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67 条记录 (耗时 0.04 秒)

    Lithographic method of manufacturing a device
    63.
    发明授权
    Lithographic method of manufacturing a device 有权
    制造器件的平版印刷方法

    公开(公告)号：US07037626B2

    公开(公告)日：2006-05-02

    申请号：US10478339

    申请日：2002-05-16

    申请人： Peter Dirksen ,  Casparus Anthonius Henricus Juffermans ,  Johannes Van Wingerden

    发明人： Peter Dirksen ,  Casparus Anthonius Henricus Juffermans ,  Johannes Van Wingerden

    IPC分类号： G01F9/00

    CPC分类号： H01L21/32139 ,  G03F1/26 ,  G03F1/36 ,  G03F7/0035

    摘要： For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.

    摘要翻译： 为了光刻制造具有非常高密度的器件，通过新的方法将设计掩模图案（120）分布在多个子图案（120a，120b，120c）上。 子图案不包括“禁止”结构（135）并且可以通过常规设备传送到待图案化的基底层。 为了传送，使用新的层叠层，其包括用于每个子图案的一对处理层（22; 26）和无机抗反射层（24; 28）。 在第一处理层（26）已经被图案化为第一子图案之后，其被涂覆有用第二子图案曝光的新抗蚀剂层（30）和在第一子图案下方的第二处理层（22） 用第二子图案处理处理层。

    Test object for use in detecting aberrations of an optical imaging system
    64.
    发明授权
    Test object for use in detecting aberrations of an optical imaging system 失效
    用于检测光学成像系统的像差的测试对象

    公开(公告)号：US06331368B2

    公开(公告)日：2001-12-18

    申请号：US09844122

    申请日：2001-04-27

    申请人： Peter Dirksen ,  Casparus A. H. Juffermans

    发明人： Peter Dirksen ,  Casparus A. H. Juffermans

    IPC分类号： G03F800

    CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358

    摘要： Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a test object having circular phase structure (22) on a photoresist (PR), developing the resis and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other.

    摘要翻译： 通过成像系统，在光致抗蚀剂（PR）上成像具有圆形相位结构（22）的测试对象，可以以准确和可靠的方式检测成像系统（PL）的像差，从而显影和扫描成像系统 具有耦合到图像处理器（IP）的扫描检测装置（SEM）。 圆形相结构被成像为环形结构（25），并且几个可能的像差中的每一个像昏迷，散光，三点像差等都导致内部轮廓（CI）和外部轮廓的形状的特定变化 （CE）和/或这些轮廓之间的距离的变化，使得可以彼此独立地检测像差。

    Method of detecting aberrations of an optical imaging system
    65.
    发明授权
    Method of detecting aberrations of an optical imaging system 失效
    检测光学成像系统的像差的方法

    公开(公告)号：US06248486B1

    公开(公告)日：2001-06-19

    申请号：US09407532

    申请日：1999-09-29

    申请人： Peter Dirksen ,  Casparus A. H. Juffermans

    发明人： Peter Dirksen ,  Casparus A. H. Juffermans

    IPC分类号： G03F900

    CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358

    摘要： Aberrations of an imaging system can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure on a photoresist, developing the resist and scanning it with a scanning detection device which is coupled to an image processor. The circular phase structure is imaged in a ring structure and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour and the outer contour of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. The new method may be used for measuring a projection system for a lithographic projection apparatus.

    摘要翻译： 可以以准确和可靠的方式检测成像系统的像差，通过成像系统在光致抗蚀剂上成像圆形相结构，显影抗蚀剂并用耦合到图像处理器的扫描检测装置进行扫描 。 圆形相结构以环形结构成像，并且几个可能的像差中的每一个像昏迷，散光，三点像差等都导致环的内部轮廓和外部轮廓的形状的特定变化和/或 这些轮廓之间的距离发生变化，从而彼此独立地检测像差。 该新方法可用于测量光刻投影装置的投影系统。

    Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
    67.
    发明授权
    Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method 失效
    对基板上的掩模图案进行重复成像的方法以及执行该方法的装置

    公开(公告)号：US5674650A

    公开(公告)日：1997-10-07

    申请号：US509909

    申请日：1995-08-01

    申请人： Peter Dirksen ,  Jan E. Van Der Werf

    发明人： Peter Dirksen ,  Jan E. Van Der Werf

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F9/7084 ,  G03F7/70558 ,  G03F7/70591 ,  G03F7/70641 ,  G03F9/7026

    摘要： A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. The focusing of the projection lens system used for imaging and various other parameters of the apparatus and the projection lens system (PL), as well as illumination doses can be measured accurately and reliably, and measuring devices of the apparatus can be calibrated, by measuring an image of a new asymmetrical test mark formed in the photoresist on the substrate (W) by means of a projection beam (PB).

    摘要翻译： 对用于对基板（W）上的掩模图案（C）进行重复成像的方法和装置进行说明。 用于成像的投影透镜系统和设备和投影透镜系统（PL）的各种其他参数以及照明剂量的聚焦可以被准确可靠地测量，并且可以通过测量来校准装置的测量装置 通过投影光束（PB）形成在基板（W）上的光致抗蚀剂中的新的不对称测试标记的图像。