panel assemblies may be further reduced through the use of float glass.
摘要:
A coated article such as a mirror or window is provided, the coated article including a coating supported by a glass substrate. The coating may include at least a reflective layer in certain example embodiments of this invention. In certain example embodiments, the reflective layer and/or a layer proximate thereto is selectively oxidized or oxidized in areas corresponding to draw lines or other non-uniformities in the glass substrate. This permits reflections from the coated article to be more uniform and/or less distorted.
摘要:
Certain example embodiments of this invention relate to a front transparent conductive electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments enable high haze to be realized in the top layer of the thin film stack. In certain example embodiments, an insertion layer comprising ITO or AZO is provided between a layer of AZO and a layer of ITO. The AZO may be deposited at room temperature. The insertion layer is provided with an oxygen content selected so that the insertion layer sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. In certain example embodiments, the layer of ITO may be ion-beam treated so as to roughen a surface thereof. The ion beam treating may be performed a voltage sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided.
摘要:
Certain example embodiments of this invention relate to a front transparent conductive electrode for solar cell devices (e.g., amorphous silicon or a-Si solar cell devices), and/or methods of making the same. Advantageously, certain example embodiments enable high haze to be realized in the top layer of the thin film stack. In certain example embodiments, an insertion layer comprising ITO or AZO is provided between a layer of AZO and a layer of ITO. The AZO may be deposited at room temperature. The insertion layer is provided with an oxygen content selected so that the insertion layer sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided. In certain example embodiments, the layer of ITO may be ion-beam treated so as to roughen a surface thereof. The ion beam treating may be performed a voltage sufficient to alter the crystalline growth of the layer of AZO compared to a situation where no insertion layer is provided.
摘要:
A method of making a coated article including a transparent conductive oxide (TCO) film supported by a glass substrate is provided. In certain example embodiments, the coated article including the TCO film on the glass substrate is thermally tempered in a tempering furnace. In certain example embodiments, during tempering flame(s) are provided proximate the exposed surface of the TCO in order to burn off excess oxygen near the TCO surface thereby preventing or reducing oxidation of the TCO during the tempering process. A coated article, that is thermally tempered, made by such a product is also provided.
摘要:
A transparent conductive oxide (TCO) based film is formed on a substrate. The film may be formed by sputter-depositing, so as to include both a primary dopant (e.g., Al) and a co-dopant (e.g., Ag). The benefit of using the co-dopant in depositing the TCO inclusive film may be two-fold: (a) it may prevent or reduce self-compensation of the primary dopant by a more proper positioning of the Fermi level, and/or (b) it may promote declustering of the primary dopant, thereby freeing up space in the metal sublattice and permitting more primary dopant to create electrically active centers so as to improve conductivity of the film. Accordingly, the use of the co-dopant permits the primary dopant to be more effective in enhancing conductivity of the TCO inclusive film, without significantly sacrificing visible transmission characteristics. An example TCO in certain embodiments is ZnAlOx:Ag.
摘要:
Certain example embodiments of this invention relate to an electrode (e.g., front electrode) for use in a photovoltaic device or the like. In certain example embodiments, a transparent conductive oxide (TCO) based front electrode for use in a photovoltaic device is of or includes zinc oxide, or zinc aluminum oxide, doped with yttrium (Y). In certain example embodiments, the addition of the yttrium (Y) to the conductive zinc oxide or zinc aluminum oxide is advantageous in that potential conductivity loss of the electrode can be reduced or prevented. In other example embodiments, a low-E coating may include a layer of or including zinc oxide, or zinc aluminum oxide, doped with yttrium (Y).
摘要:
This invention relates to a front contact for use in an electronic device such as a photovoltaic device. In certain example embodiments, the front contact of the photovoltaic device includes a low work-function transparent conductive oxide (TCO) of a material such as tin oxide, zinc oxide, or the like, and a thin high work-function TCO of a material such as oxygen-rich ITO (indium tin oxide) or the like. The high-work function TCO is located between the low work-function TCO and the uppermost semiconductor layer of the photovoltaic device so as to provide for substantial work-function matching between the low work-function TCO and the high work-function uppermost semiconductor layer of the device in order to reduce a potential barrier for holes extracted from the device by the front contact.