公开(公告)号：US08482862B2

公开(公告)日：2013-07-09

申请号：US13161758

申请日：2011-06-16

申请人： Masahiro Mizuta ,  Fumio Suzuki

发明人： Masahiro Mizuta ,  Fumio Suzuki

IPC分类号： G02B15/14 ,  G02B15/177 ,  G02B15/173

CPC分类号： G02B15/177 ,  G02B15/173 ,  G02B21/025 ,  G02B21/22

摘要： An optical system including, in order from an object: a first lens group having positive refractive power; a second lens group having negative refractive power; a third lens group having positive refractive power; and a fourth lens group having negative refractive power. The second lens group has, in order from the object, a front group having negative refractive power and a rear group. In various embodiments, the following conditional expressions are satisfied, 0.4

摘要翻译： 一种光学系统，从物体的顺序包括：具有正折射光焦度的第一透镜组; 具有负屈光力的第二透镜组; 具有正折射力的第三透镜组; 以及具有负屈光力的第四透镜组。 第二透镜组从物体起依次具有具有负屈光力的前组和后组。 在各种实施例中，满足以下条件表达式：0.4

公开(公告)号：US20110242648A1

公开(公告)日：2011-10-06

申请号：US13161758

申请日：2011-06-16

申请人： Masahiro Mizuta ,  Fumio Suzuki

发明人： Masahiro Mizuta ,  Fumio Suzuki

IPC分类号： G02B21/22

CPC分类号： G02B15/177 ,  G02B15/173 ,  G02B21/025 ,  G02B21/22

摘要： An optical system including, in order from an object: a first lens group having positive refractive power; a second lens group having negative refractive power; a third lens group having positive refractive power; and a fourth lens group having negative refractive power. The second lens group has, in order from the object, a front group having negative refractive power and a rear group. In various embodiments, the following conditional expressions are satisfied, 0.4

摘要翻译： 一种光学系统，从物体的顺序包括：具有正折射光焦度的第一透镜组; 具有负屈光力的第二透镜组; 具有正折射力的第三透镜组; 以及具有负屈光力的第四透镜组。 第二透镜组从物体起依次具有具有负屈光力的前组和后组。 在各种实施例中，满足以下条件表达式：0.4

公开(公告)号：US07362511B2

公开(公告)日：2008-04-22

申请号：US10860583

申请日：2004-06-04

申请人： Fumio Suzuki

发明人： Fumio Suzuki

IPC分类号： G02B15/14

CPC分类号： G02B15/173 ,  G02B5/04 ,  G02B21/025

摘要： A zoom lens system for a microscope includes, in the following order from the object side, a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power. Magnification of the zoom lens system is varied by moving the second lens group and the third lens group. The zoom lens system has an entrance pupil on the object side of the first lens group, and the following conditions are satisfied: −1.3

摘要翻译： 用于显微镜的变焦透镜系统按照从物体侧起的顺序包括具有正折光力的第一透镜组，具有负折光力的第二透镜组，具有正折光力的第三透镜组，以及 具有正屈光力的第四透镜组。 通过移动第二透镜组和第三透镜组来改变变焦透镜系统的放大率。 变焦透镜系统在第一透镜组的物体侧具有入射光瞳，并满足以下条件：<？in-line-formula description =“In-line formula”end =“lead”？> - 1.3 < beta2H <-0.7 <？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula”end =“lead”？> - 0.1 <1 /β3L<0 <？在线公式描述=“在线公式”end =“tail”？>其中β2H是处于最高放大状态的第二透镜组的放大倍数，β3L是 第三透镜组处于最低放大状态。

公开(公告)号：US06386957B1

公开(公告)日：2002-05-14

申请号：US09581707

申请日：2000-06-16

申请人： Hisashi Masumura ,  Kouichi Tanaka ,  Fumio Suzuki ,  Kouzi Morita ,  Kouichi Okamura ,  Naotaka Toyama

发明人： Hisashi Masumura ,  Kouichi Tanaka ,  Fumio Suzuki ,  Kouzi Morita ,  Kouichi Okamura ,  Naotaka Toyama

IPC分类号： B24B100

CPC分类号： B24B37/30 ,  B05D1/32 ,  B05D3/042 ,  B24B7/00 ,  B25B11/005 ,  H01L21/6838

摘要： By improving the material of workpiece holder body of a workpiece holder for polishing that holds a workpiece by vacuum adsorption, and the material of resin film for coating a workpiece holding surface of the holder, and developing a method for coating the surface with a resin, which does not cause blocking of perforated holes of the holder body with the resin during the resin coating process, there are provided a workpiece holder for polishing having a workpiece holding surface of high precision, and a method for producing it. According to the present invention, there are provided a workpiece holder for polishing having a workpiece holder body provided with multiple perforated holes for holding a workpiece by vacuum adsorption, wherein a holding surface of the holder body is coated with a coating film formed by applying a thermosetting resin on the holding surface and curing it with heating, and a surface of the coating film is polished, and a method for producing it.

