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168 条记录 (耗时 0.053 秒)

    Polymers based on fluoranthene and their use
    65.
    发明授权
    Polymers based on fluoranthene and their use 有权
    基于荧蒽的聚合物及其用途

    公开(公告)号：US06960637B2

    公开(公告)日：2005-11-01

    申请号：US10377788

    申请日：2003-03-04

    申请人： Reinhold Schwalm ,  Yvonne Heischkel ,  Horst Weiss

    发明人： Reinhold Schwalm ,  Yvonne Heischkel ,  Horst Weiss

    IPC分类号： C07F5/02 ,  C08G61/02 ,  C09K11/06 ,  H01L51/30 ,  H01L51/50 ,  C08F10/14

    CPC分类号： C09K11/06 ,  C07F5/025 ,  C08G61/02 ,  C09K2211/14 ,  C09K2211/1408 ,  C09K2211/1416 ,  C09K2211/1433 ,  H01L51/0035 ,  H01L51/0052 ,  H01L51/5012

    摘要： Polymers comprising repeating units of the formula I: where the variables are defined as follows: a is an integer from 0 to 3, R1, R2, R3 are identical or different and are selected independently from among hydrogen, C1-C20-alkyl, C1-C20-alkyl containing one or more Si, N, P, O or S atoms, C6-C30-aryl, preferably C6-C14-aryl, C4-C14-heteroaryl, —N(C6-C14-aryl)2, and Y1, where Y1 may be identical or different and are selected from among —CH═CH2, trans- or cis-CH═CH—C6H5, acryloyl, methacryloyl, methylstyryl, O—CH═CH2 and glycidyl, where Y2 is selected from among —CH═CH2, trans- or cis- CH═CH—C6H5, acryloyl, methacryloyl, methylstyryl, —O—CH═CH2 and glycidyl, and one or more groups Y1 or Y2 may be crosslinked to one another.

    摘要翻译： 包含式I重复单元的聚合物：其中变量定义如下：a是0至3的整数，R 1，R 2，R 2， 3是相同或不同的，独立地选自氢，C 1 -C 20 - C 20 - 烷基，C 1 -C 含有一个或多个Si，N，P，O或S原子的C 20 - 烷基，C 6 -C 30 - 芳基，优选C < C 6 -C 14 - 芳基，C 4 -C 14 - 杂芳基，-N（C 6） 其中Y 1可以相同，其中Y 1可以相同，其中Y 1， 或不同的，并且选自-CH-CH 2，反式或顺式-CH-CH-C 6 H 5，丙烯酰基， 甲基丙烯酰基，甲基苯乙烯基，O-CH-CH 2 2和缩水甘油基，其中Y 2选自-CH-CH 2，反式或 顺式-CH-CH-C 6 H 5，丙烯酰基，甲基丙烯酰基，甲基苯乙烯基，-O-CH-CH 2和缩水甘油基，一个 或更多组Y 1 或Y 2可彼此交联。

    Method for producing scratch-resistant coatings
    67.
    发明授权
    Method for producing scratch-resistant coatings 失效
    防刮涂层的制造方法

    公开(公告)号：US06777458B1

    公开(公告)日：2004-08-17

    申请号：US10049646

    申请日：2002-02-25

    申请人： Thomas Jaworek ,  Reinhold Schwalm ,  Rainer Königer ,  Reiner Kranwetvogel

    发明人： Thomas Jaworek ,  Reinhold Schwalm ,  Rainer Königer ,  Reiner Kranwetvogel

    IPC分类号： C08F246

    CPC分类号： B05D3/0486 ,  B05D3/067 ,  Y10S522/902

    摘要： A process for producing scratch-resistant coatings, encompassing the following steps: applying at least one UV-curable coating composition to at least one surface of an article to be coated, said coating composition comprising at least one polymer and/or oligomer P1 containing on average at least one ethylenically unsaturated double bond per molecule, and curing the coating composition by exposure to UV radiation, which comprises conducting the curing of the coating composition under an oxygen-containing protective gas which has an oxygen partial pressure in the range from 0.2 to 18 kPa.

    摘要翻译： 一种制备耐刮涂层的方法，包括以下步骤：将至少一种UV可固化涂料组合物施用到待涂覆制品的至少一个表面上，所述涂料组合物包含至少一种聚合物和/或低聚物P1，其含有 每分子平均至少一个烯属不饱和双键，并通过暴露于紫外线辐射固化涂料组合物，其包括在氧分压为0.2至18的含氧保护气体下进行涂料组合物的固化 kPa。

    Substance mixture which can be cured thermally and by using actinic radiation, and the use thereof
    68.
    发明授权
    Substance mixture which can be cured thermally and by using actinic radiation, and the use thereof 有权
    能够热固化并通过使用光化辐射的物质混合物及其用途

    公开(公告)号：US06777090B2

    公开(公告)日：2004-08-17

    申请号：US10130934

    申请日：2002-06-19

    申请人： Hubert Baumgart ,  Uwe Meisenburg ,  Heinz-Peter Rink ,  Paul J. Harris ,  Reinhold Schwalm

