Compound semiconductor epitaxial substrate and method for manufacturing the same
    61.
    发明授权
    Compound semiconductor epitaxial substrate and method for manufacturing the same 有权
    复合半导体外延基板及其制造方法

    公开(公告)号:US07732836B2

    公开(公告)日:2010-06-08

    申请号:US10540513

    申请日:2003-12-19

    IPC分类号: H01L29/778

    CPC分类号: H01L29/7785

    摘要: In a compound semiconductor epitaxial substrate used for a strain channel high electron mobility field effect transistor which comprises an InGaAs layer as a channel layer 9 and AlGaAs layers containing n-type impurities as electron supplying layers 6 and 12, the channel layer 9 has an electron mobility at room temperature of 8300 cm2/V·s or more by adjusting an In composition of the InGaAs layer composing the channel layer 9 to 0.25 or more and optimizing the In composition and the thickness of the channel layer 9. GaAs layers 8 and 10 having a thickness of 4 nm or more each may be laminated respectively in contact with a top surface and a bottom surface of the channel layer 9.

    摘要翻译: 在用于包含InGaAs层作为沟道层9的应变通道高电子迁移率场效应晶体管和包含n型杂质作为电子供给层6和12的AlGaAs层的化合物半导体外延基板中,沟道层9具有电子 通过将构成沟道层9的InGaAs层的In组成调整至0.25以上,使In的组成和沟道层9的厚度最优化,室温下的迁移率为8300cm2 / V·s以上。GaAs层8,10 各自的厚度为4nm以上的层叠体可分别与沟道层9的上表面和底面接触。

    ESTIMATION DEVICE, ESTIMATION METHOD AND ESTIMATION PROGRAM FOR POSITION OF MOBILE UNIT
    62.
    发明申请
    ESTIMATION DEVICE, ESTIMATION METHOD AND ESTIMATION PROGRAM FOR POSITION OF MOBILE UNIT 有权
    估计设备,移动单元位置的估计方法和估计程序

    公开(公告)号:US20090248305A1

    公开(公告)日:2009-10-01

    申请号:US12295088

    申请日:2007-02-28

    申请人: Tsuyoshi Nakano

    发明人: Tsuyoshi Nakano

    IPC分类号: G01C21/00

    CPC分类号: G01S5/16 G06T7/70

    摘要: Enabled is to estimate a self-position even when no landmark is seen or when an article confusing the landmark is brought in. An omnidirectional camera recognizes a vertical land-mark near a wall to determine a candidate for the self-position. On the basis of the candidate determined, a break in a map between a floor and a wall is projected on the camera image thereby to perform the matching.

    摘要翻译: 即使没有看到任何地标,或者当文章混淆了地标的文章时,即可估计自己的位置。全方位摄像机识别墙壁附近的垂直地标,以确定自我位置的候选人。 基于确定的候选者,将地板和墙壁之间的地图的中断投影到相机图像上,从而进行匹配。

    IMAGE PROCESSING APPARATUS AND METHOD
    64.
    发明申请
    IMAGE PROCESSING APPARATUS AND METHOD 审中-公开
    图像处理装置和方法

    公开(公告)号:US20090041337A1

    公开(公告)日:2009-02-12

    申请号:US12187530

    申请日:2008-08-07

    申请人: Tsuyoshi Nakano

    发明人: Tsuyoshi Nakano

    IPC分类号: G06K9/00 H04N7/18

    CPC分类号: G06K9/00798

    摘要: Three-dimensional position information of each of feature points in a left and a right image is calculated based on a disparity between the left and right images; a lane marker existing on a road surface is detected from each of the left and right images; based on three-dimensional position information of a lane marker in a neighboring road surface area, by extending the lane marker to a distant area, a lateral direction position, and a depth direction position, of the extended lane marker in the distant area are estimated; an edge segment of a certain length or more is detected from feature points in the distant area in each of a plurality of images; three-dimensional position information of the edge segment is calculated; and, based on the three-dimensional position information of the edge segment, and on the extended lane marker information, a road incline in the distant area is estimated.