摘要翻译： 通过改善通过真空吸附保持工件的用于抛光的工件保持器的工件保持体的材料和用于涂覆保持件的工件保持表面的树脂膜的材料，并且开发用树脂涂覆表面的方法， 在树脂涂布过程中不会使树脂堵塞保持体的穿孔，提供了具有高精度的工件保持面的研磨用工件保持架及其制造方法。 根据本发明，提供了一种用于抛光的工件保持器，其具有设置有多个用于通过真空吸附保持工件的多孔的工件保持器本体，其中，保持器主体的保持表面涂覆有涂覆膜， 将热固性树脂固化在保持表面上并加热固化，并且对该涂膜的表面进行抛光及其制造方法。

公开(公告)号：US5914649A

公开(公告)日：1999-06-22

申请号：US991601

申请日：1997-12-16

申请人： Tadashi Isono ,  Yoshiyuki Tsuru ,  Yutaka Taniguchi ,  Fumio Suzuki

发明人： Tadashi Isono ,  Yoshiyuki Tsuru ,  Yutaka Taniguchi ,  Fumio Suzuki

IPC分类号： H01H85/041 ,  H01H85/046 ,  H01H85/06 ,  H01H85/08

CPC分类号： H01H85/0411 ,  H01H85/046

摘要： A chip fuse comprising an organic resin-made insulating substrate, a pair of electrodes formed at terminals of said organic resin-made insulating substrate, current protecting element wiring portions and a current protecting element positioned between said pair of electrodes and housed in said organic resin-made insulating substrate, said current protecting element having a thickness of 3-8 .mu.m and being supported on an organic resin layer having a high tracking resistance, and at least one space being formed at least on the current protecting element side, does not cause ignition nor smoking and is excellent in clearing characteristics.

摘要翻译： 一种芯片熔丝，包括有机树脂制绝缘基板，在所述有机树脂制绝缘基板的端子处形成的一对电极，电流保护元件布线部分和位于所述一对电极之间的电流保护元件，并且容纳在所述有机树脂 所述电流保护元件的厚度为3-8μm，并且被支撑在具有高跟踪电阻的有机树脂层上，并且至少一个至少形成在当前保护元件侧的空间不是 引起点火或吸烟，清除特​​性极好。

公开(公告)号：US5670498A

公开(公告)日：1997-09-23

申请号：US527497

申请日：1995-09-13

申请人： Fumio Suzuki ,  Junichi Shimada ,  Nobuaki Koike ,  Hiroshi Kase ,  Joji Nakamura ,  Shizuo Shiozaki ,  Hiromi Nonaka

发明人： Fumio Suzuki ,  Junichi Shimada ,  Nobuaki Koike ,  Hiroshi Kase ,  Joji Nakamura ,  Shizuo Shiozaki ,  Hiromi Nonaka

IPC分类号： C07D473/06 ,  C07D473/12 ,  A61K31/52 ,  C07D473/10

CPC分类号： C07D473/06

摘要： Disclosed are xanthine derivatives represented by the following Formula (I): ##STR1## in which R.sup.1, R.sup.2, and R.sup.3 independently represent hydrogen or lower alkyl; Q.sup.1, Q.sup.2, and Q.sup.3 independently represent hydrogen, lower alkyl, lower alkoxy, or halogen; and X represents --COR.sup.4 (in which R.sup.4 represents hydrogen, hydroxy, lower alkyl, or lower alkoxy) or --SO.sub.2 R.sub.5 {in which R.sup.5 represents hydroxy, lower alkoxy, trifluoromethyl, ##STR2## in which R.sup.6 and R.sup.7 independently represent hydrogen, hydroxy-substituted or unsubstituted lower alkyl, aryl, or ##STR3## (in which m represents an integer of 1 to 3; and R.sup.8 and R.sup.9 independently represent hydrogen or lower alkyl), or ##STR4## (in which Y represents a single bond, oxygen, or N--R.sup.10 in which R.sup.10 represents hydrogen or lower alkyl; and n1 and n2 independently represent an integer of 1 to 3)}, and pharmaceutically acceptable salts thereof.

