利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

454 条记录 (耗时 0.044 秒)

    Method and apparatus for inspecting a pattern formed on a substrate
    61.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 失效
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US06900888B2

    公开(公告)日：2005-05-31

    申请号：US10650756

    申请日：2003-08-29

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00 ,  G01N21/88

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： The inventive method and apparatus for detecting defects of a microscopic circuit pattern by imaging the pattern at high resolution comprises an objective lens for imaging the subject pattern, a laser illumination means for illuminating the pupil of the objective lens, means of diminishing the coherency of the laser illumination, an accumulative detector, and means of processing the signal detected by the detector. The method and apparatus are capable of imaging the subject pattern at high sensitivity and high speed based on the illumination by a short wavelength, which is indispensable for the enhancement of resolution, particularly based on a laser light source which is advantageous for practicing, with a resulting image being the same or better in quality as compared with an image resulting from the ordinary discharge tube illumination, whereby it is possible to detect microscopic defects at high sensitivity.

    摘要翻译： 用于通过以高分辨率对图案进行成像来检测微观电路图案的缺陷的本发明的方法和装置包括用于对被摄体图案进行成像的物镜，用于照射物镜的瞳孔的激光照明装置，降低该物镜的相干性的手段 激光照明，累积检测器，以及处理由检测器检测到的信号的装置。 该方法和装置能够以高灵敏度和高速度基于短波长的照明来对被摄体图案进行成像，这对于提高分辨率是不可或缺的，特别是基于有利于实践的激光光源 与普通放电管照明产生的图像相比，所得到的图像的质量相同或更好，从而可以以高灵敏度检测微观缺陷。

    Method and equipment for detecting pattern defect
    62.
    发明授权
    Method and equipment for detecting pattern defect 失效
    检测图案缺陷的方法和设备

    公开(公告)号：US06800859B1

    公开(公告)日：2004-10-05

    申请号：US09473296

    申请日：1999-12-28

    申请人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

    发明人： Hiroaki Shishido ,  Yasuhiro Yoshitake ,  Toshihiko Nakata ,  Shunji Maeda ,  Minoru Yoshida ,  Sachio Uto

    IPC分类号： G01N21956

    CPC分类号： G01N21/9501 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/479 ,  G01N2021/95676 ,  G01N2201/06113 ,  G02B5/09 ,  G02B21/365 ,  G02B26/12

    摘要： With a view to provide a method and equipment for detecting a minute circuit pattern with a high resolution, pattern defect detecting equipment is provided, comprising: an ultraviolet laser source; coherence reducing means for reducing the coherence of the ultraviolet laser beam emitted from this ultraviolet laser source; projecting means for projecting the ultraviolet laser beam passing through this coherence reducing means on a pupil of an objecting lens; illuminating means for illuminating a detection field of view in the object uniformly by the ultraviolet laser beam projected on the pupil of the objective lens by this projecting means through the objective lens; image detecting means for detecting an image of the object illuminated almost uniformly by the illuminating means; and detecting means for detecting a defect on the object by comparing image data obtained from the image of the object detected by this image detecting means to image data stored beforehand.

    摘要翻译： 为了提供用于检测具有高分辨率的微小电路图案的方法和设备，提供了图案缺陷检测设备，包括：紫外激光源; 相干减少装置，用于减少从该紫外激光源发出的紫外激光束的相干性; 投影装置，用于将穿过该相干减少装置的紫外激光束投射在物镜的瞳孔上; 照射装置，用于通过该投影装置通过物镜通过投射在物镜的光瞳上的紫外激光束均匀地照射物体中的检测视场; 图像检测装置，用于检测照明装置几乎均匀地照亮的物体的图像; 以及检测装置，用于通过将从该图像检测装置检测的对象的图像获得的图像数据与预先存储的图像数据进行比较来检测对象上的缺陷。

    Method and apparatus for inspecting a pattern formed on a substrate
    63.
    发明授权
    Method and apparatus for inspecting a pattern formed on a substrate 有权
    用于检查在基板上形成的图案的方法和装置

    公开(公告)号：US08253934B2

    公开(公告)日：2012-08-28

    申请号：US12649898

    申请日：2009-12-30

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

    IPC分类号： G01N21/00

    CPC分类号： G03F7/7065 ,  G01N21/95684

    摘要： A pattern inspection method and apparatus in which a deep ultraviolet light or an ultraviolet light is irradiated onto a specimen on which a pattern is formed, an image of the specimen which is irradiated with the deep ultraviolet light or the ultraviolet light is formed and the formed image is detected with a rear-surface irradiation type image sensor, which is sensitive to wavelengths of no greater than 400 nmm. A signal outputted from the image sensor is processed so as to detect a defect of the specimen by converting an analog image signal outputted from the image sensor to a digital image signal with an A/D converter, and a display displays information of the defect detected.

    摘要翻译： 将深紫外光或紫外线照射到形成有图案的试样上的图案检查方法和装置形成了被深紫外线或紫外线照射的样本的图像，形成 使用对不大于400nm的波长敏感的背面照射型图像传感器来检测图像。 处理从图像传感器输出的信号，以便通过用A / D转换器将从图像传感器输出的模拟图像信号转换为数字图像信号来检测样本的缺陷，并且显示器显示检测到的缺陷的信息 。

    Method and apparatus for inspecting pattern defects
    64.
    发明授权
    Method and apparatus for inspecting pattern defects 有权
    检查图案缺陷的方法和装置

    公开(公告)号：US07489395B2

    公开(公告)日：2009-02-10

    申请号：US11518195

    申请日：2006-09-11

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

    IPC分类号： G01N21/00

    CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

    摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

    摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

    Method and its apparatus for inspecting a pattern
    65.
    发明授权
    Method and its apparatus for inspecting a pattern 有权
    检查图案的方法及其装置

    公开(公告)号：US07295305B2

    公开(公告)日：2007-11-13

    申请号：US10914115

    申请日：2004-08-10

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/4788 ,  G01N21/956

    摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.

    摘要翻译： 用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。 图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。 因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。

    Pattern defect inspection method and its apparatus
    67.
    发明授权
    Pattern defect inspection method and its apparatus 有权
    图案缺陷检查方法及其装置

    公开(公告)号：US07205549B2

    公开(公告)日：2007-04-17

    申请号：US10765920

    申请日：2004-01-29

    申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

    发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

    IPC分类号： G01J1/42

    CPC分类号： G01N21/8806 ,  G01N21/956

    摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

    摘要翻译： 本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。