Plating apparatus and method
    61.
    发明授权
    Plating apparatus and method 失效
    电镀装置及方法

    公开(公告)号:US07112264B2

    公开(公告)日:2006-09-26

    申请号:US10606956

    申请日:2003-06-27

    IPC分类号: C25D5/02 C25D7/06 C25D17/00

    CPC分类号: C25D7/0671 C25D5/028

    摘要: A plating apparatus includes a plating vessel for holding a plating bath containing at least metal ions, a conveying device for conveying a long conductive substrate and immersing the long conductive substrate in the plating bath, a facing electrode disposed in the plating bath so as to face one surface of the conductive substrate, a voltage application device for performing plating on the one surface of the conductive substrate by applying a voltage between the conductive substrate and the facing electrode, and a film-deposition suppression device fixedly disposed in the plating vessel so that at least a portion of the film-deposition suppression means is close to shorter-direction edges of the conductive substrate. At least a portion of the film-deposition suppression device close to the shorter-direction edges of the conductive substrate is conductive. By holding the conductive portion of the film-deposition suppression device and the conductive substrate at substantially the same potential, film deposition on the other surface of the conductive substrate is suppressed.

    摘要翻译: 电镀装置包括用于保持至少含有金属离子的电镀槽的电镀容器,用于输送长导电性基板并将长导电性基材浸渍在电镀槽中的输送装置,设置在镀浴中的面对电极, 导电基板的一个表面,通过在导电基板和对置电极之间施加电压在导电基板的一个表面上进行电镀的电压施加装置和固定地设置在电镀槽中的成膜抑制装置,使得 至少一部分成膜抑制装置接近导电基板的短边缘。 靠近导电基板的短边缘的薄膜沉积抑制装置的至少一部分是导电的。 通过将成膜抑制装置的导电部分和导电基板保持在基本相同的电位,抑制导电基板的另一个表面上的成膜。

    Stacked photovoltaic element and production method thereof
    62.
    发明申请
    Stacked photovoltaic element and production method thereof 审中-公开
    叠层光电元件及其制造方法

    公开(公告)号:US20050000563A1

    公开(公告)日:2005-01-06

    申请号:US10834016

    申请日:2004-04-29

    摘要: The stacked photovoltaic element of the present invention is a stacked photovoltaic element comprising a stack formed of a plurality of unit elements each having a pin constitution, and a transparent electrode provided on the surface of a light incident side of the stacked unit elements, wherein the transparent electrode provided on the surface of the light incident side comprises indium tin oxide (ITO), and the transparent electrode has 90% or more and 99.8% or less in transmittivity of a light of the maximum absorption wavelength of a unit element having the smallest current in a light collection efficiency measurement among the plurality of unit elements, and 50 Ω/□ or more and 300 Ω/□ or less in sheet resistance. Such a constitution of the present invention provides a stacked photovoltaic element having an excellent photoelectric conversion efficiency and high reliability at a low cost.

    摘要翻译: 本发明的叠层光电元件是堆叠的光电元件,其包括由具有引脚结构的多个单元构成的叠层和设置在层叠单元元件的光入射侧的表面的透明电极, 设置在光入射侧表面的透明电极包括氧化铟锡(ITO),透明电极的透射率为具有最小吸光度的单位元件的最大吸收波长的光的透过率的90%以上且99.8%以下 在多个单位元件之间的采光效率测量中的电流,以及50Ω/□以上且300Ω/□以下的薄层电阻。 本发明的这种结构提供了一种具有优异的光电转换效率和高可靠性的低成本的叠层光电元件。

    Method of manufacturing electrophotographic photosensitive member
    64.
    发明授权
    Method of manufacturing electrophotographic photosensitive member 失效
    制造电子照相感光构件的方法

    公开(公告)号:US6156472A

    公开(公告)日:2000-12-05

    申请号:US186421

    申请日:1998-11-05

    IPC分类号: G03G5/082 G03G5/10

    CPC分类号: G03G5/08214 G03G5/102

    摘要: To provide an electrophotographic photosensitive member manufacturing method capable of preventing a substrate from corroding in working of the substrate and obtaining a high-quality image free from image defects and image density unevenness, the method of manufacturing an electrophotographic photosensitive member comprises the step of forming a functional film made of an amorphous material on the surface of an aluminum substrate by reduced-pressure vapor deposition, wherein the surface of the substrate is cleaned with the water containing an inhibitor as a specific component before the step of forming an electrophotographic photosensitive member.

    摘要翻译: 为了提供能够防止基板在基板加工中腐蚀并获得没有图像缺陷和图像浓度不均匀性的高质量图像的电子照相感光构件制造方法,电子照相感光构件的制造方法包括以下步骤: 通过减压气相沉积在铝基板的表面上由非晶材料制成的功能膜,其中在形成电子照相感光构件的步骤之前,用含有抑制剂的水作为特定成分清洗基板的表面。