摘要翻译： 公开了由下式（I）表示的黄嘌呤衍生物：其中R 1，R 2和R 3独立地表示氢或低级烷基; Q1，Q2和Q3独立地表示氢，低级烷基，低级烷氧基或卤素; 或其中R 4表示氢，羟基，低级烷基或低级烷氧基）或-SO 2 R 5（其中R 5表示羟基，低级烷氧基，三氟甲基， 取代或未取代的低级烷基，芳基或者（其中m表示1〜3的整数; R 8和R 9分别表示氢或低级烷基），或者（其中Y表示单键，氧 ，或其中R 10表示氢或低级烷基的N-R 10，n1和n2独立地表示1〜3的整数）}及其药学上可接受的盐。

公开(公告)号：US5484920A

公开(公告)日：1996-01-16

申请号：US133510

申请日：1993-10-07

申请人： Fumio Suzuki ,  Junichi Shimada ,  Nobuaki Koike ,  Joji Nakamura ,  Shizuo Shioazaki ,  Shunji Ichikawa ,  Akio Ishii ,  Hiromi Nonaka

发明人： Fumio Suzuki ,  Junichi Shimada ,  Nobuaki Koike ,  Joji Nakamura ,  Shizuo Shioazaki ,  Shunji Ichikawa ,  Akio Ishii ,  Hiromi Nonaka

IPC分类号： C07D473/06 ,  C07D473/08 ,  C07D473/12 ,  A61K31/52

CPC分类号： C07D473/08 ,  C07D473/06 ,  C07D473/12

摘要： Agents for the treatment of Parkinson's disease contain, as an active ingredient, a xanthine derivative or a pharmaceutically acceptable salt thereof. The xanthine derivative is represented by the formula: ##STR1## in which R.sup.1, R.sup.2 are R.sup.3 are independently hydrogen, lower alkyl, lower alkenyl, or lower alkynyl; and R.sup.4 represents cycloalkyl, --(CH.sub.2).sub.n --R.sup.5 (in which R.sup.5 represents substituted or unsubstituted aryl or a substituted or unsubstituted heterocyclic group; and n is an integer of 0 to 4), or ##STR2## in which Y.sup.1 and Y.sup.2 represent independently hydrogen, halogen, or lower alkyl; and Z represents substituted or unsubstituted aryl, ##STR3## in which R.sup.6 represents hydrogen, hydroxy, lower alkyl, lower alkoxy, halogen, nitro, or amino; and m represents an integer of 1 to 4, or a substituted or unsubstituted heterocyclic group; and X.sup.1 and X.sup.2 represent independently O or S.

摘要翻译： 用于治疗帕金森病的药物含有作为活性成分的黄嘌呤衍生物或其药学上可接受的盐。 黄嘌呤衍生物由下式表示：其中R 1，R 2为R 3独立地为氢，低级烷基，低级烯基或低级炔基; 并且R 4表示环烷基， - （CH 2）n -R 5（其中R 5表示取代或未取代的芳基或取代或未取代的杂环基; n为0至4的整数）或其中Y 1和Y 2表示 独立地是氢，卤素或低级烷基; Z表示取代或未取代的芳基，其中R 6表示氢，羟基，低级烷基，低级烷氧基，卤素，硝基或氨基; m表示1〜4的整数，或取代或未取代的杂环基; X1和X2独立地表示O或S.

公开(公告)号：US5424702A

公开(公告)日：1995-06-13

申请号：US335968

申请日：1994-11-03

申请人： Yoko Kameoka ,  Hideshi Fukumoto ,  Ken Yoshioka ,  Teruhiro Takizawa ,  Tadasi Sonobe ,  Fumio Suzuki

发明人： Yoko Kameoka ,  Hideshi Fukumoto ,  Ken Yoshioka ,  Teruhiro Takizawa ,  Tadasi Sonobe ,  Fumio Suzuki

IPC分类号： H01F6/00 ,  H01F6/02 ,  H01F1/00 ,  F25B19/00 ,  H01F5/00 ,  H01F7/06

CPC分类号： H01F6/02 ,  Y10S336/01 ,  Y10S505/705 ,  Y10S505/879

摘要： A beam member which is installed at diametral portion in a ring shape superconducting coil container for supporting hoop stress of the coil, or a portion of radiant heat shield covering the beam member, is partly or entirely composed of electrical insulators or high resistivity materials. In accordance with the above composition, eddy current which is generated in the coil container when the superconducting coil container crosses magnetic field caused by eddy current which is generated in the radiant heat shield when the radiant heat shield crosses strong magnetic field caused by the superconducting coils with relative vibration of the radiant heat shield to the superconducting coil by a dynamic cause can be suppressed. Accordingly, heat generation in the superconducting coil container can be reduced, and consequently, generation of quenching can be prevented.