    摘要翻译: 基于左图像和右图像之间的视差来计算左图像和右图像中的每个特征点的三维位置信息; 从左图像和右图像中的每一个检测路面上存在的车道标记; 基于相邻路面区域中的车道标记的三维位置信息,通过将车道标记延伸到远方区域中的延长车道标记的远方区域,横向位置和深度方向位置,被估计 ; 从多个图像中的每一个的远处区域的特征点检测一定长度以上的边缘片段; 计算边缘段的三维位置信息; 并且基于边缘段的三维位置信息,并且在延伸车道标记信息上,估计远处的道路倾斜。

    Compound semiconductor epitaxial substrate and method for manufacturing same
    65.
    发明授权
    Compound semiconductor epitaxial substrate and method for manufacturing same 有权
    化合物半导体外延基板及其制造方法

    公开(公告)号:US07304332B2

    公开(公告)日:2007-12-04

    申请号:US10540515

    申请日:2003-12-19

    IPC分类号: H01L29/739

    CPC分类号: H01L29/7785

    摘要: A compound semiconductor epitaxial substrate having a pseudomorphic high electron mobility field effect transistor structure which comprises an InGaAs layer as a channel layer 9 and an InGaP layer containing n-type impurities as a front side electron supplying layer 12, wherein an electron mobility in the InGaAs layer at room temperature (300 K) has become 8000 cm2/V·s or more by growing an epitaxial substrate having a pseudomorphic HEMT structure with an In composition of the channel layer 9 increased. Front side spacer layers 10 and 11 between the channel layer 9 and the front side electron supplying layer 12 may also be InGaP layers.

    摘要翻译: 具有假型高电子迁移率场效应晶体管结构的化合物半导体外延基板,其包含InGaAs层作为沟道层9和含有n型杂质的InGaP层作为前侧电子供体层12,其中InGaAs中的电子迁移率 通过生长具有增加了沟道层9的In组成的假晶HEMT结构的外延衬底,室温(300K)的层已经变为8000cm 2 / Vs以上。 沟道层9和前侧电子供给层12之间的前侧隔离层10和11也可以是InGaP层。

    Compound semiconductor epitaxial substrate and method for manufacturing same
    66.
    发明申请
    Compound semiconductor epitaxial substrate and method for manufacturing same 有权
    化合物半导体外延基板及其制造方法

    公开(公告)号:US20060192228A1

    公开(公告)日:2006-08-31

    申请号:US10545295

    申请日:2004-02-04

    IPC分类号: H01L31/00

    CPC分类号: H01L29/205

    摘要: A compound semiconductor epitaxial substrate having a pseudomorphic high electron mobility field effect transistor structure including an InGaAs layer as a strained channel layer and an AlGaAs layer containing n type impurities as a front side electron-donating layer, wherein said substrate contains an InGaP layer in an orderly state on the front side of the above described InGaAs layer as the strained channel layer.

    摘要翻译: 一种具有假型高电子迁移率场效应晶体管结构的化合物半导体外延衬底,其包括作为应变沟道层的InGaAs层和含有n型杂质的AlGaAs层作为前侧电子给予层,其中所述衬底包含InGaP层, 在作为应变通道层的上述InGaAs层的正面上有序地形成。

    Compound semiconductor epitaxial substrate and method for manufacturing the same
    67.
    发明申请
    Compound semiconductor epitaxial substrate and method for manufacturing the same 有权
    复合半导体外延基板及其制造方法

    公开(公告)号:US20060113563A1

    公开(公告)日:2006-06-01

    申请号:US10540513

    申请日:2003-12-19

    IPC分类号: H01L31/0328

    CPC分类号: H01L29/7785

    摘要: In a compound semiconductor epitaxial substrate used for a strain channel high electron mobility field effect transistor which comprises an InGaAs layer as a channel layer 9 and AlGaAs layers containing n-type impurities as electron supplying layers 6 and 12, the channel layer 9 has an electron mobility at room temperature of 8300 cm2/V·s or more by adjusting an In composition of the InGaAs layer composing the channel layer 9 to 0.25 or more and optimizing the In composition and the thickness of the channel layer 9. GaAs layers 8 and 10 having a thickness of 4 nm or more each may be laminated respectively in contact with a top surface and a bottom surface of the channel layer 9.

    摘要翻译: 在用于包含InGaAs层作为沟道层9的应变通道高电子迁移率场效应晶体管和包含n型杂质作为电子供给层6和12的AlGaAs层的化合物半导体外延基板中,沟道层9具有电子 通过将构成沟道层9的InGaAs层的In组成调节至0.25以上,并使沟道层9的In组成和厚度最优化,室温下的迁移率为8300cm 2 / Vs以上 。 各层厚度为4nm以上的GaAs层8,10分别与沟道层9的上表面和底面接触地层叠。