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217 条记录 (耗时 0.046 秒)

    Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
    65.
    发明申请
    Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process 有权
    含氟硅化合物，硅树脂，抗蚀剂组合物和图案化工艺

    公开(公告)号：US20070218402A1

    公开(公告)日：2007-09-20

    申请号：US11713709

    申请日：2007-03-05

    申请人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

    发明人： Takeshi Kinsho ,  Mutsuo Nakashima ,  Koji Hasegawa ,  Takeru Watanabe

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0757 ,  C07F7/1804 ,  G03F7/0045 ,  G03F7/0046 ,  Y10S430/106 ,  Y10S430/108

    摘要： Fluorine-containing silicon compounds having the general formula (1): wherein X1, X2, and X3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, Y is a divalent organic group, R1 and R2 are each independently hydrogen or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or R1 and R2 may bond together to form a ring with the carbon atom to which they are attached silicone resins obtained from the compounds of formula (1) has an appropriate acidity to enable formation of a finer pattern while minimizing the pattern collapse by swelling when used in a resist composition.

    摘要翻译： 具有通式（1）的含氟硅化合物：其中X 1，X 2和X 3各自为氢，羟基， 卤素，1〜6个碳原子的直链，支链或环状烷氧基，或具有直链，支链，环状或多环骨架的1〜20个碳原子的一价有机基团，Y为二价有机基团， 1和R 2各自独立地为氢或具有直链，支链，环状或多环骨架的1至20个碳原子的一价有机基团，或R 1 >和R 2可以键合在一起形成与它们所连接的碳原子形成的环，由式（1）化合物获得的有机硅树脂具有适当的酸度以使得能够形成更精细的图案，同时 当在抗蚀剂组合物中使用时，通过溶胀使图案崩溃最小化。

    Tetrahydrofuran compounds having alicyclic structure
    69.
    发明授权
    Tetrahydrofuran compounds having alicyclic structure 有权
    具有脂环结构的四氢呋喃化合物

    公开(公告)号：US06509481B2

    公开(公告)日：2003-01-21

    申请号：US10117218

    申请日：2002-04-08

    申请人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

    发明人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

    IPC分类号： C07D31500

    CPC分类号： C07D307/12 ,  C07D307/06

    摘要： Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.12,5.17,10]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography

    摘要翻译： 式（1）的四氢呋喃化合物，其中虚线表示单键，二价有机基团或其中降冰片烯或四环[4.4.0.12,5.17,10]十二碳烯形式的脂环结构和四氢呋喃环状 结构共享一个或两个组成碳原子，并且k为0或1是新颖的并且可用作形成用于化学增强抗蚀剂组合物中的基础树脂的单体，其适用于微图案光刻

    Tertiary alcohol compounds having an alicyclic structure
    70.
    发明授权
    Tertiary alcohol compounds having an alicyclic structure 有权
    具有脂环结构的叔醇化合物

    公开(公告)号：US06469220B2

    公开(公告)日：2002-10-22

    申请号：US10025064

    申请日：2001-12-19

    申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C07C3522

    CPC分类号： C07C33/14 ,  C07C35/21 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/90 ,  G03F7/0395 ,  G03F7/0397

    摘要： The present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an ArF excimer laser. Specifically, the present invention provides tertiary alcohols compounds represented by the following general formula (1): wherein R1 and R2 each independently represent a straigh-chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms, or R1 and R2 may be joined together to form an aliphatic hydrocarbon ring; Z represents a straight-chain, branched or cyclic divalent organic group having 2 to 10 carbon atoms; and k is 0 or 1.

    摘要翻译： 本发明提供新颖的叔醇化合物，其可用作制备具有高透明度和对基材的极好亲和力的光致抗蚀剂材料的单体，因此适用于使用光源的光刻法，该光源优选包含波长为300nm的光或 更优选由ArF准分子激光器发出的光。特别地，本发明提供由以下通式（1）表示的叔醇化合物：其中R 1和R 2各自独立地表示具有1个 10个碳原子，其中构成碳原子上的一些或全部氢原子可以被卤素原子或卤素原子取代，或者R1和R2可以连接在一起形成脂族烃环; Z表示具有2〜10个碳原子的直链，支链或环状二价有机基团; k为0或1。