摘要翻译： 安装在用于支撑线圈的环向应力的环形超导线圈容器的直径部分或覆盖梁构件的辐射热屏蔽的一部分的梁构件部分或全部由电绝缘体或高电阻率材料构成。 根据上述组成，当辐射热屏蔽穿过由超导线圈引起的强磁场时，当超导线圈容器穿过由辐射热屏蔽中产生的涡流引起的磁场时，在线圈容器中产生的涡流 可以抑制通过动态原因的辐射热屏蔽对超导线圈的相对振动。 因此，可以减少超导线圈容器中的发热，从而可以防止淬火的产生。

公开(公告)号：US5343180A

公开(公告)日：1994-08-30

申请号：US857251

申请日：1992-03-25

申请人： Hideshi Fukumoto ,  Yoko Kameoka ,  Ken Yoshioka ,  Teruhiro Takizawa ,  Tadasi Sonobe ,  Fumio Suzuki ,  Naoki Kasahara ,  Fumihiko Goto ,  Shigeru Sakamoto ,  Masayuki Shibata

发明人： Hideshi Fukumoto ,  Yoko Kameoka ,  Ken Yoshioka ,  Teruhiro Takizawa ,  Tadasi Sonobe ,  Fumio Suzuki ,  Naoki Kasahara ,  Fumihiko Goto ,  Shigeru Sakamoto ,  Masayuki Shibata

IPC分类号： H01F6/06 ,  F17C13/00 ,  H01F6/00 ,  H01F6/02 ,  H01F1/00 ,  F25B19/00 ,  H01F5/00

CPC分类号： H01F6/02 ,  Y10S336/01

摘要： There is disclosed a coil structure which can be rapidly energized or excited, and which reduces the generation of heat in a coil container by an eddy current due to a dynamic disturbance such as vibration and a magnetic field fluctuation, thereby suppressing the occurrence a quench. The coil container is constituted by a low-resistivity material, and a high-resistivity portion is provided at at least one portion of the coil container in the direction of the periphery of the coil container. The high-resistivity portion is provided at a position where a vibration displacement is small or a magnetic field fluctuation is small. When the coil structure is to be energized or excited, the eddy current produced in the direction of the periphery of the superconducting-coil container can be reduced at the high-resistivity portion, and when the dynamic disturbance develops, the generation of heat by the eddy current is suppressed by the low-resistivity material.

摘要翻译： 公开了一种线圈结构，其可以被快速激励或激励，并且由于动态干扰（例如振动和磁场波动）而通过涡流减少线圈容器中的热量的产生，从而抑制骤冷的发生。 线圈容器由低电阻率材料构成，并且在线圈容器的至少一部分沿着线圈容器的周边方向设置高电阻部分。 高电阻部分设置在振动位移小或磁场波动小的位置。 当线圈结构被激励或激发时，可以在高电阻部分减小在超导线圈容器的周边方向产生的涡电流，并且当动态干扰发生时，由 涡流被低电阻率材料抑制。

公开(公告)号：US5335457A

公开(公告)日：1994-08-09

申请号：US966484

申请日：1992-10-26

申请人： Akira Matsuda ,  Shigeki Shudo ,  Noboru Shimamoto ,  Kohichi Tanaka ,  Hiromasa Hashimoto ,  Fumio Suzuki

发明人： Akira Matsuda ,  Shigeki Shudo ,  Noboru Shimamoto ,  Kohichi Tanaka ,  Hiromasa Hashimoto ,  Fumio Suzuki

IPC分类号： B24B37/04 ,  B24B37/30 ,  H01L21/304 ,  H01L21/683 ,  B24B7/22

CPC分类号： H01L21/6838

摘要： A method of chucking semiconductor wafers, in which a silicone elastic layer with high flatness is formed on the surface of a hard substrate having fine through-holes for vacuum chucking. Next fine through-holes in the silicone elastic layer, are provided, each through-hole communicating with the fine through-holes of the hard substrate. Next a semi-conductor wafer is held on the hard substrate by vacuum chucking from the back side of the substrate, so as to hold the semiconductor wafer securely on the substrate only by surface adhesion of the silicone elastic layer during polishing of the wafer. This method does not require wax or similar adhesive for holding the semiconductor wafer on the hard surface during the polishing process, and can realize a high-precision and high-quality surface polishing process for the semiconductor wafers.

摘要翻译： 一种夹持半导体晶片的方法，其中在具有用于真空吸附的精细通孔的硬质基板的表面上形成具有高平坦度的硅氧烷弹性层。 在硅弹性层中的下一个细小的通孔中，每个通孔与硬质基底的细通孔相通。 接下来，半导体晶片通过从基板的背面真空夹持而保持在硬质基板上，以便仅在晶片抛光期间通过硅树脂弹性层的表面粘合将半导体晶片牢固地保持在基板上。 该方法不需要在抛光过程中将半导体晶片保持在硬表面上的蜡或类似的粘合剂，并且可以实现用于半导体晶片的高精度和高质量的表面抛光工艺。