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公开(公告)号：US11815813B2
公开(公告)日：2023-11-14
申请号：US17330791
申请日：2021-05-26
发明人： Tatsuro Masuyama , Takuya Nakagawa , Koji Ichikawa
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/325 , G03F7/40
摘要： Disclosed are a compound represented by formula (I), a resin and a resist composition:
wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L1 represents a single bond or —CO—O*; R3 represents an alkyl group, and —CH2— included in the group may be replaced by —O— or —CO; R4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3≤m2+m3+m4+m5≤5.-
公开(公告)号：US11740555B2
公开(公告)日：2023-08-29
申请号：US17175957
申请日：2021-02-15
发明人： Yukako Anryu , Satoshi Yamaguchi , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C08F220/18 , C07C69/84 , C07D309/12 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0046 , C07C69/84 , C07D309/12 , C08F220/1808 , G03F7/0045 , G03F7/038 , G03F7/039 , G03F7/38
摘要： Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
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公开(公告)号：US11681224B2
公开(公告)日：2023-06-20
申请号：US16549206
申请日：2019-08-23
发明人： Mutsuko Higo , Shingo Fujita , Koji Ichikawa
IPC分类号： C08F212/14 , C08F220/16 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/38
CPC分类号： G03F7/0392 , C08F212/14 , C08F220/16 , G03F7/0045 , G03F7/0382 , G03F7/162 , G03F7/168 , G03F7/2037 , G03F7/322 , G03F7/38
摘要： Disclosed are a resin containing a structural unit represented by formula (I), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a2-A), and a resist composition including the same:
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公开(公告)号：US11556056B2
公开(公告)日：2023-01-17
申请号：US14953187
申请日：2015-11-27
发明人： Yukako Anryu , Mitsuyoshi Ochiai , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , G03F7/20 , C07C303/32 , C07C309/17 , C07C381/12 , C07C321/30 , C07D321/10 , C07D327/06 , C07D317/72 , G03F7/039
摘要： A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—O—, *—CO—O— or *—O—CO—, * represents a binding site to CR1R2 or CQ1Q2, L1 represents a C1 to C6 alkanediyl group, R3 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and Z+ represents an organic cation.
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公开(公告)号：US11548961B2
公开(公告)日：2023-01-10
申请号：US16826835
申请日：2020-03-23
发明人： Katsuhiro Komuro , Koji Ichikawa
IPC分类号： C08F220/30 , G03F7/004 , C07C69/608 , C08F222/14 , G03F7/26 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/30
摘要： Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; A1 represents a single bond or *-A2-CO—O—; A2 and A3 represent an alkanediyl group; W represents a divalent monocyclic saturated alicyclic hydrocarbon group; R2 and R3 each represent a hydrogen atom or a hydrocarbon group which may have a fluorine atom, etc., R4 represents a hydrogen atom, —CH2— in the group may be replaced by —O—, —S—, etc., R2 and R3, or R2, R3 and R4 may be bonded each other to form a ring which may have a fluorine atom or an alkyl group.
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公开(公告)号：US11353790B2
公开(公告)日：2022-06-07
申请号：US16741815
申请日：2020-01-14
发明人： Mutsuko Higo , Shingo Fujita , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , C08F220/18 , C08F212/14 , C08F220/38 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38
摘要： Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition: wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; Za1 represents a single bond or *—(CH2)h3—CO-L54-; h3 represents an integer of 1 to 4; L51, L52, L53 and L54 each independently represent —O— or —S—; s1 represents an integer of 1 to 3; s1′ represents an integer of 0 to 3; R1 represents a hydrogen atom or a methyl group; A1 represents a single bond or *—CO—O—; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; mi represents an integer of 1 to 3; and ni represents an integer of 0 to 4, in which mi+ni≤5.
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公开(公告)号：US11261273B2
公开(公告)日：2022-03-01
申请号：US16465230
申请日：2017-12-07
IPC分类号： C08F220/28 , C08F12/34 , C08F220/30 , C08F220/38 , G03F7/004 , G03F7/039 , G03F7/20
摘要： Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I′) and a structural unit having an acid-labile group: wherein R1 and R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (X1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and * and ** are bonds, and ** represents a bond to an iodine atom.
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公开(公告)号：US11214635B2
公开(公告)日：2022-01-04
申请号：US16482732
申请日：2018-01-26
摘要： Disclosed is a compound represented by formula (I): in formula (I), R1 and R2 each independently represent a hydrogen atom or a methyl group, X1 and X2 each independently represent a group represented by any one of formula (X1−1) to formula (X1−8): A1 and A2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—, and R3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—.
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公开(公告)号：US10571805B2
公开(公告)日：2020-02-25
申请号：US15190454
申请日：2016-06-23
发明人： Yuki Suzuki , Yuichi Mukai , Koji Ichikawa
摘要： A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.
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公开(公告)号：US10160721B2
公开(公告)日：2018-12-25
申请号：US15690568
申请日：2017-08-30
发明人： Isao Yoshida , Koji Ichikawa
IPC分类号： C07C309/17 , C07C309/07 , G03F7/039 , G03F7/004 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38 , C07D317/72 , C07D319/08 , C07D321/10 , C07D327/06 , C07D327/08 , C07C309/12 , C07D333/46 , C07D335/02 , C07C381/12 , C07F7/08 , C07D307/33 , C07D307/77
摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—C(═O)—O—, *—O—C(═O)—, *—O—C(═O)—O— or —O—, where * represents a binding site to —C(R1)(R2)— or —C(Q1)(Q2)-, A1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent, R3 represents a hydrogen atom or a methyl group, and Z+ represents an organic cation.
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