    发明人： Hubert Baumgart ,  Uwe Meisenburg ,  Heinz-Peter Rink ,  Paul J. Harris ,  Reinhold Schwalm

    IPC分类号： B32B3126

    CPC分类号： C09D201/025 ,  C08G18/3831 ,  C08G18/672 ,  C09J201/025 ,  Y10T428/31511 ,  Y10T428/31551 ,  Y10T428/31938

    摘要： Composition curable thermally and with actinic radiation (dual-cure composition) comprising A) at least one constituent containing on average per molecule at least one primary or secondary carbamate group and at least one bond which can be activated with actinic radiation and preparable by from polyfunctional compounds containing at least two isocyanate-reactive, acid-reactive or epoxide-reactive functional groups and suitable monoisocyanates, monoacids or monoepoxides or from polyisocyanates, polyacids or polyepoxides and suitable compounds which contain an isocyanate-reactive, acid-reactive or epoxide-reactive functional group; and B) at least one constituent containing on average per molecule at least one carbamate-reactive functional group and also, where appropriate, at least one bond which can be activated with actinic radiation; and its use as adhesive, sealing compound and coating material.

    摘要翻译： 包含可热固化和与光化辐射（双重固化组合物）组合的组合物，其包含：A）每分子平均含有至少一个伯或仲氨基甲酸酯基团和至少一个可以用光化辐射活化并可由多官能化合物制备的键的至少一种成分 含有至少两种异氰酸酯反应性，酸反应性或环氧化物反应性官能团和合适的单异氰酸酯，单酸或单环氧化物或由多异氰酸酯，多元酸或聚环氧化物和含有异氰酸酯反应性，酸反应性或环氧化物反应性官能团的合适化合物 ; 和B）每分子平均含有至少一个氨基甲酸酯反应性官能团的至少一种组分，并且在适当的情况下还可以使用至少一种可用光化辐射活化的键;以及其用作粘合剂，密封剂和涂料。

    Positive-working radiation-sensitive mixture and production of relief structures
    69.
    发明授权
    Positive-working radiation-sensitive mixture and production of relief structures 失效
    积极工作的辐射敏感混合物和浮雕结构的生产

    公开(公告)号：US5846689A

    公开(公告)日：1998-12-08

    申请号：US708818

    申请日：1996-09-09

    申请人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    发明人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106

    摘要： A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.

    摘要翻译： 正面工作的辐射敏感混合物基本上由（a）至少一种含有酸不稳定基团并且不溶于水但由于酸的作用而变得可溶于碱性水溶液的聚合物，（b）至少 一种在光化辐射作用下产生酸的有机化合物和（c）至少一种与（b）不同的另外的有机化合物，其中聚合物（a）含有式（I），（II）和（ III）和有机化合物（b）是式（IV）的锍盐。（IV）辐射敏感性混合物适用于生产具有改善的对比度的浮雕结构。

    Positive-working radiation-sensitive mixture
    70.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5783354A

    公开(公告)日：1998-07-21

    申请号：US711016

    申请日：1996-09-09

    申请人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    发明人： Reinhold Schwalm ,  Dirk Funhoff ,  Horst Binder

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive-working radiation-sensitive mixture essentially consists of (a.sub.1) at least one water-insoluble, organic polymeric binder which contains acid-labile groups and becomes soluble in aqueous alkaline solutions as a result of the action of acid, or (a.sub.2.1) a polymeric binder which is insoluble in water and soluble in aqueous alkaline solutions and (a.sub.2.2) a low molecular weight organic compound whose solubility and aqueous alkaline developer is increased as a result of the action of acid, and (b) at least one organic compound which produces an acid under the action of actinic radiation, and, if required, (c) one or more further organic compounds which differ from (b), at least one of the components (a.sub.1), (a.sub.2.1), (a.sub.2.2), (b) and (c) containing a bonded group of the general formula (I) --O.sup..crclbar. N.sup..sym. R.sub.4, or component (c) being of the formula (II) ##STR1## The radiation-sensitive mixture is suitable for the production of relief structures.

    摘要翻译： 正面工作的辐射敏感混合物基本上由（a1）至少一种含有酸不稳定基团的水不溶性有机聚合物粘合剂组成，并且由于酸的作用而变得可溶于碱性水溶液，或（a2）。 1）聚合物粘合剂，其不溶于水并且可溶于碱性水溶液，和（a2.2）由于酸的作用，其溶解度和含水碱性显影剂增加的低分子量有机化合物，和（b）在 至少一种在光化辐射的作用下产生酸的有机化合物，如果需要，（c）一种或多种与（b），至少一种组分（a1），（a2.1）不同的其它有机化合物 ）（a）-O（ - ）N（+）R 4，或（c）成分为式（II）的键合基团的化合物（a2.2），（b）和（c） （II）辐射敏感混合物适用于浮雕结构的生产。